Appel, B. R., Tokiwa, Y., Kothny, E. L., Wu R. and Povard, V., “Evaluation of procedures for measuring atmospheric nitric acid and ammonia”, Atmos. Environ., Vol. 22, No. 8, pp. 1565-1573, 1988
Cassinelli, M. E., “Laboratory Evaluation of Silica Gel Sorbent Tubes for Sampling Hydrogen Fluoride”, Am. Ind. Hyg. Assoc. J., Vol. 47, pp219-224, 1986
English, S., Cleanrooms, November (1996) pp 25.
Frickinger, J., Bugler, J., Zielonka, G., Pfitzner, L., Ryssel, H., Hollemann, S. and Schneider, H., “Reducing Airborne Molecular Contamination by Efficient Purging of FOUPs for 300-mm Wafer─The Influence of Materials Properties”, IEEE Transactions on Semiconductor Manufacturing, Vol. 13, ISSUE 4, pp427-433, November 2000
Grinshpun, S. A., Willeke, K., Ulevicius, V., Juozaitis, A., Terzieva, S., Donnelly, J., Stelma, G. N. and Brenner, K. P., “Effect of impaction, Bounce and Reaerosolization on the collection Efficiency of Impingers”, Aerosol Science and Technology, Vol. 26, pp326-342, 1997
Juozaitis, A., Trakumas, S., Girgzdiene, R., Girgzdys, A., Sopauskiene, D. and Ulevicius, V., “Investigations of gas-to-particle conversion in the atmosphere”, Atmospheric Research, Vol. 41, pp 183-201, 1996
Kobayashi, K., Tamura, M., Shimada, T. and Sakai, H., “Chemical Autodelivery System,” Denski Zairyo (Electronic Material), Sup.Vol., pp. 157, 1993
Lue, S. J., Wu, T., Hsu, H. and Huang, C., “Application of Ion Chromatography to the Semiconductor IndustryⅠ─Measurement of Acidic Airborne Contaminants in Cleanrooms” Journal of Chromatography A, Vol.804, pp273-278. 1998
Lue, S. J. and Huang, C., “Application of Ion Chromatography to the Semiconductor IndustryⅡ─Determination of basic Airborne Contaminants in Cleanrooms”, Journal of Chromatography A, Vol.850, pp283-287. 1999
Muller, A. J., L. Psota-Kelty, A., Krautter, H. W. and Sinclair, J. D., “Volatile cleanroom contaminants-Sources and detection”, Solid State Technol., pp61-72, Sept. 1994
Macdonald, S. A., Hinsberg, W. D., Wendt, H. R., Clecak, N. J. and Willson, C. G., "Airborne Contamination of a Chemically AmplifiedResist.I. Identification of Problem", Chem.Mater., Vol. 5, pp 348, 1993
Nemitz, E., Sutton, M. A., Wyers, G. P., Otjes, R. P., Schjoerring, J. K., Gallagher, M. W., Parrington, J., Fowler, D. and Choularton, T. W., “Surface/atmosphere exchange and chemical interaction of gases and aerosols over oilseed rape”, Agricultural and Forest Meteorology, Vol. 105, pp427-445, 2000
NIOSH Manual of Analytical Methods (NMAM), No. 7903, National Institute for Occupational Safety and Health (NIOSH), Fourth Edition, 1994.
Oikawa, A., Hatakenaka, Y., Ikeda, Y., Kokubo, Y., Tanishima, M., Santoh, N. and Abe, N., "Effect of Reducing Contamination Concentration When Patterning a Chemically Amplified Positive Resist", Proceedings of Spie, Vol. 2438, pp 599-608, 1995
Pate, K. T., “Examining the Design, Capabilities, and Benefits of Bulk Chemical Delivery System”, Microcontamination Vol. 9, No. 10, pp. 25, 1991
SEMI F21-95, SEMI standard, Semiconductor Equipment and Materials International, 1995
Tamaoki, M., Nishiki, K., Shimazaki, A., Sasaki, Y. and Yanagi. S. “The effect of airborne contaminants in the cleanroom for ULSI manufacturing process” Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 95 Proceedings. IEEE/SEMI. pp. 322 —326. 1995
The International Technology Roadmap for Semiconductors 2001 Edition ─ Yield Enhancement, SEMATECH, pp 11, 2001
Tsai, C. J., Huang, C. H., Wang, S. H. and Shin, T. S., “Design and testing of a personal porous-metal denuder”, Aerosol Sci. Technol. Vol 35, pp 1-6, 2001.
Vigil, J. C., Barrick, M. W. and Grafe, T. M., "Contamination Control for Processing DUV Chemically Amplified Photoresists", Proceedings of Spie, Vol. 2438, pp 626-643, 1995
Yamashita, A., Taguchi, T. and Watanabe, T., "Direct Evaluation of Airborne Contamination in Chemically Amplified Resist Films", Proceedings of Spie, Vol. 2438, pp 617-625, 1995
Yasuhiro Matsuyoshi, Yuuichi Satoh, Tsutomu Shinozaki, “High-Speed and Multiple-point Ammonia gas Monitor System”, IEEE 1999
“標準分析參考方法2401”,行政院勞委會勞工安全研究所(IOSH),1994
“標準分析參考方法2901”,行政院勞委會勞工安全研究所(IOSH),1991
“空氣中無機酸類之檢測方法NIEA A426.71B”,行政院環保署環境檢驗所(NIEA),1990
“空氣中無機酸類之檢測方法NIEA A435.70C”,行政院環保署環境檢驗所(NIEA)。1997
王榮德,『硫酸暴露作業工人之長期健康危害研究』,行政院勞委會勞工安全研究所委託研究報告,1998
大西謙之、和田陽、黃寶川,“半導體廠超級無塵室的化學污染和“PURATEX”化學過濾器之介紹”,電子月刊, vol.5, No. 9, pp. 164-168. 1999環境檢驗室品質管理相關文件,環保署環檢所,民88年1月4日函發。
採樣分析方法通則,勞工安全衛生研究所採樣分析參考方法資料庫,勞工安全衛生研究所。http://www.iosh.gov.tw/anmethod.htm. 民91年6月10日