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第七章、參考文獻 1. Vercammen, K.L.L., Berezin, A.A., Lox, F. and Chang, J.S., Non-Thermal Plasma Techniques for the Reduction of Volatile Organic Compounds in Air Streams: A Critical Review. J. Adv. Oxid. Technol., 1997. 2: p. 312-329. 2. J.S., C., Recent development of plasmapollution control technology : a critical review. Science & Technology of Advanced Materials, 2001. 2: p. 571-576. 3. Chang, J.S., Recent development of gaseous pollution control technologies based on non-thermal plasma. Oyobutsuri, 2000. 69(Japanese): p. 268-277. 4. Yamamoto, T., Ramanathan, K., Lawless, P.A., Ensor, D.S., Newsome, J.R., Plaks, N. and Ramsey, G.H., Control of Volatile Organic Compounds by an AC Energized Ferroelectric Pellet Reactor and a Pulsed Corona Reactor. IEEE Transactions on industry applications, 1992. 28: p. 528-534. 5. Takahashi R., K.Y.a.Y.K., Dissociation of Freon by Pulse Discharge. Electrostatic Soc. Japan, 1994(Special Symposium): p. 75-78. 6. Masuda, S., Hosokawa, S., Tu, X.L., Sakakibara, K., Kitoh, S. and Sakai, S., The performance of an integrated air purifier for control of aerosol, microbial, and odor. IEEE Transactions on industry applications, 1993. 29: p. 774-780. 7. Yamamoto, T., Lawless P. A., and Sparks L. E., IEEE Transactions on Industry Applications, 1989. 25(4): p. 743-749. 8. Chang J.S., Y.T., Kohno H., Tamura M., Honda S., Shibuya A. and Berezin A.A., Removal of Xylene, Trichloroethylene and Their Mixtures from Air Stream by a Pulsed Corona Discharge Induced Plasma Reactor. J. Adv. Oxid. Technol., 1997. 2: p. 346-352. 9. Oda T., K.A., Tanaka K., Takahashi T. and Masuda S., Low temperature atmospheric pressure discharge plasma processing for volatile organic compounds. Journal of Electrostatics, 1995. 35: p. 93-101. 10. 李灝明、張木彬, 操作條件對介電質放電技術去除乙醛及對二甲苯之影響. 第十五屆空氣污染控制技術研討會論文集, 1998. p. 353-360. 11. Mohindra V., C.H., Sawin H.H. and Mocella M.T., Abatement of Perfluorocompounds (PFC''s) in a Microwave Tubular Reactor using O2 as an Additive Gas. Journal of the IEEE T. Semiconductor M., 1997. 10: p. 399-451. 12. Slater, R.a.D.-H., D., J. Appl. Phys., 1981. 52: p. 5820-5828. 13. Vartanian V., B.L., Lii T., Graves D., Tonnis E.J., Jewett R., Wofford B., Bevan J., Hartz C. and Gunn M., Plasma Abatement Reduces PFC Emission. Journal of Semiconductor International, 2000: p. 191-198. 14. USEPA, Control Techniques for Volatile Organic Emissions from Stationary Source. U.S. EPA, 1978. EPA-450/2-78-022. 15. Kittel, C., Introduction to Solid State Physics. 1996. Ch. 10, 7th ed(New York, Wiley). 16. F., C.a.F., Introduction to Plasma Physics. 1974(New York, Plenum Press). 17. Larkin, D.W., Caldwll. T. A., Lobban, L. L. and Thanyachotpaiboon, R. G., Oxygen Pathway and Carbon Dioxide Utilization in Methane Partial Oxidation in Ambient Temperature Electric Discharge. Energy Fuels, 1998: p. 12-740. 18. T., B.A., Abstract : Fundamental of Plasma Chemistry. J. Vac. Sci. Technol, 1979. 16(2): p. 418. 19. Chang J.S., L.P.C., Nagai K., Yoshioka T., Aoki S. and Maezawa A.,, Preliminary Pilot Plant Tests of a Corona Discharge-Electron Beam Hybrid Combustion Flue Gas Cleaning System. IEEE Trans. Ind. Applicant, 1996. 32(1): p. 131-136. 20. U., E.B.a.K., Modeling and Applications of Silent Discharge Plasma. IEEE Trans. Plasma Sci., 1991. 19: p. 309. 21. Eliasson B. and Kogelschatz U., Nonequilibrium Volume Plasma Chemical Processing. IEEE Transactions on industry applications, 1991. 19(6): p. 1063-1077. 22. F., C.M.B.a.C.C., LowTemperature SNCR Process for NOx Control. Sci. Total. Environ., 1997. 198: p. 73. 23. Penetrante B. M., H.M.C., Merritt B.T., Vogtlin G.E. and Wallman P.H., Comparison of Electrical Discharge Techniques for Nonthermal Plasma Processing of NO in N2. IEEE Trans. Plasma Sci., 1995. 23: p. 679. 24. Veldhuizen E. M., Z.L.M.a.R.W.R., Combined Effects of Pulsed Discharge Removal of NO, SO2 and NH3 from Flue Gas. Plasma Chem. Plasma Process., 1998. 18: p. 91. 25. Nunez C., R.F.H., Ponder W. H. and Abbott J. H., Corona Destruction : An Innovative Control Technology for VOCs and Air Toxics. Air and Waste, 1993. 43: p. 242. 26. Teply J., D.M., Janca J. and Tesar C., Destruction of Organic Compounds in a High-Frequency Discharge Plasma at Reduced Pressure. Plasma Chem. Plasma Process., 1995. 18: p. 465. 27. Krause T.R., H.J.E., 1,1,1-Trichloroethane in a Microwave Discharge Plasma Reactor at Atmospheric Pressure. Journal of World Congress Ⅲ on Engineering and Environment, 1993. 28. 大森俊一、橫島一郎、中根央,共著,賴耿陽編譯, 高周波、微波測定技術. 1995(台灣復文興業股份有限公司): p. 37-73. 29. 黃進芳, 1994. 30. lin, W., Microwave Filters Employing a Single Cavity Excited in More than One Mode. Journal of Applied Physics, 1951: p. 989-1001. 31. 林為干, 微波網路. 國防工業出版社, 1978(北京). 32. E., C.R., Foundations for Microwave Engineering. McGraw-Hill Co., 1966(New York). 33. H., L.W., Coupled Mode and Parametric Electronic. John Wiely & Sons Inc., 1960(New York). 34. 黃宏嘉, 微波原理. 科學出版社, 1963. 卷1ž.
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