彎曲波導為積體光學中的重要元件之一。然而，隨著彎曲角度加大，傳播損耗將大幅增加。使得傳統彎曲波導的轉角必須限制在1°以下，在應用上將會造成元件面積增加，結構變長。因此，如何製造出大角度、低損耗的彎曲波導是積體光學中的一項重要課題。
本論文使用質子交換法製造特殊設計的高折射率稜鏡式之架構，以改善鎳擴散式鈮酸鋰彎曲波導之傳輸效率。首先，提出彎曲波導之理論研究，接著利用全反射的特性及側擴散現象設計出本特殊結構元件，建立其設計公式，並利用光束傳播法，求其傳輸效率。發現本元件經過5°左右的彎曲角度後仍可維持高達90%以上的傳輸效率。
對於筆者所設計的彎曲波導，相關的一些製程參數，如鎳波導的導光條件、折射率的量測、蝕刻法確認質子交換的深度和側擴散形狀，退火處理後的等效折射率改變、折射率輪廓方程式..等，都在本論文中予以確實觀察與瞭解。
最後，以此實際量測為根據，設計出經由模擬所得到的元件結構規格。並且經由實作，成功的製作出一個優良的鎳擴散式鈮酸鋰Ζ形彎曲波導。得到了彎曲角度在4.4°下，其傳輸率可維持50%左右，大於傳統彎曲波導只有5%以下的傳輸效率。確實為大角度彎曲光波導提供一可行之方法。

附表目錄
附圖目錄
第一章 緒論1
1.1 積體光學簡介1
1.2 製作積體光學的材質2
1.3 鈮酸鋰晶體簡介3
1.3-1 鈮酸鋰的晶格結構4
1.3-2 鈮酸鋰的居里溫度與相變化4
1.3-3 鈮酸鋰的折射率5
1.3-4 鈮酸鋰晶體的非線性係數和電光係數6
1.4 內容概述7
第二章 彎曲波導之理論研究9
2.1 積體光學中的波導彎曲9
2.2 鈦擴散折射率模型建立10
2.3 光束傳播法13
2.4 元件之設計理念與其模擬結果14
第三章 積體光學元件製程21
3.1 晶片切割21
3.2 晶片清洗22
3.3 光製版術與圖形轉移23
3.4 蒸鍍及濺鍍金屬或氧化物25
3.5 掀離法和蝕刻法26
3.6 高溫擴散27
3.7 質子交換28
3.8 晶片研磨及拋光29
3.9 選擇性蝕刻32
3.10 觀察量測33
3.11 製程順序34
第四章 質子交換法36
4.1 質子交換法簡介36
4.2 質子交換源37
4.3 折射率不穩定及退火處理39
4.4 區域反轉與溼式蝕刻40
第五章 實驗結果與討論42
5.1 鎳擴散式波導42
5.1-1 簡介42
5.1-2 鎳波導的導光條件與導光模態43
5.2 質子交換法所觀察到的一些現象45
5.2-1 折射率的量測原理45
5.2-2 折射率量測結果比較49
5.2-3 焦磷酸的污染問題52
5.2-4 濕蝕刻法確認其深度與側擴散形狀53
5.2-5 以IWKB法求得折射率函數59
5.3 場型與功率量測61
第六章 結論及未來展望63
參考文獻65
附表 69
附圖 73
中英文名詞對照表 129

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