臺灣博碩士論文加值系統

本研究主要在探討現有矽烷類自聚性單分子膜以矽晶片為基材的研究文獻中，所提及自聚性分子膜成膜機制中，臨界溫度存在的原因及成膜過程中反應條件對半成膜形態的影響與操控。關於各種反應條件下半成膜的觀測，是以原子力顯微儀對不同反應時間下的膜表面進行偵測取像，除了藉以了解吸附分子的吸附形態，也進行覆蓋率的計算。膜表面的表面性質則以各種長鏈烷對其表面的溼潤性質來作判定並求取膜表面具有之臨界表面張力。研究中相對於前人使用之矽晶片基材，改用以雲母片為基材，並調控溶劑相含水量為操控變因，發現自聚性分子膜成膜過程中的臨界溫度現象並不是單純的為矽烷分子的固有性質所致使，存在的原因應是一個成膜動力學主控的結果，而溶劑相含水量對最終成膜性質的好壞亦有決定性的影響。

The existence of a transition grafting temperature was first showed by Brzoska et al. (1992). They proposed there is an intrinsic relationship between molecular structure and deposition temperature in self-assembled n-alkylsiloxane monolayers. We have studied how the transition temperature exists in the silianization (the chemical grafting of organic molecules onto a substrate via a trichlorosilane group) of mica substrate compared to silicon wafer they used. All study includes, (1) observing stages in the formation of self assembled n-alkyltrichlorosilane monolayers on mica and silicon wafer by atomic force microscopy (AFM); (2) measurement of the contact angle and advancing contact angle to characterize the film prepared under different reaction condition. All the experimental results, taken together, show that the existence of a grafting transition temperature is a kinetic control result in a self-assembled monolayer fabrication.

第一章 緒論…………………………………………………………1
1.簡介……………………………………………………1
2.研究動機與目的………………………………………2
第二章 文獻回顧………………………………………4
1.影響膜反應因素………………………………………4
2.成膜機制之動力學研究………………………………10
第三章 實驗部份………………………………………15
1.實驗原理………………………………………………15
2.實驗設備………………………………………………22
3.實驗步驟………………………………………………28
第四章 結果與討論……………………………………37
1.溶劑相含水量低之分子膜成膜觀測實驗……………37
2.含水量多寡對自聚性分子膜最終成膜影響…………43
3.以雲母片為基材HTS成膜臨界溫度探討…………….46
第五章 結論與未來工作……………………………….48
參考文獻…………………………………………………50

Adamson, A. W., “Physical Chemistry of Surfaces”, 1990, fifth ed., John Wiley &Sons, Inc., Singapore
Allain, C.; Ausserre, D. and Rondelez, F., J. Colloid Interface Sci., 1985,107, 5
Amirfazli, A.; Kwok, D. Y.; Gaydos, J. and Neumann, A.W., J. Colloid Interface Sci., 1998, 205, 1
Angst, D. L. and Simmons, G. W., Langmuir, 1991, 7, 2236
Barrat, A.; Silberzan, P.; Bourdieu, L. and Chatenay, D., Europhys. Lett., 1992, 20, 633
Bierbaum, K.; Grunze, M.; Baski, A. A.; Chi, L. F.; Schrepp, W.; and Fuchs, H., Langmuir, 1995, 11, 2143
Britt, D. W. and Hlady, V., J. Colloid Interface Sci., 1996, 178, 775
Brzoska, J. B.; Azouz, I. Ben and Rondelez, F., Langmuir, 1994, 10, 4367
Brzoska, J. B.; Shahidzadeh, N. and Rondelez, F., Nature, 1992, 360, 719
Cohen, S. R.; Naaman, Ron and Sagiv, J., J. Phys. Chem., 1986, 90, 3054
Davidovits, J. V.; Pho, V.; Silberzan, P. and Goldmann, M., Surface Science, 1996, 352-354, 369
Depalma, V. and Tillman, N., Langmuir, 1989, 5, 868
Flinn, D. H.; Guzonas, D. A. and Yoon, R. -H., Colloids and Surfaces, 1994, 87, 163
Good, W. R., J. Colloid Interface Sci., 1973, 44, 63
Hoffmann, H.; Mayer, U. and Krischanitz, A., Langmuir, 1995, 11, 1304
Le Grange, J. D.; Markham, J. L. and Kurkjian, C. R., Langmuir, 1993, 9, 1749
McGovern, M. E.; Kallury, K. M. R. and Thompson, M., Langmuir,
1994, 10, 3607
Parikh, A. N.; Allara, D. L.; Azouz, I. Ben and Rondelez, F., J. Phys. Chem., 1994, 98, 7577
Parikh, A. N.; Liedberg, Bo; Atre, S. V.; Ho, M. and Allara, D. L., J. Phys. Chem., 1995, 99, 9996
Rye, R. R., Langmuir, 1997, 13, 2588
Sagiv, J., J. Am. Chem. Soc., 1980, 102, 92
Silberzan, P.; Leger, L.; Ausserre, D. and Benattar, J. J., Langmuir, 1991, 7, 1647
“TRC Data Base for Chemistry and Engineering”, 1993, Thermodynamic Research Center, Texas A&M University：College
Station, TX
Ulman, A., “An Introduction to Ultrathin Organic Films”, 1991,
Academic Press, Inc., San Diego
Wasserman, S. R.; Tao, Yu-Tai and Whitesides, G. M., Langmuir, 1989a, 5, 1074
Wasserman, S. R.; Whitesides, G. M.; Tidswell, Ian M.; Ocko, Ben M. Pershan, P. S. and Axe, J. D., J. Am. Chem. Soc., 1989b, 111, 5852
Woodward, J. T.; Ulman, A. and Schwartz, D. K., Langmuir, 1996, 12, 3626