|
Reference [1] T. Chen, T. Li, X. Zhang, and S. B. Desu, "Structure development studies of SrBi2(Ta1-xNbx)2O9 thin films," J. Mater. Res., 12 (8) 2165-2174, 1997 [2] M. S. Tsai, S. C. Sun, and T. Y. Tseng, "Effect of oxygen to argon ratio on properties of (Ba,Sr)TiO3 thin films prepared by radio-frequency magnetron sputtering," J. Appl. Phys. 82 (7) 3482-3487, 1 October 1997 [3] T. NOGUCHI, T. HASE and Y. MIYASAKA, "Analysis of the dependance of ferroelectric properties of strontium bismuth tantalate (SBT) thin films on the composition and process temperature," Jpn. J. Appl. Phys. Vol. 35 Pt. 1 No. 9B, 4900-4904, September 1996 [4] D. Dimos, H. N. Al-Shareef, W. L. Warren, and B. A. Tuttle, "Photoinduced changes in the fatigue behavior of SrBi2Ta2O9 and Pb(Zr,Ti)O3 thin films," J. Appl. Phys. 80 (3) 1682-1687, 1 August 1996 [5] S. B. Desu, D. P. Vijay, X. Zhang, and B. He, "Oriented growth of SrBi2Ta2O9 ferroelectric thin films," Appl. Phys. Lett. 69 (12) 1719-1721, 16 September 1996 [6] D. J. Taylor, R. E. Jones, Y. T. Lii, P. Zurcher, P. Y. Chu, and S. J. Gillespie, "Integration aspects and electrical properties of SrBi2Ta2O9 for non-volatile memory application," Mat. Res. Soc. Symp. Proc. Vol. 433 97-108, 1996 [7] I. KOIWA, T. KANEHARA, J. MITA, T. IWABUCHI, T. OSAKA, and S. ONO, "Orientation control of Sr0.7Bi2.3Ta2O9+α thin films by chemical liquid deposition," Jpn. J. Appl. Phys. Vol. 36 Pt.1 No. 3B 1597-1601 March 1997 [8] J. F. Scott, "Ferroelectric memories," Physical world 46-50 February 1995 [9] T. Kanehara, I. Koiwa, Y. Okada, K. Ashikaga, H. Katoh, and K. Kaifu, "Preparation of SrBi2Ta2O9 thin films with ultra-high resistance to annealing in hydrogen atmosphere for ferroelectric memories," IEDM Tech. Dig. 601-604 1997 [10] J. Zhu, X. Zhang, Y. Zhu, and S. B. Desu, "Size effects of 0.8 SrBi2Ta2O9-0.2Bi3TiNbO9 thin films," J. Appl. Phys. 83 (3) 1610-1612, 1 february 1998 [11] J. Kudo, Y. Ito, S. Mitarai, N. Ogata, S. Yamazaki, H. Urashima, A. Okutoh, M. Nagata, and K. Ishihara, "A high stability electrode technology for stacked SrBi2Ta2O9 capacitors applicable to advanced ferroelectric memory," IEDM Tech. Dig. 609-612 1997 [12] M. Takeo, M. Azuma, H. Hirano, K. Asari, N. Moriwaki, T. Otsuki, and K. Tatsuuma, "SrBi2Ta2O9 thin film capacitor model including polarization reversal response for nanoseong range circuit simulation of ferroelectric nonvolatile memory," IEDM Tech. Dig. 621-624 1997 [13] H. WATANABE, T. MIHARA, H. YOSHIMORI, and C. A. Paz de ARAUJO, "Preparation of ferroelectric thin films of bismuth layer structured compounds," Jpn. J. Appl. Phys. Vol. 34 Pt.1 No. 9B 5240-5244, September 1995 [14] K. MIURA, and M. TANAKA, "Difference in the electronic structure of SrBi2Ta2O9 and SrBi2Nb2O9," Jpn. J. Appl. Phys. Vol. 37 Pt.1 No. 2 606-607, February 1998 [15] I. KOIWA, K. TANI, J. MITA, and T. IWABUCHI, "Effect of annealing method to crystalize on Sr0.9Bi2.3Ta2O9+α thin film properties formed from alkoxide solution," Jpn. J. Appl. Phys. Vol. 37 Pt.1 No. 1 192-197, January 1998 [16] T. OSAKA, A. SAKABIBARA, T. SEKI, S. ONO, I. KOIWA, and A. HASHIMOTO, "Phase transition in ferroelectric SrBi2Ta2O9 thin films with change of heat-treatment temperature," Jpn. J. Appl. Phys. Vol. 37 Pt. 1 No. 2 597-601, February 1998 [17] R. Dat, J. K. Lee, O. Auciello, and A. I. Kingon,"Pulsed laser ablation synthesis and characterization of layered Pt/ SrBi2Ta2O9/Pt ferroelectric capacitors with practically no polarization fatigue," Appl. Phys. Lett. 67 (4) 572-574, 24 July 1995 [18] K. MIURA and M. TANAKA, "The effect of Bi ions substituting at the Sr site in SrBi2Ta2O9," Jpn. J. Appl. Phys. Vol. 37 Pt. 1 No. 5A 2554-2558, May 1998 [19] T. HORIKAWA, N. MIKAMI, T. MAKITA, J. TANIMURA, M. KATAOKA, K. SATO, and M. NUNOSHITA, "Dielectric properties of (Ba,Sr)TiO3 thin films deposited by rf sputtering," Jpn. J. Appl. Phys. Vol. 32 Pt.1 No. 9B 4126-4130, September 1993 [20] H. M. Tsai, P. Lin and T. Y. Tseng, "Sr0.8Bi2.5Ta1.2Nb0.9O9+x ferroelectric thin films prepared by two-target off-axis radio frequency magnetron sputtering," Appl. Phys. Lett. 72 (14) 1787-1789, 6 April 1998 [21] H. M. Tsai, P. Lin and T. Y. Tseng, "Effect of bismuth content on the properties of Sr0.8BixTa1.2Nb0.9O9+y ferroelectric thin films," J. Appl. Phys. 85 (2) 1-6, 15 January 1999 [22] R. Dat and H. D. Shin, "An overview of various techniques for preparation of ferroelectric thin films for device applications," Integrated Thin Films and Applications 1-13 [23] R. Moazzami, "Ferroelectric thin film technology for seiconductor memory," Semicond. Sci. Technol. 10 375-390, 1995 [24] T. MIHARA, H. YOSHIMORI, H. WATANABE, and C. A. Paz de ARAUJO, "Characteristics of bismuth layered SrBi2Ta2O9 thin-film capacitor and comparison with Pb(Zr, Ti)O3," Jpn. J Appl. Phys. Vol. 34 Pt. 1 No. 9B 5233-5239, September 1995 [25] Y. Zhu, X. Zhang, P. Gu, P. C. Joshi, and S. B. Desu, "Electrical properties of ferroelectric (SrBi2Ta2O9)1-x(Bi3TiNbO9)x solid solution," J. Phys.: Condens. Matter 9 10225-10235, 1997 [26] M.S. Tsai and T. Y. tseng, "Effect of bottom electrodes on dielectric relaxation and defect analysis of (Ba0.47Sr0.53)TiO3 thin film capacitors," Materials Chemistry and Physics 57 47-56, 1998 [27] M. S. Tsai, S. C. Sun, and T. Y. Tseng, "Effect of bottom electrode materials and annealing treatments on the electrical characteristics of Ba0.47Sr0.53TiO3 film capacitors," J. Am. Ceram. Soc., 82 [2] 351-358, 1999 [28] R. Waser, "DC electrical degradation of perovskite-type titanates: I, ceramics," J. Am. Ceram. Soc., 73 [6] 1645-1653, 1990 [29] R. Waser, "DC electrical degradation of perovskite-type titanates: II, single crystals," J. Am. Ceram. Soc., 73 [6] 1654-1662, 1990 [30] R. Waser, "DC electrical degradation of perovskite-type titanates: III, a model of the mechanism," J. Am. Ceram. Soc., 73 [6] 1663-1673, 1990 [31] S. I. OHFUJI and M. ITSUMI, "Effects of annealing in Ar gas on ferroelectric properties of SrBi2Ta2O9 thin films," Jpn. J. Appl. Phys. Vol. 37 Pt. 1 No. 5A 2559-2564, May 1998 [32] C. S. Hwang, S. O. Park, H. J. Cho, C. S. Kang, H. K. Kang, S. I. Lee, and M. Y. Lee, "Deposition of extremely thin (Ba,Sr)TiO3 thin films for ultra-large-scale integrated dynamic ranom access memory application," Appl. Phy. Lett. 67 (19) 2819-2821, 6 November 1995 [33] P. Li, J. F. McDonald and T. M. Lu, "Densification induced dielectric properties change in amorphous BaTiO3 thin films," J. Appl. Phys. 71 (11) 5596-5600, 1 June 1992 [34] Y. T. Kim and D. S. Shin, "Memory window of Pt/ SrBi2Ta2O9/CeO2/SiO2/Si structure for metal ferroelectric insulator semiconductor field effect transistor," Appl. Phys. Lett. 71 (24) 3507-3509, 15 December 1997 [35] S. B. Desu, P. C. Joshi, X. Zhang and S. O. Ryu, "Thin films of layer-structure (1-x) SrBi2Ta2O9-xBi3Ti(Ta1-yNby)O9 solid solution for ferroelectric random access memory devices," Appl. Phys. Lett. 71 (8) 1041-1043, 25 August 1997 [36] T. C. Chen, C. L. Thio and S. B. Desu, "Impedance spectroscopy of SrBi2Ta2O9 and SrBi2Nb2O9 ceramics correlation with fatigue behavior," J. Mater. Res., Vol. 12, No. 10, 2628-2637, Oct 1997 [37] T. NASU, M. KIBE, Y. UEMOTO, E. FUJII and T. OTSUKI, "Study of Pt bottom electrodes using high-temperatures sputtering for ferroelectric memories with SrBi2Ta2O9 (SBTO) film," Jpn. J. Appl. Phys. Vol.37 Pt. 1 No. 7 4144-4148, July 1998 [38] T. NAKAMURA, Y. FUJIMORI, N. IZUMI and A. KAMISAWA, "Fabrication technology of ferroelectric memories," Jpn. J. Appl. Phys. Vol.37 Pt. 1 No. 3B 1325-1327, March 1998 [39] C. H. Park and D. J. Chadi, "Microscopic study of oxygen-valency defects in ferroelectric perovskites," Phys. Rev. B 57 (22) R13961-R13964, 1 June 1998 [40] Y. NAKAO, T. NAKAMURA, A. KAMISAWA and H. TAKASU, "Study on ferrelectric thin films for application to NDRO non-volatile memories," Integrated Ferroeelctrics, Vol. 6 23-34, 1995 [41] J.C. Lee, B. Jiang, C. Suahama, R. Khamankar and J. Kim, "Nonlinearity of ferroelectric capacitors on DRAM R/W operations," Integrated Ferroelectrics, Vol. 7 319-328, 1995 [42] G. D. Hu, I. H. Wilson, J. B. Xu, W. Y. Cheung, S. P. Wong and H. K. Hong, "Structure control and characterization of SrBi2Ta2O9 thin films by a modified annealing method," Appl. Phys. Lett., Vol. 74, No. 9, 1221-1223, 1 March 1999 [43] Y. Shimakawa, Y. Kubo, Y. Nakagawa, T. Kamiyama, H. Asano and F. Izumi,"Crystal structure and ferroelectric properties of SrBi2Ta2O9 and Sr0.8Bi2.2Ta2O9," Appl. Phys. Lett., Vol. 74, No. 13, 1904-1906, 29 March 1999 [44] M. suzuki, "Review on future ferroelectric nonvolatile memory: FeRAM," J. Ceram. Soc. Japan, Vol. 103 1088-1099, 1995 [45] D. Bondurant, "Ferroelectric RAM memory family for critical data storage," Integrated Ferroelectrics, Vol. 112, 273-282, 1990 [46] J. F. Scott and C. A. PAZ DE ARAUJO, "Ferroelectric memories," Science, Vol.246 1400-1405, 15 December 1989 [47] R. E. Jones, Jr. ,P. D. Maniar, R. Moazzami, P. Zurcher, J. Z. Witowski, Y. T. Lii, P. Chu and S. J. Gillespie, "Ferroelectric non-volatile memories for low-voltage, low-power application," Thin Solid Films 270 584-588, 1995 [48] D. Bondurant and F. Gnadinger, "Ferroelectrics for nonvolatile RAMs," IEEE Spectrum, 30-33, July 1989 [49] W. A. Geideman, "Progress in ferroelectric memory technology," IEEE Trans. Ultrasonics, Ferroelectrics, and Frequency Control, Vol. 38, No. 6, 704-711, Novenber 1991 [50] R. E. JONES, JR. ,P. Y. CHU. et al., "Non-volatile memories using SrBi2Ta2O9 ferroelectrics," Integrated Ferroelectrics, Vol. 17, 21-30, 1997 [51] G. Schindler, W. Hartner, V. Joshi, N. Solayappan, G. Derbenwick, and C. Mazure, "Influence of Ti-content in the bottom electrodes on the ferroelectric properties of SrBi2Ta2O9 (SBT)," Integrated Ferroelectrics, Vol. 17 , 421-432, 1997 [52] K. NAKAO, Y. JUDAI, M. AZUMA, Y. SHIMADA and T. OTSUKI, "Voltage shift effect on retention failure in ferroelectric memories," Jpn. J. Appl. Phys. Vol. 37 Pt. 1 No. 9B, 5203-5206, September 1998 [53] J. J. Lee, C. L. THIO and S. B. Desu, "Retention and imprint properties of ferroelectric thin films," Phys. Stat. Sol. (a) 151, 171-182, 1995 [54] T. NOGUCHI, T. HASE and Y. MIYASAKA, "Analysis of the dependence of ferroelectric properties of strontium bismuth tantalate (SBT) thin films on the composition and process temperature," Jpn. J. Appl. Phys. Vol. 35 Pt. 1 No. 9B, 4900-4904, September 1996 [55] S. B. Desu and I. K. Yoo, "Electrochemical models of failure in oxide perovskites," Integrated Ferroelectrics, Vol. 3, 365-376, 1993 [56] Z. G. Zhang, J. S. Liu, Y. N. Wang, J. S. Zhu, J. L. Liu, D. Su, and H. M.Shen, "Structure and voltage dependence of ferroelectric properties of SrBi2Ta2O9 thin films," J. Appl. Phys., Vol. 85, No. 3, 1746-1749, 1 February 1999 [57] R. E. Jones, Jr., P. Zurhcher, P. Chu, D. J. Taylor, S. Zafar, B. Jiang, and S. J. Gillespie, "Performance of SrBi2Ta2O9 for low-voltage, non-volatile memory applications," Integrated Ferroelectrics, Vol. 15, 199-210, 1997 [58] Y. Shimada, M. Azuma, K. Nakao, S. Chaya, N. Moriwaki, and T. Otsuki, "Empirical reliability models of retention failures in a ferroelectric memory device using SrBi2(Ta,Nb)2O9," Integrated Ferroelectrics, Vol.17, 45-55, 1997 [59] T. MIHARA, H. WATANABE, and C. A. PAZ DE ARAUJO, "Evaluation of imprint properties in sol-gel ferroelectric Pb(ZrTi)O3 thin-film capacitors," Jpn. J. Appl. Phys. Vol. 32 Pt. 1, No. 9B, 4168-4174, September 1993 [60] E. C. Subbarao, "A family of ferroelectric bismuth compounds," J. Phys. Chem. Solids, Vol.23, 665-676, 1962 [61] J. J. Lee, C. L. Thio and S. B. Desu, "Electrode contacts on ferroelectric Pb(ZrxTi1-x)O3 and SrBi2Ta2O9 thin films and their influence on fatigue properties," J. Appl. Phys. 78 (8), 5073-5078, 15 October 1995 [62] I. K. Yoo and S. B. Desu, "Fatigue modeling of lead zirconate titanate thin films," Mater. Sci. Eng., B13 319-322, 1992 [63] N. ICHINOSE and M. WATANABE, "Fatigue characteristics of SrBi2Ta2O9 thin films by rf magnetron sputtering method," Jpn. J. Appl. Phys. Vol. 36 Pt. 1, No. 9B, 5893-5895, September 1997 [64] H. N. Al-Shareef, D. Dimos, T. J. Boyle, W. L. Warren and B. A. Tuttle, "Qualitative model for the fatigue-free behavior of SrBi2Ta2O9," Appl. Phys. Lett. 68 (5), 690-692, 29 January 1996 [65] S. b. Desu and D. P. Vijay, "Novel fatigue-free layered structure ferroelectric thin films," Mater. Sci. Eng., B32 75-81, 1995 [66] D. Dimos, W. L. Warren, M. B. Sinclair, B. A. Tuttle and R. W. Schwartz, "Photoinduced hysteresis changes and optical storage in (Pb,La)(Zr,Ti)O3 thin films and ceramics," J. Appl. Phys. 76 (7), 4305-4315, 1 October 1994 [67] W. L. Warren, B. A. Tuttle and D. Dimos, "Ferroelectric fatigue in perovskite oxides," Appl. Phys. Lett. 67 (10), 1426-1428, 4 September 1995 [68] H. M. Duiker, P. D. Beale, J. F. Scott, C. A. Paz de araujo, B. M. Melnick, J. D. Cuchiaro and L. D. McMillan, "Fatigue and switching in ferroelectric memories: Theory and experiment," J. Appl. Phys. 68 (11), 5783-5791, 1 December 1990 [69] W. L. Warren, B. A. Tuttle and D. Dimos, R. D. Nasby, and G. E. Pike, "Electronic domain pinning in Pb(Zr,Ti)O3 thin films and its role in fatigue," Appl. Phys. Lett. 65 (8), 1018-1020, 22 August 1994 [70] X. Du and I. W. Chen, "Model experiments on fatigue of Pb(Zr0.53Ti0.47)O3 ferroelectric thin films," Appl. Phys. Lett. 72 (15), 1923-1925, 13 April 1998 [71] X. Du, and I. W. Chen, "Fatigue of Pb(Zr0.53Ti0.47)O3 ferroelectric thin films," J. Appl. Phys., Vol. 83, No. 12, 7789-7798, 15 June 1998 [72] T. MIHARA, H. WATANABE, and C. A. PAZ DE ARAUJO, "Characteristic change due to polarization fatigue of sol-gel ferroelectric Pb(Zr0.4Ti0.6)O3 thin-film capacitors," Jpn. J. Appl. Phys. Vol. 33 Pt. 1, No. 9B, 5281-5286, September 1994 [73] C. Pawlaczyk, A. K. Tagantsev, K. Brooks, I. M. Reaney, R. Klissurska, and N. Setter, "Fatigue, rejuvenation and self-restoring in ferroelectric thin films," Integrated Ferroelectrics, Vol. 8, 293-316, 1995 [74] C. R. Peterson, S. A. Mansour and A. Bement, Jr., "Effects of optical illumination on fatigued lead zirconate titanate capacitors," Integrated Ferroelectrics, Vol. 7, 139-147, 1995 [75] G. Teowee, C. D. Baertlein, E. A. Kneer, J. M. Boulton and D. R. Uhlmann, "Effect of top metallization on the fatigue and retention properties of sol-gel PZT thin films," Integrated Ferroelectrics, Vol. 7, 149-160, 1995 [76] H. N. Al-Shareef, D. Dimos, W. L. Warren, and B. A. Tuttle, "A model for optical and electrical polarization fatigue in SrBi2Ta2O9 and Pb(Zr,Ti)O3," Integrated Ferroelectrics, Vol. 15, 53-67, 1997 [77] B. G. Chae, S. J. Lee, C. R. Cho, Y. S. Yang, S. H. Kim, and M. S. Jang, "Fatigue effects of metal-doped PZT thin films," Integrated Ferroelectrics, Vol. 13, 87-96, 1996 [78] R. Ramesh, W. K. Chan, B. Wilkens, H. Gilchrist, T. Sands, J. M. Tarascon, V. G. Keramidas, D. K. Fork, J. Lee and A. Safari, "Fatigue and retention in ferroelectric Y-Ba-Cu-O/Pb-Zr-Ti-O/Y-Ba-Cu-O heterostuctures," Appl. Phys. Lett. 61 (13), 1537-1539, 28 September 1992 [79] W. L. Warren, D. Dimos, B. A. Tuttle, G. E. Pike, and H. N. Al-Shareef, "Relationships among ferroelectric fatigue, electronic charge trapping, defect-dipoles, and oxygen vacancies in perovskite oxides," Integrated Ferroelectrics, Vol. 16, 77-86, 1997 [80] W. L. Warren, D. Dimos, B. A. Tuttle, and D. M. Smyth, "Electronic and ionic trapping at domain walls in BaTiO3," J. Am. Ceram. Soc., 77 [10] 2753-2757, 1994 [81] C. J. Brennan, "Defect chemistry model of the ferroelectric-electrode interface," Integrated Ferroelectrics, Vol. 7, 93-100, 1995 [82] H. M. Chen and J. Y. Lee, "Electronic trapping process in ferroelectric lead-zirconate-titanate thin-film capacitors," Appl. Phys. Lett. Vol. 73, No. 3, 309-311, 20 July 1998 [83] J. Robertson, C. W. Chen, W. L. Warren, and C. D. Gutleben, " Electrionic structure of the ferroelectric layered perovskite SrBi2Ta2O9," Appl. Phys. Lett. Vol. 69, No. 12, 1704-1706, 1996 [84] Z. G. Zhang, J. S. Liu, Y. N. Wang, J. S. Zhu, F. Yan, X. B. Chen, and H. M. Shen, "Fatigue characteristics of SrBi2Ta2O9 thin films prepared by metalorganic decomposition," Appl. Phys. Lett. Vol. 73, No. 6, 788-790, 10 August 1998 [85] C. A. Paz de Araojo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott and J. F. Scott, "Fatigue-free ferroelectric capacitors with platinum electrodes," Nature, Vol. 374, 627-629, 13 April 1995 [86] K. Amanuma and T. Kunio, "Electrical characterization of SrBi2Ta2O9 capacitors for non-volatile memory operation," Integrated Ferroelectrics, Vol. 16, 175-182, 1997 [87] Y. Fujimori, N. Izumi, Nonmembers, T. Nakamura , Member, and A. Kamisawa, Nonmember, "Study of ferroelectric materials for ferroelectric memory FET," IEICE TRANS. ELECTRON., VOL. E81-C, NO. 4, 572-576, April 1998 [88] M. Lim, and T. S. Kalkur, "The role of leakage current on the memory window and memory retention in MFIS structure," Integrated Ferroelectrics, Vol. 22, 205-211, 1998 [89] C. H. Seager, D. Mcintyre, and B. A. Tuttle, "Mechanisms for the operation of thin film transistor on ferroelectrics," Integrated Ferroelectrics, Vol. 6, 47-68, 1995 [90] S. Dimitrijev, "Down-scaling limitations in CMOS devices: is there a roel for the ferroelectrics," Integrated Ferroelectrics, Vol. 9, 151-157, 1995 [91] J. P. HAN, X. GUO, and T. P. MA, "Memory effects of SrBi2Ta2O9 capacitor on solicon with a silicon nitride buffer," Integrated Ferroelectrics, Vol. 22, 213-221, 1998 [92] T. Kamei, Nonmember, E. Tokumitsu, and H. Ishiwara, Members, "Numerical analysis of metal-ferroelectric-semiconductor field-effect-transistors (MFS-FETs) considering inhomogeneous ferroelectric polarization," IEICE. TRANS. ELECTRON., VOL. E81-C, NO. 4, 577-583, April 1998 [93] R. E. Jones, Jr., P. Zurcher, B. Jiang, J. Z. Witowski, Y. T. Lii, P. Chu, D. J. Taylor, and S. J. Gillespie, "Electrical characterization of SrBi2Ta2O9 thin films for ferroelectric non-volatile memory application," Integrated Ferroelectrics, Vol. 12, 23-31, 1996 [94] J. F. Scott, Member, "Limitations on ULSI-FeRAMs," IEICE. TRANS. ELECTRON., VOL. E81-C, NO. 4, 477-487, April 1998 [95] T. Sumi, N. Moriwaki et al., 藐kb ferroelectric nonvolatile memory technology for 1T/1C cell with 100ns read/write time at 3V," Integrated Ferroelectrics, Vol. 6, 1-13, 1995 [96] B. M. Melnick, J. Gregory, and C. A. Paz De Araujo, "Characterization of an n-channel 1T-1C nonvolatile memory cell using ferroelectric SrBi2Ta2O9 as the capacitor dielectric," Integrated Fereoelectrics, Vol.11, 145-160, 1995 [97] K. Aoki, Y. Fukuda, Nonmembers, K. Numata, Member, and A. Nishimura, Nonmember, "Formation of reliable Pb (Ti, Zr) O3 thin-film capacitors for read/write endurance of ferroelectric non-volatile memories," IEICE TRANS. ELECTRON., VOL. E81-C, NO. 4, 537-544, April 1998 [98] T. Kawasaki, Y. Akiyama, S. Fujita, and S. Satoh, Nonmember, "MFMIS structure for nonvolatile ferroelectric memory using PZT thin film," IEICE. TRANS. ELECTRON., VOL. E81-C, NO. 4, 584-589, April 1998 [99] T. J. Nixon, "A FRAM Tery-byte memory system -you can't get there from here! (or can you?)," Integrated Ferroelectrics, Vol. 17, 105-112, 1997 [100] O. Auciello, "A critical comparative review of PZT and SBT-based science and technology for non-volatile ferroelectric memories," Integrated Ferroelectrics, Vol. 15, 211-220, 1997 [101] T. Hase, T. Noguchi, K. Amanuma and Y. Miyasaka, "Sr Content dependence of ferroelectric properties in SrBi2Ta2O9 thin films," Integrated Ferroelectrics, Vol. 15, 127-135, 1997 [102] T. ATSUKI, N. SOYAMA, T. YONEZAWA and K. OGI, "Preparation of Bi-based ferroeletric thin films by sol-gel method," Jpn. J. Appl. Phys. Vol. 34 Pt. 1, No. 9B, 5096-5099, September 1995 [103] C. H. Yang and S. G. Yoon, "Effect of bismuth on the ferroelectric properties of SrBi2Ta2O9 thin films deposited on Pt/SiO2/Si by a modified radio-frequency magnetron sputtering technique," J. Vac. Sci. Technol. A 16 (4), 2505-2509, Jul/Aug 1998 [104] A. Furuya and J. D. Cuchiaro, "Compositional dependence of electrical characteristics of SrBi2(Ta1-xNbx)2O9 thin-film capacitors," J. Appl. Phys., Vol. 84, No. 12, 6788-6794, 15 December 1998 [105] Y. Xu, "Ferroelectric materials and their application," 1991 [106] L. L. Hencb, and J. K. West, "Principles of electronic ceramics," copyright 1990
|