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研究生:幸盟凱
研究生(外文):Meng-Kai Hsing
論文名稱:磊晶Py╱Ru╱Py三層膜之磁阻與磁性之研究
論文名稱(外文):Studies of magnetism and mgnetoresistance in Py╱Ru╱Py trilayers
指導教授:黃榮俊黃榮俊引用關係
指導教授(外文):J.C.A Huang
學位類別:碩士
校院名稱:國立成功大學
系所名稱:物理學系碩博士班
學門:自然科學學門
學類:物理學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:103
中文關鍵詞:耦合振盪反鐵磁耦合巨磁阻
外文關鍵詞:NiFe╱RuGMRmagnetoresistance
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本實驗是利用MBE系統成長高品質的 NiFe80Fe20 / Ru / NiFe80Fe20 三層膜,以選取適當的基板(Al2O3(11-20))與不同間隔層(Ru)厚度,藉此討論此三層膜系統之磁阻效應與隨著Ru厚度變化出現反鐵磁耦合振盪的情形。
近來已經有許多關於鐵磁性材料透過非磁性物質產生交換耦合與其巨磁阻(giant magnetoresistance)效應的研究,例如:Fe/Cr、Co/Cr、Co/Ru這些系統已經被廣泛的探討,在本實驗中我們利用此系統—NiFe80Fe20 / Ru / NiFe80Fe20 三層膜,並成功地找到反鐵磁耦合振盪現象。實驗中藉由反射式高能電子繞射儀(RHEED)探討其磊晶結構;縱向磁光科爾效應儀(LMOKE)、震動樣品分析儀(VSM)來量測其磁性行為;原子力顯微鏡(AFM)來觀察其原子表面型態;再利用磁阻量測儀(MR)看其磁阻變化率。以研究提升磁阻率(DR/Ro)為目的。
By molecular beam epitaxy (MBE), the author has prepared high-quality NiFe80Fe20 / Ru / NiFe80Fe20 trilayers with different spacer (Ru) thickness on Al2O3(11-20) substrates. This thesis study on the magnetoresistance effect and the oscillation behavior of antiferromagnetic coupling as a function of the Ru thickness in Ni80Fe20╱Ru╱Ni80Fe20 trilayers.
The oscillation of the interlayer coupling as a function of the spacer thickness and the giant magnetoresistance effect have been extensively studied in recent years. In particular, Fe/Cr, Co/Cr, Co/Cu systems have been studied by different authors. In this work, we use the trilayers system—NiFe80Fe20 / Ru / NiFe80Fe20 success to find the oscillation behavior of antiferromagnetic coupling. In our experiment, Reflection high-energy electron diffraction (RHEED) has been employed to study the epitaxial relation and surface of the trilayers structure. Longitudinal magneto-optical Kerr effect (LMOKE) and vibration sample Magnetometer (VSM) have been used to investigate the magneto-optical properties. Atomic Force Microscopy (AFM) has been used to observe the atom and roughness on the trilayers surface. We also use the Magneto-Resistance (MR) to observe the ratio of resistance with field.
第一章 前言與簡介
§1-1 前言1
§1-2 磁性的起源2
§1-3 磁阻簡介4
§1-4 磁阻效應現象及原理6
§1-5 GMR效應10
§1-6 磁異向性簡介16
§1-7 磁異向性的量測30
§1-8 界面粗糙度35
§1-9 交換耦合行為37
第二章 實驗儀器介紹
§2-1 成長樣品儀器:分子束磊晶系統43
§2-2 實驗測量儀器
【一】 磁光科爾效應儀49
【二】 反射式高能電子繞射儀55
【三】 原子力顯微鏡57
【四】 VSM61
【五】 磁阻量測儀62
第三章 實驗步驟
§3-1 系統真空環境的準備65
§3-2 基板的準備66
§3-3 樣品成長66
§3-4 樣品量測67
第四章 實驗結果和討論
§4-1 Ni80Fe20╱Ru╱Ni80Fe20三層膜於Al2O3(11-20)基板的成長機制與結構70
§4-2 改變Ru層厚度對於Ni80Fe20╱Ru╱Ni80Fe20三層膜反鐵磁耦合的影響77
§4-3 改變Ru層厚度對於Ni80Fe20╱Ru╱Ni80Fe20三層膜磁阻變化率的影響82
§4-4 改變Ni80Fe20╱Ru╱Ni80Fe20三層膜成長溫度對於飽和場與磁阻的影響90
第五章 結 論98
參考文獻 Reference100
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