(3.238.186.43) 您好!臺灣時間:2021/03/01 16:01
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果

詳目顯示:::

我願授權國圖
: 
twitterline
研究生:汪玟良
研究生(外文):Wang, wen liang
論文名稱:\H次硫酸甲醛鈉合成脂肪族聚石風及其結構之鑑定
論文名稱(外文):Synthesis of aliphatic polysulfones by sodium formaldehyde sulfoxylate and characterization of the products
指導教授:陳志勇陳志勇引用關係
指導教授(外文):C.Y.CHEN
學位類別:碩士
校院名稱:國立成功大學
系所名稱:化學工程學系
學門:工程學門
學類:化學工程學類
論文種類:學術論文
論文出版年:1998
畢業學年度:86
語文別:中文
論文頁數:67
中文關鍵詞:次硫酸甲醛鈉脂肪族聚石風
外文關鍵詞:sodium formaldehyde sulfoxylatealiphatic polysulfones
相關次數:
  • 被引用被引用:0
  • 點閱點閱:95
  • 評分評分:系統版面圖檔系統版面圖檔系統版面圖檔系統版面圖檔系統版面圖檔
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:0
本實驗提出一新型合成方法,以次硫酸甲醛鈉與Diacrylate單體合成
Poly(ester-sulfone)s。利用紅外線光譜分析儀、元素分析、氫核磁共振
光譜儀鑑定其結構。經結果證實可經由此方法直接且簡易地合成Poly(
ester-sulfone)s。產物並利用偏光顯微鏡、X射線繞射儀觀察其晶體型態
,以微差掃描熱分析儀、熱重分析儀測量其熱性質。其中由偏光顯微鏡、
X射線繞射儀可看出Poly(ester-sulfone)s為圈環狀球晶。Poly(ester-
sulfone)s的熔點由於石風基的引入而提高,但其熱裂解溫度卻因而降低
。本實驗同時利用上述方法,以次硫酸甲醛鈉與丙烯酸合成Diacrylic
acid sulfone,再以直接縮合聚合法合成Poly(amide-sulfone)s,並和不
含石風基的一般聚醯胺做比較。其中Diacrylic acid sulfone由於石風基
的拉電子效果,使其反應性較不含石風基的己二酸強,反應產率較高。產
物的溶解度由於石風基的引入而略為降低,但其熱安定性比一般聚醯胺差
。由於脂肪族聚石風的熱不穩定性及其對高能量輻射的敏感,因此被應用
於電子材料上當作正光阻。

In this article, the synthesis of Poly(ester-sulfone)s was
presented by a novel method with sodium formaldehyde sulfoxylate
and diacrylate monomer. The structures of samples were
identified by FT-IR, element analyzer, and 1H-NMR. The results
confirmed that the new preparation method of Poly(ester-sulfone)
s can be done directly and readily. The crystal morphology and
thermal properties of samples were investigated by the polarized
optical microscopy, X-ray diffraction, DSC, and TGA. The Poly(
ester-sulfone)s exhibited the morphology of ringed spherulites.
The incorporation of sulfone groups into the Poly(ester-sulfone)
s resulted in the increase of the melting point of polymers and
the decrease of thermal degradation temperature.The novel type
of Polyamide containing sulfone group were synthesized throug
direct polycondensation of diamines and diacrylic acid sulfones
which were prepared by the reaction of sodium formaldehyde
sulfoxylate with acrylic acid. It was interesting that the
properties of these polyamides differed from those of the
conventional ones. The withdrawing electron effect of the
sulfone group raised the reactivity of diacrylic acid sulfone
and then increased the reaction yield. The solubility and
thermal stability of polymers were lowered by the introduction
of sulfone group into them. From the above investigation, the
aliphatic poly(ester-sulfone)s can be used as resists in
microlithography because of the instability of them toward heat
and the sensitivity to high energy radiation.

QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top
系統版面圖檔 系統版面圖檔