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This study aims to develop a low cost, practical and
powerful mask writer for MEMS by the technique of CAD/CAM to
generate the pattern on the mask for fabrication process of
MEMS. The hardware framework of mask writer mainly consists of
an UV optical generator and a high precision linear slide
station. In addition, transformation program, which converts the
mask pattern data drawn by AutoCAD, and X-Y-Θ station driving
code are programmed to control the moving speed and exposure
time to accurately achieve the resolution in micrometer level.
In this study, collecting the data of the equipment, such as UV
optical microscope, laser, linear slider station, and PMC
control card, calculating the precision, describing the original
design concepts and the window program,and setting the software
and hardware equipment are all included. The current
study completions are as the following: (1) micrometer square
mask pattern, (2) micrometer circle mask pattern, (3) micrometer
arc mask and so on. The original pattern data, control process,
pattern track imitation, the program of transformation pattern,
the actual operation, and manufacture of exposure machine will
all be discussed specifically in the following text.
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