臺灣博碩士論文加值系統

中文摘要
本論文主要目的在建立應用於交直流電漿之直流脈衝電源供應器之技術資料，直流脈衝電源供應器具有六種輸出電壓模式與快速之電弧(Arc)偵測。此六種模式包含正/負直流電壓模式、單極性正/負脈衝電壓模式與對稱式/非對稱式雙極性電壓模式，且每一模式之輸出電壓可被設定在0V~+/- 1000V之範圍內，而輸出頻率則可任意調整在0~50KHz內。此直流脈衝電源供應器可分為二部分，一為直流電源供應器部分，另一為脈衝切換單元部分。在直流電源供應器部分，其為一切換頻率20KHz之切換式直流供應器，且輸入為三相400V之電源，而輸出電壓範圍為0~1000V、電流為0~10A、功率為0~10KW，並利用由IGBT元件所構成之全橋式轉換電路與脈波寬度調變(Pulse Width Modulation， PWM)技術以調整輸出電壓、電流與功率。在脈衝切換單元部分，其主要電路架構為二組由IGBT元件所構成之全橋式轉換電路，其中藉由每一組電路之六種切換條件以產生六種電壓模式輸出且利用此二組電路交替地切換以提高輸出脈波頻率可達最高之50KHz，並利用德州儀器(TI)之TMS320F240晶片對脈衝切換單元做控制及採用Visual Basic發展人機介面軟體。最後利用實驗結果驗證所提出之直流脈衝電源供應器的有效性。

Abstract
The purpose of this thesis is to build up the technical data of a DC-Pulse power supply with six output voltage modes and quick arc detection for AC/DC plasma application. The output voltage modes contain positive/negative DC, positive/negative unipolar and symmetrical/asymmetrical bipolar voltage modes. Moreover, the output voltage can be set in the range of 0V to +/- 1000V for each mode and the output frequency can be adjusted freely between 0Hz to 50KHz. The DC-Pulse power supply can be separated into two parts. One is the DC power supply and the other is the pulse switch unit. The DC power supply is a switching power supply with 20KHz switching frequency. The device is fed using three phase 400V of main supply and has 0~1000V output voltage, 0~10A output current and 0~10KW output power. In addition, the output magnitude of voltage, current and power are adjusted using pulse width modulation (PWM) controlled at the full-bridge converter with IGBT switching components. The main circuit architecture of pulse switch unit is two full-bridge converters using IGBT switching components. Six switching conditions are implemented at each full-bridge converter to generate the six output voltage modes. Additionally, the output frequency of pulse is increased to 50KHz by alternately switching the two full-bridge converters. Furthermore, TI TMS320F240 is adopted to control the pulse switch unit, and Visual Basic is used to develop the man/machine interface program. Finally, the effectiveness of the proposed DC-Pulse power supply is confirmed by experimental results.

目 錄
中文摘要
英文摘要
誌謝
目錄
圖目錄
表目錄
第一章 緒論
1.1 研究動機與目的
1.2 論文大綱
第二章 直流脈衝電源供應器與交直流電漿
2.1 簡介
2.2 交直流電漿產生器之工作原理
2.3 直流脈衝電源供應器之應用
2.3.1 電漿清潔、蝕刻與塗佈
2.3.2 雙磁控濺鍍系統
第三章 直流電源供應器MAP1000系統架構
3.1 簡介
3.2 三相電源輸入部分
3.3 三相電源輸入部分之實測結果
3.4 直流轉換器(dc-dc converter)與輸出濾波電路部分
3.5 全橋式轉換器之基本工作原理
3.6 全橋式轉換器與輸出濾波電路部分之實測結果
第四章 MAP1000控制與保護電路架構
4.1 簡介
4.2 SNT2電路板功能
4.3 SNT2電路架構
4.4 SNT1電路板功能
4.5 SNT1電路架構
第五章 脈衝切換單元
5.1 簡介
5.2 脈衝切換單元之工作原理
5.3 電弧放電之偵測與消除
5.4 脈衝切換單元之控制電路板(SPIK 2000A)功能
5.5 脈衝切換單元之控制電路架構(SPIK 2000A)
5.6 SPIK 2000A介面軟體
5.7 脈衝切換單元之控制電路板(SPIK 1000A)功能
5.8 SPIK 1000A控制面板
5.9 脈衝切換單元之實測結果
5.9.1 電阻連結測試
5.9.2 短路測試
第六章 結論與未來展望
作者簡歷

參考文獻[1]J .D. Sethian, M. Myers, I. D. Smith, V. Carboni, J. Kishi, Morton, J. Arce, B. Bowen, L. Schlitt, O. Barr, and W. Webster, “Pulsed power for a rep-rate, electron beam pumped KrF laser,” IEEE Trans. Plasma Science, Vol. 28, No. 5, pp. 1333 —1337, Oct., 2000.[2]C. R. Rose and D. S. Warren, “Performance and test results of a regulated magnetron pulser,” 23th International Power Modulator Symposium Conf. Rec., pp. 206-208, 1998.[3]C. R. Rose, “A regulated magnetron pulser,” 23th International Power Modulator Symposium Conf. Rec., pp. 209 -212, 1998.[4]D. E. Anderson, J. B. Greenly, S. C. Glidden and M. Richter, “1.2 MV, 800 kA, 150 ns pulsed power generator for powering Field Reversed Ion Ring Experiments,” 10th IEEE International Pulsed Power Conf. Rec., Vol. 2, pp. 1052 -1057, 1995.[5]D. T. Wang, X. W. Xu, X. Y. Li, D. L. Lu, S. F. Jiang, M. D. Sun, H. J. Li, B. S. Yuan and M. Z. Liu, “The power supply and control system for the MM-2U neutral beam injector,” 15th IEEE/NPSS Symposium on Fusion Engineering, Vol. 2, pp. 901-904, 1994.[6]G. C. Watt and P. J. Evans, “A trigger power supply for vacuum arc ion sources,” IEEE Trans. Plasma Science, Vol. 21, No. 5, pp. 547-551, Oct., 1993.[7]H. Arita, K. Suzuki and Y. Kurosawa, “Switching characteristics of the triggered vacuum gap for a high-repetition-rate pulse-power source,” IEEE Trans. Plasma Science, Vol. 20, No. 2, pp. 76-79, April, 1992.[8]H. Singh and C. R. Hummer, “High action thyristors for pulsed applications,” 12th IEEE International Pulsed Power Conf. Rec., Vol. 2, pp. 1126 -1128, 1999.[9]W. A. Reass, C. A. Munson, G. Malaczynski and A. Elmoursi, “Progress towards a 20 kV, 2 kA plasma source, ion implantation modulator for automotive production of diamond film on aluminum,” 22th International Power Modulator Symposium, pp. 93-96, 1996.[10]D. S. Nazarov, G. E. Ozur and D. I. Proskurovsky, “Production of low-energy high-current electron beams in a reflected-discharge plasma-anode gun,” 11th IEEE International Pulsed Power Conf. Rec., Vol. 2, pp. 1335-1340, 1997.[11]莊達人，VLSI製造技術，高立圖書有限公司，中華民國八十六年。[12]G. Mark, Applications of Pulse Power Supplies in Plasma Systems. Melec Corp., Germany, 1998.[13]George C. Chryssis, High-Frequency Switching Power Supplies: theory and design, 2nd ed., McGraw-Hill, 1995.[14]梁適安，交換式電源供應器之理論與實務設計，全華圖書有限公司，中華民國八十三年。[15]AnyBus Slave Design Guide, HMS Corp., Sweden, 2000.[16]AnyBus-S Profibus Appendix, HMS Corp., Sweden, 1999.