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研究生:李侃峰
研究生(外文):Kang-Feng Li
論文名稱:濺鍍腔內之陰極靶材電磁效應分析
論文名稱(外文):Computer Aided Analysis ofMagnetron Cathode in Sputtering Chamber
指導教授:楊世銘楊世銘引用關係
指導教授(外文):Shih-Ming Yang
學位類別:碩士
校院名稱:國立成功大學
系所名稱:航空太空工程學系碩博士班
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:英文
論文頁數:43
中文關鍵詞:電磁效應分析靶材濺鍍
外文關鍵詞:magnetrontargetsputtering systemansyscathode
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濺鍍沉積技術已經被廣泛的應用,特別是半導體領域。對於濺鍍沉積方式中的磁式濺鍍沉積系統,有著長久以來的缺點─靶材利用率過低,造成靶材汰換週期過短,單位靶材使用成本過高。本文首先探討磁式濺鍍沉積系統原理,找出影響靶材表面離子轟擊主要因素,進而提出一傾斜式磁座設計。傾斜式磁座設計經由有限元素分析軟體-ANSYS,分析磁座最適當之磁孔傾斜角度,將磁孔傾斜角度應用到實際靶座製作。靶座製作乃採用一複合式設計,僅使半數的磁孔傾斜加工,而另半數則維持原垂直磁孔,其目的為降低確認實驗中濺鍍腔內環境條件差異問題,在同一腔室內進行濺鍍使用,以有效比較此新式設計的改良成果。分析結果顯示,磁座的磁孔傾斜式設計,能有效提昇磁力線平行分佈於靶材表面,平均靶材表面離子轟擊情形,達到增加靶材利用率。從磁式靶座之電腦輔助分析模擬到實際測試驗證都顯示出設計與實際的高度符合,可以改善靶材利用率。
It is known that the sputter deposition technology has been widely applied in semiconductor industry. However, the problem of short cycle life of target in magnetron sputtering system has been a major issue. An inclined magnet design in magnetron cathode is developed and simulated by finite element software-ANSYS in this thesis. With the magnet inclination angle, the magnetic flux distribution over target surface can be effectively and efficiently enhanced so as to smooth the unbalanced target erosion. A hybrid magnet set is developed to validate the difference between the inclined and original design under the same process condition. Experiments show that the magnet inclination design closely meets with the numerical analysis and indeed enhances the using rate of target.
CONTENTS
Page
ABSTRACT . i
CONTENTS .ii
LIST OF TABLES .iv
LIST OF FIGURES .v
CHAPTER
I INTRODUCTION 1
1.1 Motivation 1
1.2 Literature Review 1
1.3 Outline 3
II MAGNETRON SPUTTERING SYSTEM 4
2.1 Introduction 4
2.2 Sputtering System 5
2.3 Conclusion 7
III FINITE ELEMENT MODELING AND SIMULATION 12
3.1 Introduction 12
3.2 Simulation Procedures 12
3.3 2-D Simulation 13
3.4 Conclusion 16
IV MAGNETRON CATHODE DESIGN 27
4.1 Introduction 27
4.2 Modification of the Original Design 27
4.3 Experiment of the New Design 28
4.4 Conclusion 30
V SUMMARY AND CONCLUSIONS 40
REFERENCES 41

LIST OF TABLES
Page
3.1 Material properties of magnetron cathode. 17
3.2 Percentage error between element PLANE13 and PLANE53. 18
3.3 Average magnetic flux density at different angles. 19
4.1 The target erosion results of the hybrid magnet set. 31

LIST OF FIGURES
Page
2.1 The diagram of DC, RF, MF sputtering. 8
2.2 The moving path of electrons in the orthogonal magnetic (B), oriented perpendicularly to the page, and electrical (E) fields. 9
2.3 Erosion patterns of rectangular magnetron cathode. 10
2.4 Target at pre-and-post sputtering processes.11
3.1 Finite element model of a cathode, (a) 2-D model and (b) meshed model. 20
3.2 2-D magnetic flux line distribution. 21
3.3 2-D magnetic flux line distribution and the target erosion shape. 22
3.4 The different magnets set, (a) Angled method and (b) Heras methode. 23
3.5 2-D magnetic flux distribution of different magnet set. 24
3.6 2-D magnetic flux distribution at different angles.25
3.7 The magnet set and cooling guider. 26
4.1 The arrangement of original magnet set. 32
4.2 The arrangement of inclined magnet set. 33
4.3 The geometry of the hybrid magnet set. 34
4.4 The processed hybrid magnet set. 35
4.5 The installed magnet set. 36
4.6 The sputtered target. 37
4.7 The cross section profile of sputtered target. 38
4.8 The measuring ranges of the sputtered target.39
REFERENCES
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