臺灣博碩士論文加值系統

本論文主要探討軟X光光學元件中反射式繞射光柵與波帶片的特性與製作，繞射光柵在光學元件是重要的元件之一，應用在軟X光的波長範圍時，由於X光很難經由光學透鏡達到反射與折射，加上光柵細小線寬的需求，使得光柵在製作上更加困難，本研究利用一種新的技術－掃瞄式探針微影術與濕式蝕刻的方式，可製作出反射式繞射光柵的結構。當原子力顯微鏡中的探針外加偏壓在(110)晶向的矽晶片上掃瞄，探針與矽晶片的表面會感應電場產生氧化層，利用這氧化層當成濕式蝕刻的遮罩層，由於晶向蝕刻的技術，使得(110)晶向的矽晶片能蝕刻出形態為U型的光柵結構。波帶片的結構可視為是環形的繞射光柵，應用在X光顯微鏡中能作為聚焦的元件。製作時係利用電子束直寫曝光的方式將波帶片的圖案定義出來，然後利用lift-off的方式將圖案轉移成波帶片的結構。在實驗之前，分別針對反射式繞射光柵及波帶片的元件特性作模擬的研究，在反射式繞射光柵方面，影響繞射效率的因素包括入射光波長、凹谷的寬度、凹谷的深度、入射角度以及金屬材料的選擇等等。在波帶片方面，影響繞射效率的因素包括入射光能量、波帶的厚度、波帶材料的選擇以及中心擋環與整個波帶片的比例等等。依據模擬的結果，本研究已經製作出適合入射光波長為13.42nm與入射角為8°時，線寬為96nm的反射式繞射光柵及發展出適合入射光能量為700eV與阻障比為0.5的中心擋環時，最外環波帶的線寬結構。

The thesis studied the fabrication and properties of the reflection diffraction grating and zone plate of the soft x-ray optical device. It is difficult to fabricate grating structure because X-ray is not easily reflected and refracted by optic lens and the linewidth of grating is very small. A novel technique, scanning probe lithography (SPL), followed with wet etching can be used to fabricate nano-structure of the reflection diffraction grating. The atomic force microscope (AFM) with tip-biasing capability was adopted to induce anodic oxidation on (110) silicon wafer. The field-induced oxide was used as hard mask to generate grating pattern. By controlling the timing of the wet etching process and utilizing orientation-dependent etching (ODE) straight sidewalls and U groove of x-ray grating structures can be achieved. The zone plate structure can be looked upon as the circular diffraction grating that was used as focusing optics in the application of x-ray microscopy. E-beam direct writing was adopted to write pattern of zone plate and the pattern was transfered into zone plate structure with lift-off process. Before experiment, optimal conditions and mechanism of the reflection diffraction grating and zone plate were investigated with the simulation. In the reflection diffraction grating, the diffraction efficiency is affected by many factors, which include the wavelength, pitch, groove depth, incident angle and sputtering metal materials. In the zone plate, the diffraction efficiency is decided by energy of incident light, thickness, materials and ratio of central stop. According to the results of simulation, 96 nm linewidth of the grating structure for 13.42 nm soft x-ray with 8° of the grazing incident angle was fabricated, and the variable linewidth of outmost zone of the zone plate structure with 700 eV energy and 0.5 of obstructive ratio of the central stop were developed.

中文摘要…………………………………………………………i
英文摘要…………………………………………………………ii
誌謝…………………………………………………………iii
目錄…………………………………………………………iv
表目錄…………………………………………………………v
圖目錄…………………………………………………………vi
第一章緒論……………………………………………………1
第二章X光光學元件……………………………………………6
2.1X光與物質間的相互作用………………….6
2.2X光的折射與吸收……………………………6
2.3反射式光學元件……………………………8
2.3.1掠入射反射鏡………………………………8
2.3.2多層膜反射鏡………………………………9
2.4繞射式光學元件……………………………10
2.4.1繞射光柵……………………………………10
2.4.2波帶片………………………………………12
2.4.2.1菲涅耳波帶片………………………………12
2.4.2.1.1分辨率………………………………………13
2.4.2.1.2波帶片之效率………………………………14
2.4.2.2相位型波帶片………………………………14
2.4.2.3中心擋環的效用……………………………15
第三章軟X光光學元件特性模擬………………………………17
3.1反射式繞射光柵……………………………17
3.2波帶片………………………………………24
第四章實驗理論與方法…… ………………………………30
4.1繞射光柵製作………………………………30
4.2波帶片製作…………………………………45
第五章結論與未來工作………………………………………50
參考文獻…………………………………………………………57

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