臺灣博碩士論文加值系統

光學元件的品質與製程中殘留應力的控制有極重要的關聯性。應力變質層的存在會破壞材料的均質性，進而使鏡片的光學性質發生變化，造成鏡片之雙折射現象。故於本研究中，我們以光學鏡片製程中易使鏡面產生殘留應力的成型及研磨過程為探討的目標，利用X光繞射儀為檢測之工具，分析單晶石英鏡片在加工過程中不同之加工參數所造成之應力損傷深度與大小，探討鏡片表面粗糙度與應力損傷深度的關係，並結合多層前饋式類神經網路建構鏡片成型加工模式，用以離線估測加工應力層深度，以期可精確將成型與研磨後的鏡片的應力層完全移除，確保鏡片光學成像品質及延長使用壽命、降低鍍膜時因高溫而發生崩裂之情形，並可有效的減少製程所消耗的人力與成本。

The quality of an optical device highly relies on the control of the fabrication induced residual stress. The stress-deformed layer will degrade the homogeneity of material and inevitably worsens the quality of the optical device.
In this research, the curve-generation (CG) and the grinding process of an optical device, which are likely to produce residual stresses, are elaborately investigated. The single crystal quartz is adopted as the material of the optical lens. The X-ray diffractometer is implemented to measure the depth of the fabrication induced residual stress. The relationships between the depth of the stress-deformed layer and the surface roughness of the optical lens are thus discussed. To systematically estimate the depth of the stress-deformed layer and be able to precisely remove it, the neural network approach is employed to model the nonlinear lens fabrication processes. Experimental results demonstrate that the proposed methodology can effectively detect and get rid of the fabrication induced residual stress.

目錄
中文摘要………………………………………………...………….Ⅰ
英文摘要…….……………………………………...…….……...…Ⅱ
致謝………………………………………………………..…………Ⅲ
目錄…………………………………………………………….…….Ⅳ
圖目錄……………………...……………………………….…..…...Ⅵ
表目錄……………………………………………………………….Ⅸ
第一章 序論…………………………………………………………1
1.1 研究動機與目標……………….………………………..1
1.2 論文大綱….………………….…………..……….……..3
第二章 殘留應力分析.…………………………………….……....4
2.1光學鏡片製程……………………………………………..4
2.2 殘留應力的成因………………………………………….7
2.2.1 應力-光學定律……………………………..………8
2.2.2 成型磨削機制………………………….….………11
2.3 殘留應力量測技術…….………………………………..12
2.4 表面性能指標…………………………………………...14
2.5 表面粗糙度與應力變質層的關係……………….……..16
第三章 X光繞射原理…………………………………….……...17
3.1 X光繞射基本原理介紹…………………………….……17
3.2 X光繞射儀掃瞄模式…………………………………..…19
3.3 X光繞射法於殘留應力檢測之理論………….……..…..24
3.4 X光穿透深度……………………………………….……29
3.5 X光繞射峰寬化機制……………………………….……32
3.5.1晶粒寬化效應………..…………………….….……32
3.5.2應變寬化效應………………………………….…...33
第四章 實驗架構與結果討論………………………...………….35
4.1 實驗規劃………………………………………..………...35
4.1.1光學鏡片成型實驗……………………….………...35
4.1.2光學鏡片研磨實驗……………………….………...36
4.1.3 X光繞射量測……….…………………….………..37
4.2 實驗設備………………………………………….……....39
4.3 實驗結果………………….……………………….……...42
4.4 鏡片成型加工模式建立………….……………….……...45
第五章 結論與未來展望…………………………………………..62
5.1 結論………………………….…………………………....62
5.2 未來展望……………………………………………….…63
參考文獻………………………………….…………………………..64

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