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According to the rapid development in IC fabrication industry, the conventional optics will no longer be capable of achieving the smaller geometries that modern modern. Several super-resolution technologies have been developed to meet these requirement. We use the characteristic of the secondary light source image with optical pupil filter to enhance the image resolution We also find the relation between the mask pattern azimuth, modulated illumination and pupil filter type, then make the optimum optical projection system to obtain the best image quality.
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