1. John H. Lau, Flip Chip Technologies , McGraw-Hill, New York, 1995
p. 1
2. James E. Morris, 電子構裝設計與製程技術研討會, 台南, 1997,
p. 40
3. John H. Lau, Flip Chip Technologies, McGraw-Hill, New York, 1995
p. 26
4. 唐和明, "覆晶技術簡介及在電子工業應用情形", 覆晶聯接(Flip chip)技術研討會, 新竹, 1994
5. 麻蒔立男著, 陳克紹, 曹永偉譯, 薄膜技術, 金文圖書有限公司, 台北市, 1986, p. 125
6. C. Y. Chang and S. M. Sze, ULSI TECHNOLOGY, McGraw-Hill,
New York, 1996, p. 379
7. 楊錦章譯, "基礎濺鍍電漿", 電子發展月刊, 68期, 民國72年8月, pp. 13~30
8. 莊達人, VLSI 製造技術, 高立圖書有限公司, 台北市, 1998, p. 162
9. E. Stoyanova and D.stoychev, "Electrochemical aspects of the immersion treatment of Aluminium", Journal of Applied. Electrochemistry, Vol. 27, 1997, pp. 685~690
10. S. Wernick and R. Pinner, The Surface Treatment and Finishing of Aluminium and Its Alloys, Robert Draper Ltd, Teddington, U.K., (1971), Vol. 2, p. 898
11. G. P. Power, I. M. Ritchie, Modern aspects of electrochemistry, Plenum Press, London, 1975, p. 199
12. B. R. Strohmzier, W. T. Evan and D. M. Schrall, "Preparation and surface characterization of zincated aluminium memory-disc sub-
strates", Journal of materials science, Vol. 28, 1993, pp. 1563~1572
13. Glenn O. Mallory, "The relationship Between Stress And Adhesion of Electroless Nickel-Phosphorus Deposits On Zincated Aluminium",
Plating and Surface Finishing, June(1985), pp.86~95
14. Jeong In Han and Sung.Jei.Hong, "Ni Electroless Plating Process for Solder Bump Chip on Glass Technology", Jpn. J. Appl. Phys., Vol. 36, 1997, pp. 2091~2095
9. 楊聰仁, "無電鍍鎳技術", 材料科學, 16B卷, 第一期, 民國73年, pp. 1~516. 楊聰仁, "無電鍍鎳研究與應用現況", 工業材料, 106期, 民國84年10月, pp. 118~12317. K. Parker, "The Formulation of Electroless Nickel-Phosphorus Plating Baths", Plating and Surface Finishing, Vol. 74, 1987, pp. 60~65
18. I. Ohno, O. Wakabayashi and S. Haruyama, "Anodic Oxidation of Reductants in Electroless Plating", J. Electrochem. Soc., Vol. 132, 1985, pp. 2323~2330
19. 黃飛雄, "無電鍍鎳特性與應用", 工業技術, 85期, 民國70年7月, pp. 24~2720. I. M. Sukonnik, J. S. Judge and W. T. Evans, "Characterizing the interface of Nickel-Zincate Aluminium Thin Films", JOM, August(1989), pp. 37~39
21. 馮克林, "簡談電子元件銲錫可靠度", 工業材料, 124期, 民國86年4月, pp. 93~9922. William H. Safranek, The properties of Electrodeposited Metals and
Alloys, American Elsevier Publishing Company, INC., New York,
1974, p. 417
23. G. Humpston and D. M. Jacobson, Principles of Soldering and
Brazing, ASM International, Materials Park(1996), Ch. 1
24. A. Brenner, Electrodeposition of Alloys, Academic Press, New York,
1963, Vol. 1 and Vol. 2
25. 克利夫‧巴伯著, 陳武雄譯, 銲錫-基本與應用-, 協志工業叢
書出版股份有限公司, 台北市, 民國七十四年二月, p. 3
26. J. P. G. Farr and A.Abbas Noshani, "Some Properties of Electroless
Ni-P, Co-P, and Ni-Co-P Deposits", Trans. IMF, Vol. 74, No. 6, 1996,
pp. 221-225
27. Jack W. Dini, Electrodeposition The Materials Science of Coatings
and Substrates, Noyes Publications, New Jersey, 1993, Ch. 6
28. Paul Shewmon, Diffusion In Solid, The Minerals, Metals and
Materials Society, Warrendale, 1989, Ch.6
29. Gary E. McGuire, Semiconductor Materials and Process Technology
Handbook, Noyes Publications, New Jersey, 1988, Ch. 6
30. 劉毅成, 覆晶接合焊錫隆點之重流製程及其性質探討, 國立成功
大學碩士論文, 民國八十七年, p. 63
31. 賴柏仁, 無電鍍鎳層組織之探討, 國立成功大學碩士論文, 民國七十七年
32. 張介亭, 無電鍍鎳上電鍍鉛錫合金及其相互間之作用, 國立成功
大學碩士論文, 民國八十一年
33. 楊聰仁, 無電鍍鎳及其應用, 國彰出版社, 台中市, 民國七十六
年, pp. 28-40
34. Harris Benson, University Physics, John Wiley & Sons, Inc. , New
York, 1991, p. 528
35. Kwang-Lung Lin and Shiuh-Yuan Chang, "The morphologies and the
chemical states of the multiple zincating deposits on Al pads of Si
chips", Thin Solid Films, Vol. 288, 1996, pp. 36-40
36. L. F. Spencer, "Electroless Nickel Plating - A review", Metal Fini-
shing, Vol. 72, 1974, pp. 58-64
37. B. C. Johnson, "Electrical resistivity of copper and nickel thin-film
interconnection", J. Appl. Phys, Vol. 67, No. 6, 1990, pp. 3018-3024
38. William H. Cubberly, Metal Handbook(Ninth Edition), ASM, U. S.
A., 1979, Vol.2, p.777
39. F. Hine, S. Yoshizawa and S. Okada, "Effect of the walls of Electro-
lytic Cells on Current Distribution", J. Electrochem. Soc. , Vol. 103,
No.3, 1956, pp. 186-193
40. Thaddeus B. Massalski, Binary Alloy Phase Diagrams, ASM,
U.S.A. , 1987, p. 1757
41. M. A. Nicolet and M. Bartur, "Diffusion Barrier in Layered Contact
Structure", J. Vac. Sci. Technol. Vol. 19, No. 3, 1981, p. 786-793
42. Thaddeus B. Massalski, Binary Alloy Phase Diagrams, ASM,
U.S.A. , 1987, p. 168