(3.238.7.202) 您好!臺灣時間:2021/02/25 10:24
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果

詳目顯示:::

我願授權國圖
: 
twitterline
研究生:黃承揚
研究生(外文):Cheng-yang Huang
論文名稱:薄膜應力及其微觀結構之分析
論文名稱(外文):The investigation of intrinsic stress and microstructure of thin film
指導教授:李正中李正中引用關係
指導教授(外文):Cheng-Chung Lee
學位類別:碩士
校院名稱:國立中央大學
系所名稱:光電科學研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:1999
畢業學年度:87
語文別:中文
論文頁數:70
中文關鍵詞:薄膜內應力微觀結構窄帶濾波片高密度分波多工器物理汽相沈積法
外文關鍵詞:thin filmintrinsic stressmicrostructureNarrow band pass filterDense wavelength division multiplexerPhysical vapor deposition
相關次數:
  • 被引用被引用:11
  • 點閱點閱:400
  • 評分評分:系統版面圖檔系統版面圖檔系統版面圖檔系統版面圖檔系統版面圖檔
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:1
本研究乃利用電子鎗與離子源輔助鍍膜系統(Ion Assisted Deposition,簡稱IAD)來製鍍各種氧化膜如:二氧化鈦(TiO2)、五氧化鉭(Ta2O5)、五氧化二鈮(Nb2O5)、二氧化矽(SiO2)等,並探討薄膜之微觀結構分子堆積形式影響宏觀現象如:光學常數、應力分佈等的行為,進而製鍍出高折射率、低吸收、低應力的光學薄膜。
我們再以此蒸鍍參數製作多層膜的窄帶濾波片(Narrow Band Pass Filter,簡稱NBPF),以期望未來能將濾波片應用於光纖通訊元件中的分波多工(Wavelength Division Multiplexing,簡稱WDM)系統中,使用干涉窄帶濾光片來分波以滿足資訊與通訊高速發展下,光纖通訊急需擴張的傳輸容量。
Oxides thin film deposited by electron beam evaporation and Ion assist.This paper manufacture and research of the microstructure and macrobehavior of optical thin films and studying the characteristics of oxides film including TiO2, Ta2O5, Nb2O5,and SiO2.
To find the optimum thin film whith high refractive indices(n),low extinction coefficients (k) and low intrinsic stress.
For E-beam with Ion assisted deposition,the manufacture of narrow bandpass filter for wavelength division multiplexer.
緒論…………………………………………………1
1.1前言……………………………………………1
1.2薄膜中存在應力所造成的影響………………2
第二章 薄膜成長模型與微觀結構……………3
2.1薄膜分子沈積理論……………………………3
2.1.1核生長形式……………………………………5
2.1.2層生長形式……………………………………7
2.1.3層核生長形式…………………………………7
2.2薄膜微觀結構造成宏觀行為的影響……………8
2.2.1點缺陷…………………………………………8
2.2.2錯位……………………………………………9
2.2.3晶格邊界………………………………………10
2.3 形成薄膜微觀結構的因素………………………11
2.3.1蒸鍍速率………………………………………11
2.3.2基板溫度………………………………………12
2.3.3蒸發原子的入射方向………………………13
2.3.4基板的清潔度………………………………15
2.3.5真空度………………………………………15
2.4製鍍技術控制薄膜微觀結構的成長…………15
2.4.1 離子束能量…………………………………16
2.4.2 充入氧壓力及離子源內充氧………………16
2.4.3 熱處理………………………………………17
第三章 薄膜應力分析與量測技術………………18
3.1薄膜應力結構的分析……………………………18
3.2薄膜應力量測技術………………………………23
3.2.1樑彎曲法……………………………………23
3.2.2圓盤法………………………………………25
3.2.3牛頓環法……………………………………26
3.2.4 X 射線繞射法………………………………27
第四章 實驗與量測系統架構架構………………31
4.1蒸鍍系統…………………………………………31
4.2光學特性量測系統………………………………33
4.3微觀結構量測系統………………………………33
4.4薄膜應力量測系統………………………………34
第五章 單層膜之各項特性分析…………………35
5.1各項氧化膜有無離子原輔助鍍膜系統的特性分析35
5.1.1光學特性之比較……………………………37
5.1.2微觀結構與表面粗糙度……………………42
5.1.3應力分析……………………………………50
5.2離子束能量對薄膜應力之影響………………52
5.2.1離子束能量對光學特性之分析……………53
5.2.2離子束能量對微觀結構特性之分析………54
5.2.3離子束能量對應力特性之分析……………56
第六章 多層氧化膜之應力分析………………58
6.1多層膜應力之疊加效應………………………58
6.2單腔式窄帶濾光片之特性分析………………61
第七章 結論……………………………………68
7.1離子源輔助鍍膜系統對單層膜之影響………68
7.2離子束能量對薄膜應力之影響………………69
7.3多層氧化膜之應力疊加效應…………………70
參考文獻……………………………………………71
附錄…………………………………………………75
1. M. A. Scobey, W. J. Lekki and T. W. Geyer, “Filters create thermally stable, passive multiplexers,” Laser Focus World (Mach, 1974), pp. 111-116.
2. 黃立文, ”光分波多工技術” 光連, Vol. 11, (Sep. 1947), pp. 25-28.
3. J. Minowa and Y. Fujii, “Subnanometer bandwidth interference filter for optical fiber communication system,” Appl. Opt. Vol.27,(1988),pp.1385-1306.
4. G. Pesavento “Juggling wavelength with fiber optic filters,” Fiber optics Product New, Vol. 1,(1996),pp.17-19.
5. W. Lekki and M. Scobey,”Splitting channels in wavelength division multiplexers,” Laser & Optronics,(Dec. 1996),pp. 23-24.
6. 蔡榮源, “高密度多波分工器干涉濾鏡之介紹”,光訊,第67期,(1997),pp.24-27.
7. S. Bains, “Waveguide acts as multi-and-demultiplexer,” Laser Focus World,(March 1997),pp.30-33.
8. R. C. Alferness, “Integrated optics: Technology and system applicatios converge,” Optics & Photonics New, Vol.8,(1997),pp.16-29.
9. John A. Thornton and D. W. Hoffman “Stress-related effects in thin film,” Thin Solid Film, 171 (1989) p.5-31 .
10. J. M. Person, et al. J. Vac. Technol. 6, p.3472 (1968)
11. H. Sankur and W. Gunning “Sorbed water and intrinsic stress in composite TiO2-SiO2 film,” J. Appl. Phys. 66(2), 15 July 1989, pp.807-812.
12. K. H. Guenther, and H. K. Pulker, “Electron microscopic investigation of cross section of optical thin film,” Appl. Opt.15,(1976),p.2992.
13. A.G. Dirks and H. J. Leamy, “Columnar Microstructure in Vapor-Deposited Thin Films”, Thin Solid Film, 47(1977), p.219-233.
14. K. H. Guenther, “Recent progress in optical coating technology: low voltage ion plating deposition,” Proc. Soc. Photo-Opt. Instrum. Eng. 1270,211(1990).
15. M. Ohring, The Materials Science of Thin Film,(ACADEMIC PRESS, INC. San Diego, 1992),pp.419.
16. H.K Pulker, “Stress measurement and calculations for vacuum-deposited MgF2 films”, Thin Solid Film, 58(1979), p.371-376.
17. 方維倫,”微機械製造結構於薄膜殘餘應力量測之應用”,科儀新知第十八卷三期, 85.12,p.68-82.
18. Hidetoshi YANAI, Nobuyuki KISHINE, Yukari KOMABA, and Tukitaka MURAKAMI, “Measurement of Young’s modulus and stress analysis of a magnetic thin film”, JSME Inter. J. Series A, Vol.39, No.1(1996), p.129-134.
19. A. Zoller, R. Gotzelmann, K. Matl, “Plasma ion assisted deposition : investigation of film stress,” Preprint of the proceedings SPIE Vol.2776-23, Presented in Glasgow May 1996.
20. Anthony E. Ennos, “Stresses developed in optical film coatings”, Applied Optics, Vol.5, No.1, Jan. 1966, p.51-61.
21. H. Ljungcrantz, L. Hultman, and J.-E. Sundgren, “Residual Stress and Fracture Properties of Magnetron Sputtered Ti Films on Si Microelements”, J. Vac. Sci. Technol. A 11(3), May/Jun 1993,p.-543-553.
22. Yoshihisa lba, Fumiaki Kumasaka, Hajime Aoyama, Takao Taguchi, and Masaki Yamabe, ”Origin of Stress Distribution in Sputtered X-ray Absorber Film”, J. Vac. Technol. B, Vol.15, No.6, Nov/Dec 1997, p.2483-2488.
23. S.G. Malhotra, Z.U. Rek,S.M. Yalisove, and J.C. Bilello, “Analysis of Film Stress Measurement Techniques”, Thin solid Film 301(1997), p.45-54.
24. 江政忠 博士, “離子源輔助真空蒸鍍高反射拋物面鏡之研究”, 中央大學光電科學所博士論文,85.6
25. H. R. Kaufman, and R. S. Robinson, “Operation of broad-beam sources,” Part one, IV, Fort Collins, Colorado, USA (1984).
26. E. Kay Faulkner, Roger K. Whitney and Joseph E. Zeman, “Alkali Extraction as a Determinant in The Selection of a Glass for Display,” IEE Transactions on Electron Devices, Ed-30 (1983) pp545.
27. H. Demiryont, James R. Sites and Kent Geib, “Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering”, Appl. Opt. 24, (1985), p.490.
28. H. Demiryont, J. R. Sites, and K. Geib, “Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering,” Appl. Opt. 24, 4, (1985), p.490.
29. G. Binning, C. F. Quate, and C. Gerber, “Atomic Force Microscope,” Phys. Rev. Lett. 56, 930 (1986).
30. D. Sarid, “Scanning Force Microscope With Applications to Electric, Magnetic, and Atomic Force,” ed. By M. Lapp and H. Stark, Oxford univ., N. Y. (1991).
31. 林君鴻 碩士, “離子濺鍍混合材料光學薄膜之特性”, 中央大學光電科學所碩士論文,86.6
32. 郭倩丞 碩士, “以離子助鍍法研製帶通濾光片”, 中央大學光電科學所碩士論文,87.6
33. H. K. Pulker, “Mechanical properties of optical thin film,” in Thin Film for Optical System, B. J. Thompson ed.,(Marcel Dekker, Inc, New York, 1995), pp.455.
34. Petar Vretenar, ”The stress reduction in TiO2 film,” Vacuum / Volume40 /Numbers 1/2, (1990) pp.173-176.
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top
系統版面圖檔 系統版面圖檔