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研究生:金育慶
研究生(外文):Yue-Ching Jin
論文名稱:產品缺陷即時偵測及回饋控制系統--應用於半導體光罩產業
論文名稱(外文):Real Time Defect Monitoring & Dynamic Feedback Control System - - Applied in Photo Mask Industry
指導教授:劉漢容劉漢容引用關係
指導教授(外文):Han-Jon Liu
學位類別:碩士
校院名稱:國立成功大學
系所名稱:高階管理碩士在職專班
學門:商業及管理學門
學類:其他商業及管理學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:60
中文關鍵詞:光罩缺陷即時偵測及回饋控制統計製程管制
外文關鍵詞:PhotomaskDefectReal time monitoring and feed back controlSPC
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  本研究主要是針對半導體之光罩產品,研發一套產品缺陷即時偵測及回饋控制系統,進而藉由此系統有效地即時偵測產品異狀,並降低光罩產品之缺陷,同時也降低製造成本及提高光罩產品良率。本論文先就光罩產品的缺陷進行分類,歸納出各種缺陷的種類及其對光罩產品的影響。接著再依據各類文獻,探討可能的解決方法,最後提出六個資訊系統模組,並藉由此六個模組之各項功能,提出即時有效之分析結果。本系統所構建之六個模組為 : 1. 光罩SPC偵測管制系統 ( Mask SPC System) 2.光罩原材枓品質分析 ( Blank Analysis System) 3.缺陷來源分析( Defect Source Analysis) 4. 操作分析( Operator Analysis) 5.光罩產品失效模式分析 ( Mask Tooling Failure Mode Element Analysis). 6. 光罩修補成本與製造時間之控制系統(Mask Repair Cost and Cycle Time Control System)。本系統以光罩產品缺陷資料庫為主要資料來源,並搭配其它統計製程管制系統 ( Statistical Process Control System),進而能即時地偵測每項不同產品的缺陷是否有異常之變化。同時,在偵測分析缺陷有異常後,再配合其它相關模組,進一步分析不同的缺陷是由那些可能因素所引起,進一步在最短的時間內,有效地降低光罩產品之缺陷,而使光罩製造廠商能提高光罩產品之良率、降低製造成本及縮短製造時間( Cycle time),建立更佳之企業競爭力。
  This thesis presents a photomask defect real time monitoring and feed back control system to detect and analyze the defect status. By means of this system, the defect count will be controlled and decreased. Meanwhile, the mask’s yield will be improved and the manufacturing cost will be lowered. First of all, this thesis analyzes the defect type and the defect impact to the mask. Next, this thesis discusses the factors which induce the defect on the mask. Finally, the thesis propose a system with 6 modules to provide the essential functions. The 6 modules are : 1. Mask SPC System 2. Blank Analysis System 3. Defect Source Analysis 4. Operator Analysis 5. Mask Tooling Failure Mode Element Analysis. 6. Mask Repair Cost and Cycle Time Control System. The “Mask SPC System” will monitor the products defect count status, and other system will be able to find the advanced possible root cause of the defect. Thus, this system will enhance the product’s yield, lower the mask tooling cost and shorten the mask tooling cycle time and then to build the stronger competition for the mask enterprise.
第一章 緒論 8
1.1 背景與動機 8
1.2 研究目的 10
1.3 研究範圍 10
1.4 論文研究架構 12
第二章 文獻回顧 13
2.1 缺陷的定義 13
2.2 降低缺陷嚴重性及數量之方法 13
2.2.1 供應商所提供原物料的缺陷 14
2.2.2 在光罩製造過程中的化學、物理變化所產生的缺陷 14
2.3 即時偵測及回饋系統 15
第三章 缺陷種類之分析及即時偵測回饋控制系統之架構 17
3.1 光罩缺陷種類之分析 17
3.2 由缺陷發生的階段,判斷缺陷的來源 18
3.3 光罩缺陷數目之統計分配及統計製程管制之設計 20
3.4 本系統製程缺陷降低之方法 23
3.5 光罩缺陷即時偵測及回饋控制系統架構 24
第四章 系統發展 30
4.1 光罩缺陷統計製程管制系統 30
4.2 光罩原材料石英玻璃品質之分析系統 33
4.3 缺陷來源及發生階段之分析系統 36
4.3.1 相位移光罩品鉻膜殘留之分析 37
4.3.2 缺陷發生階段之分析 38
4.4 人員操作分析 39
4.5 工程失效模式之分析系統 40
4.6 光罩修補成本與製造時間之控制 42
第五章 實作範例與討論 45
5.1 主畫面模組 45
5.2 光罩統計製程管制系統 46
5.2.1 缺陷統計製程管制系統 46
5.2.2 缺陷警示系統 47
5.3 光罩原材料石英玻璃品質之分析系統 48
5.4 缺陷來源之分析系統 49
5.4.1 相位移光罩產品鉻殘留與清洗關連性之分析 49
5.4.2 缺陷發生階段之分析 50
5.5 操作分析 52
5.6 工程失效模式之分析系統 53
5.7 光罩修補成本與製造時間之控制 54
第六章 結論及後續研究與建議 57
6.1 結論 57
6.2 後續研究與建議 57
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