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研究生:李政麟
研究生(外文):Li Cheng-Lin
論文名稱:化學機械研磨用奈米級二氧化鈰粉體之合成
論文名稱(外文):The Synthesis of Nano-sized Cerium dioxide powder for Chemical Mechanical Polishing Application
指導教授:許健興許健興引用關係
學位類別:碩士
校院名稱:逢甲大學
系所名稱:化學工程學所
學門:工程學門
學類:化學工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:95
中文關鍵詞:奈米粉末合成二氧化鈰
外文關鍵詞:powder synthesizedCerium dioxidenano
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由於CMP研磨液的開發,已被證明是CMP製程中的關鍵技術,而其中以奈米級氧化鈰為研磨顆粒的研磨液,被大量的使用在STI製程中,以提高其研磨效率,但目前的生產方式如水熱法等,僅能小量生產,且價錢高昂,故我們改良了傳統的沈澱法,試圖在較高溫度及酸性的環境下合成奈米級氧化鈰顆粒。
在本研究中嘗試以均相成核及異質成長兩種方式來得到氧化鈰顆粒,其中在異質成長的考量下,更分別以三種不同的製造步驟來瞭解尿素在合成反應中的影響。將得到的產物分別以XRD、DLS、TEM等分析工具加以分析。發現在異質成長的途徑下,確實可以在酸性的環境下以沈澱法合成氧化鈰顆粒,而又以將鈰鹽加入含有晶種及尿素的反應器中的方法所得到的氧化鈰顆粒最大,可以達到23nm。並且發現在異質成長之下,控制晶種的比例,可以影響最終氧化鈰顆粒粒徑的大小。
The developing of chemical mechanical polishing (CMP) is one key technology in CMP process. The slurry based on nano-sized cerium dioxide has been used in STI process to enhance the polishing efficiency. But the usual method in synthesizing cerium dioxide, for example hydrothermal method, is expensive. We intent to improve the traditional precipitation method in a higher-temperature and acid environment to synthesis nano-sized cerium dioxide.
In this work, we have used homogeneous nucleation and heterogeneous growth to synthesize cerium oxide. Considering the condition of heterogeneous growth, we have used three different steps to realize the role of urea in the reaction process .The products have been analysed by three instruments ,XRD、DLS and TEM.
The result of the experiment indicated that the cerium dioxide particle could be synthesized in acid environment by precipitation method, and the largest cerium dioxide particle,23nm has been obtained by the step of adding ceric ammonium nitrate into the reactor containing seed and urea, we also found that controlling the amount of seed would affect the final cerium dioxide particle size.
第一章 緒論
1-1 前言…………………………………………………………1
1-2 化學機械研磨………………………………………………2
1-2-1 平坦化的目的………………………………………2
1-2-2 平坦化的形式………………………………………3
1-2-3 平坦化技術簡介……………………………………4
1-2-4 CMP技術原理………………………………………6
1-3 化學機械研磨用微粉簡介………………………………11
1-4 二氧化鈰粉體的簡介……………………………………16
1-5 氧化鈰粉體之製造方法…………………………………18
1-5-1 沉澱法……………………………………………18
1-5-2 溶膠凝膠法(sol-gel)……………………………19
1-5-3 水熱法……………………………………………19
1-5-4 電化學法…………………………………………20
1-6 研究目的…………………………………………………27
第二章 理論部分……………………………………………………28
2-1 液相結晶與沉澱法理論…………………………………28
2-2 膠體穩定(colloidal stability)……………………35
2-2-1 DLVO理論…………………………………………35
2-2-2 凡得瓦爾力………………………………………37
2-2-3 靜電力(static electric forces)…………37
2-2-4 zeta電位與膠體性質之關係……………………38
2-3 CMP研磨機制……………………………………………44
2-3-1 機械效應…………………………………………44
2-3-2 化學效應…………………………………………46
第三章 實驗方法……………………………………………………48
3-1 藥品………………………………………………………48
3-2 儀器………………………………………………………49
3-3 實驗裝置…………………………………………………50
3-4 實驗方法…………………………………………………51
3-4-1 均相成核及晶種製備……………………………51
3-4-2 異質成核實驗設計………………………………52
3-5 分析方法…………………………………………………53
3-5-1 X光繞射分析……………………………………53
3-5-2 粉末粒徑分析……………………………………54
3-5-3 TEM分析…………………………………………54
第四章 結果與討論…………………………………………………58
4-1 粉體的成份鑑定…………………………………………57
4-2 合成條件對粉末在水溶液中的粒徑分析………………63
4-2-1 均相合成下對粒徑分佈的影響…………………63
4-2-2 異質成核下對粒徑分佈的影響…………………64
4-3 TEM觀察結果及討論…………………………………77
4-4 CMP研磨結果……………………………………………79
第五章 結論…………………………………………………………91
參考文獻……………………………………………………………92
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