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In this study, the TiN films were deposited on Cu substrates by the cathodic arc plasma dposition technique. The grazing incidenceX-ray diffraction results showed that the films possess a rock-saltcrystal structure. The results of Auger electron spectroscopyshowed that the atomic concentration ratio of Ti and N was smaller than 1. Thin amorphous TiO2 and TiNxOy layers werefound by analyzing the Ti-2p, N-1s and O-1s spectra of the X-ray photoelectron spectroscopy (XPS). The preferred orientation of TiN films for various deposition times were found to change from(200) [5 min], (111) [10 min] to (220) [both for 30 min and 60 min]. The results of XPS showed that the TiNxOy layer was formed on the TiN films surface after annealing the films in air for 2 hr at 300 degree C,N2 and Ar for 2 hr at 500 C, and in N2/H2=9 for 3 hr at 640 degree C. The colorof the films were not changed. After annealing in air for 2 hr both at 400 degree C and 500 degree C as well as in CO2/N2/H2=10:81:9 for 6 hr at 700 degree C, both TiO2 and TiNxOy layers were found on the TiN films surface. The color of the of films changed into blue, pink and blue. From the results, we conclude that the color of the on TiN films remain unchangedafter annealing due to is the formation of TiNxOy while the color change is due to the formation of TiO2 and TiNxOy on the sample surface. Both voids and macropartilces on the TiN surface were investigatedby using the scanning electron microscopy and optical microscopy. The macroparticles contain mainly the Ti element and not leave thesurface after annealing in air, N2, Ar, N2/H2=9 at 300 degree C~640 degree C for 2 hr.
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