參考文獻
1.李玉華,”透明導電膜及其應用”,科儀新知,12卷第一期(79),p94.2.J. L Vossen,”Transparent Conducting Films”,Physics of Thin Films,9(1977), p1.
3.L. Davis,”Properties of Transparent Conducting Oxides Deposited at Room Temperature”,Thin Solid Films,23 (1993),p1.
4.許國銓,”科技玻璃-高性能透明導電膜玻璃”,材料與社會,84期(82),p110.5.溫志中,”ITO透明導電膜之濺鍍技術展望”,工業材料,166期(89),p140.6.E. Shanthi,A. Banerjee,V. Dutta and K.L Chopra,“Electrical and Optical Properties of Tin Oxide Films Doped with F and (Sb+F)”,J. Appl. Phys.,53 (1982), p1615.
7.曲喜新、楊邦朝、姜節儉、張懷武編著,“電子薄膜材料”,北京科學出版社出版,(1996),p.93.
8.C. Eberspacher,A.L. Fahrenbruch and R.H. Bude,“Properties of ZnO films deposited onto InP by spray pyrolysis”,Thin Solid Films, 136(1986),p1.
9.J. Hu and R.G. Gordon,”Textured aluminum-doped zinc oxide thin films from atmospheric pressure chemical-vapor deposition”,J. Appl. Phya.,71(1992), p880.
10.王敬龍,”以溶膠-凝膠法製備ITO薄膜之製程研究”,國立成功大學材料科學及工程研究所碩士論文,(1996),p36.11.T. Minami,H. Sato,T. Sonoda,H. Nanto and S. Takata,”Influence of substrate and target temperature on properties of transparent and conductive doped ZnO thin films”,Thin Solid Films,171(1989),p307.
12.K.Wasa,S. Hayakawa,“Handbook of Sputter Deposition Technology”,Noyes Publications,(1992) Chap.4,p81.
13.王褔貞,聞立時,”表面沉積技術”,機械工業出版社,p114.
14.林昭憲,”以電漿化學氣相沉積法蒸鍍氧化鋁薄膜之研究”,國立成功大學材料科學及工程研究所碩士論文(1995),p4.15.B. Chapman,”Glow Discharge Processes”,John Wiley & Sons,New York,(1980) Chap.6,p260.
16.T. Minami,H. Nanto and S. Takata,“High conductive and transparent aluminum doped zinc oxide thin films prepared by RF magnetron sputtering”,Jpn. J. Appl. Phy.,23(1984),L280.
17.T. Minami,H. Sato,H. Nanto and S. Takata,“Group Ⅲ Impurity Doped Zinc Oxide Thin Films Prepared by RF magnetron sputtering”,Jpn. J. Appl. Phy.,24 (1985), L781.
18.B. Szyszka,S. Jager,“Optical and electrical properties of doped zinc oxide films prepared by ac magnetron sputtering”,Jpn. Non-Cry. Solids.,218(1997), p74.
19.H.L. Hartnagel,A. K. Jain and C. Jagadish,”Semiconducting Transparent Thin Films”,published by Institute of Physics Publication,(1995),p17.
20.余樹楨,”晶體之結構與性質”,渤海堂文化事業有限公司,p255.
21.West,Anthony R.“Basic Solid State Chemistry”,(1988),p37.
22.H. L. Hartnagel,A. K. Jain and C. Jagadish,“Semiconducting Transparent Thin Films”,published by Institute of Physics Publication,1995,Chap. 3.
23.R. Wang,W. Sleight,R. Platzer and A. Gardner,“Nonstoichiometric Zinc Oxide and Indium-Doped Zinc Oxide: Electrical Conductivity and 111In-TDPAC Studied”,J. Sol. St. Chem.,122 (1996),166.
24.R. Wang,W. Sleight and D. Cleary,“High Conductivity in Gallium-Doped Zinc Oxide powders”,Chem. Mater.,8 (1996),433.
25.M. Harsdorff,“Thin influence of charged point defects and contamination of substrate surface on nucleation”,Thin Solid Films,116(1984),p55.
26.田民波,劉德令,”薄膜科學與技術手冊”上冊,機械出版社,p14.
27.J. Venables,”Nucleation and Growth of Thin Films”,Rep. Phys.,47(1984), p399.
28.J. A. Thornton,“Influence of Apparatus Geometry an d Deposition Condition on the Structure and Topography of Thick Sputtered Coating”,J. Vac. Sci. Techno.,11(1974),666.
29.楊錦章,”基礎濺鍍電漿”,電子發展月刊,68期(72),p13.
30.T. Minami,H. Sato,K. Ohashi,T. Tomofuji and S. Takata,“Conduction mechanism of highly conductive and transparent zinc oxide thin films prepared by magnetron sputtering”,J. Cry. Grow.,117(1992),p370.
31.B. Chapman,“Glow Discharge Processes”,John Wiley & Sons. Inc. N.Y.,(1980)
Bernhard Wolf,“Handbook of Ion Sources”,CRC. Press. Inc.,New York,1995.
32.B. Chapman,“Glow Discharge Processes”,John Wiley & Sons. Inc. N.Y., (1980),ch.6.
33.F. Shinoki and A. Itoh,“Mechanism of RF reactive sputtering”,J. Appl. Phys. 46[8](1975),p3381.
34.S. Berrg,H. O. Blom,T.Larsson and C. Nender,”Modeling of reactive sputtering of compound materials”,J. Vac. Sci. Technol.,A5[2](1987),p202.
35.B. D. Cullity,”Diffraction: Direction of Diffracted Beams ”Element of X-ray diffraction second edition.
36.D. Jiles,”Introduction to the Electronic Properties of Materials“,Chapman & Hill,1994.
37.A. Sarkar,S. Ghosh,S. Chaudhury and A. K. Pal,“Studies on electron transport properties and the Burstein-Moss shift in indium-doped no films”,Thin Solid Films,204,(1991),p255.