參考文獻
[1] B.D.Cullity, “Element of X-ray Diffraction”,
[2] 許樹恩,吳泰伯, “X光繞射原理與材料結構分析”,中國材料科學學會,1993
[3] J.A.Savage, “Infrared Optical Materials and their Antireflection Coating”, Adam Hilger, 1985
[4] I.C.Noyan, “Effect og Gradients in Multi-Axial Stress State on Residual Stress Measurements with X-Rays”, J.Metal.trans.A, Vol.14A, p249, 1983
[5] S.Marco, et al., “Stress Measurements of SiO2-Polycrystalline Structures for Micromechanical Devices by Means of Infrared Spectroscopy”, IEEE, p209, 1991
[6] 櫻井良文等, “新陶瓷超精密工學”, 復漢出版社,1984
[7] 黃炳淮, “X光繞射在殘留應力之應用”, 科儀新知,第22卷,第2期,p23,1990[8] P.Sutta, et al., “MacroStress Formation in Thin Films and Its Investigation by X-ray Diffraction”, IEEE, p227, 1998
[9] H.Dolle, et al., “Residual Stresses in Ground Stells”, J.Metal.trans.A, Vol.11A, p159, 1980
[10] P.Chatterjee, “Strain distributions in cold-worked-PbSb alloys from X-ray line profile analysis”, J.Alloys and Cpmpounds, p160, 1999
[11] S.Milita, “X-ray Rocking-Curve analysis of crystal which buried amorphous layer. Case of ion-implanted silicon”, J.Appl.Cryst. p666~672, 1995
[12] 王志方,“材料表面測定技術”,復漢出版社,1994
[13] “Schott Optical Glass”
[14] B.M.Clemens et al., MRS Bulletin, p46, 1992
[15] K.V.Acker, et al., J.Appl.Cryst., Vol27, p56, 1994
[16] B.C.Larson et al., “X-ray study of lattice strain in boron implanted laser annealed silicon”, J.Appl.Phys., Vol.51, 1980
[17] K,V,Acker, “Characterization of thin nickel electrocoations by the low-incident-beam-angle diffraction method”, J.Appl.Cryst., 1994
[18] 卡帕吉恩,“機械製造”,文京出版社,1998
[19] 鄭信民、林麗娟,“X光繞射應用簡介”,工業材料雜誌,181期,2002