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[1] B.J.Baliga, "Trends in Power Discrete Devices", Proc. Of International Symposium on Power Semiconductor Devices & ICs, 1998, pp5-9. [2] P. Zupac, D.Pote, R. D. Schrimpt, and K. F. Galloway, “Annealing of ESD-Induced Damage in Power MOSFETs”, EOS/ESD Symposium, 1992, pp. 121-128. [3] Kraisorn Throngnumchai, "A Study on the Effect of the Gate Contact and Dimensions on ESD Failure Threshold Level of Power MOSFETs", IEEE Trans. Electron Devices, Vol.41, 1994, pp1282-1287. [4] Naresh Thapar and B. J. Baliga, "A Comparison of High Frequency Cell Designs for High Voltage DMOSFETs", Proc. of International Symposium on power Semiconductor Devices & ICs, 1994, pp131-135. [5] Taylor R. Efland, Chiu-Yu Tsai, S. Pendharkar, “Lateral Thinking About Power Devices (LDMOS)”, IEDM Technical Digest, 1998, pp. 679-682. [6] A. Pieracci and B. Ricco, "A New Characterization Method for Hot-Carrier Degradation in DMOS Transistors", IEEE Trans. Electron Devices, Vol.45, 1998, pp1855-1858. [7] A. Jaksic, M. Pejovic, G. Ristic, "Latent Interface-Trap Generation in Commercial Power VDMOSFETs", IEEE Trans. Nuclear Science, Vol.45, 1998, pp1365-1371. [8] S. Manzini, A. Gallerano, and C. Contiero,"Hot-Electron Injection and Trapping in the Gate Oxide of Submicron DMOS Transistors", Proc. Of International Symposium on Power Semiconductor Devices & ICs, 1998, pp415-418.. [9] C. Duvvury, J. Rodriguez, C. Jones, and M. Smayling, “Device Integration for ESD Robustness of High Voltage Power MOSFETs”, IEDM Tech. Digest, 1994, pp 16.4.1-16.4.2 [10] M. Smayling, J. Reynolds, D.Redwine, S. Keller, G. Falessi, “A Modular Merged Technology Process including Submicron CMOS, Logic, Nonvolatile Memories, Linear Function, and Power Components”, Custom Integrated Circuits Conference, 1993. [11] R. Y. Moss, “Caution-Electrostatic Discharge at Work”, IEEE Trans. Comp. Hyb. And Man., CHMT-5, 1982, pp. 512-515. [12] MIL-STD-883E, Method 3015.7, 1989. Devices, Vol.41, 1994, pp. 1282-1287. [13] EIA/JESD Test Method A115-A, Oct, 1997. [14] P. Bossard, R. Chemelli, B. Unger, “ESD Damage from Triboelectrically Charged IC Pins”, in Proc. 2nd EOS/ESD Symposium, 1980, pp. 17-22. [15] B. Unger, “Electrostatic Discharge Failures of Semiconductor Devices”, in Proc. 19nd IRPS, 1981, pp. 193-199. [16] L. Avery,’Charged Device Model Testing:Trying to Duplicate Reality’, in Proc. 9th EOS/ESD Symposium, 1987, pp. 88-92 [17] Y. Fukuda, S. Ishiguro, M. Takahara, ‘ESD Protection Network Evaluation by HBM and CPM (Charged Package Method)’, in Proc. 8th EOS/ESD Symposium, 1986, pp. 193-199 [18] Y. Fukuda, K. Kato, ‘VLSI ESD Phenomenon and Protection’, in Proc. 10th EOS/ESD Symposium, 1988, pp. 228-234 [19] Y. Kitamura, H. Kitamura, K. Nakanishi, Y. Shibuya, ‘Breakdown of Thin Gate-Oxide by Appication of Nanosecond Pulse as ESD Test’, in Proc. Int. Test and Failure Anal. Symp.1989, pp. 193-199 [20] T. J. Maloney, ‘Designing MOS Inputs and Outputs to Avoid Oxide Failure in the Charged Device Model’, in Proc. 10th EOS/ESD Symposium, 1988, pp. 220-227 [21] R.G. Renninger,M.-C. Jon, D.L.Lin, T. Diep, T. L. Welsher, ‘A Field induced Charged Device Model Simulator’, in Proc. 11th EOS/ESD Symposium, 1989, pp. 59-71 [22] L. J. van ROOZENDAAL, e. a. Amerasekera, P. Bos, W. Baelde, F. Bontekoe, P. Kersten, E. Korma, P. Rommers, P. Krys, U. Weber, P. Ashby, ‘Standard ESD Testing’, in Proc. 12th EOS/ ESD Symposium, 1990, pp. 119-130 [23] ANSI/EOS/ESD-S5.1,, ESD Association, Inc. 1993, pp.17. [24] 施敏原著,張俊彥譯著,「半導體元件物理及製作技術」;高立出版社出版,1996年,pp. 156-158。 [25] C. Duvvury, C. Diaz, and T. Haddock, “Achieving Uniform nMOS Device Power Distribution for Sub-Micron ESD Reliability”, IEDM Tech. Digest, 1992.
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