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研究生:陳晏佐
研究生(外文):Yann-Tzuo Chen
論文名稱:分色光柵的設計製作之研究
論文名稱(外文):Studies on the Design and Fabrication of Color Gratings
指導教授:陸懋宏
指導教授(外文):Mao-Hong Lu
學位類別:碩士
校院名稱:國立交通大學
系所名稱:光電工程所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:75
中文關鍵詞:分色光柵法嚴格耦合波理論電子束微影
外文關鍵詞:color garting methodthe rigorous coupled-wave theoryE-beam lithography
相關次數:
  • 被引用被引用:3
  • 點閱點閱:430
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  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:1
在單片式液晶投影顯示系統中,利用彩色濾光片作為分光元件是主要的方式,濾光片之穿透效率不高再加上孔徑比率的關係,使得整體效率不超過30%,這是濾光片的最大缺點,而且由於濾光片為穿透式會使系統有發熱的問題。
利用繞射光柵作為單片式投影系統的分光元件稱為分色光柵法,以反射式光柵加上微透鏡代替濾光片。由於所設計之分色光柵的光柵週期已經小於可見光波長,因此理論上必須以向量繞射理論作為分析的基礎,本論文我們使用嚴格耦合波理論來分析一維表面刻紋型光柵。
在光柵的設計上,主要是決定符合設計要求的光柵參數,製作上由於光柵線寬十分細小,我們使用電子束微影技術來製作光柵。根據設計的光柵參數,我們製作出四階表面刻紋型光柵,最小線寬達到0.15μm。最後對光柵繞射效率量測的結果我們證明出嚴格耦合波理論的正確性。

In the single-panel liquid crystal projection system, the color filter is the common device used for separating light. Because of the low transmitted efficiency of the color filter, the total efficiency of the system is less than 30%. And the transmitted filter has the problem of heat dispersing in the system.
Using diffraction gratings for separating light is called the Color Grating Method. This method uses the reflected grating and micro lens instead of the filter. We analyze the one-dimensional surface relief grating by the vector diffraction theory, this is because the line-width of the grating is same order of magnitude as the wavelength of light. The theory is also called the rigorous coupled-wave theory (RCWT).
We design the color grating by determining parameters of the grating and an optimization program by the RCWT is made. The line-width of designed gratings is so small that we made them with E-beam lithography techniques. In this paper, we have made four-level gratings with line-width about 0.15um. Finally, we measure the diffraction efficiency of the grating and show that the RCWT is correct.

第一章 緒論………………………………………………………….. 1
第二章 理論與模擬程式分析.....……………………………….…… 3
2-1 前言................................................................................................. 3
2-2 嚴格耦合波理論............................................................................. 4
2-2-1 電容率的計算.............................................................................. 4
2-2-2 嚴格耦合波理論的模型.............................................................. 8
2-2-3 模擬程式的使用.......................................................................... 14
第三章 分色光柵的設計…………………………………………… 15
3-1 前言................................................................................................ 15
3-2 光柵方程式的定義....................................................................... 17
3-2-1 光柵平面的角度定義................................................................ 18
3-2-2 穿透及反射式光柵................................................................... 18
3-2-3 角度負值之階數定義............................................................... 20
3-3 光柵參數之選擇........................................................................... 21
3-3-1 聯立方程組的建立.................................................................... 21
3-3-2 三色光垂直對稱出射................................................................ 22
3-3-3 三色光斜向對稱出射................................................................ 24
3-3-4 三色光波長解範圍的表示........................................................ 27
3-3-5 三色光波長的選擇................................................................... 33
3-3-6 光柵的外型輪廓........................................................................ 35
3-3-7 光柵的材質................................................................................ 35
3-3-8 光柵參數的決定........................................................................ 37
第四章 微光柵製程技術…………………………………………… 40
4-1 微光學元件的製作方法............................................................... 40
4-2 半導體製程於微光柵的製作....................................................... 42
4-2-1 光罩的製作................................................................................ 42
4-2-2 晶圓的清洗................................................................................ 43
4-2-3 微影--光阻塗佈與顯影定影...................................................... 44
4-2-4 微影--曝光.................................................................................. 48
4-2-5 蝕刻技術.................................................................................... 53
4-2-6 微光柵之製作流程.................................................................... 57
4-3 微光柵的製作結果........................................................................ 58
4-3-1 零層標記的製作........................................................................ 58
4-3-2 蝕刻後檢視................................................................................ 59
4-3-3 光罩多層對準問題.................................................................... 60
4-3-4 三道光罩蝕刻後檢視................................................................ 61
第五章 實驗結果與量測…………………………………………… 62
5-1 光柵切面量測................................................................................ 62
5-2 光柵繞射效率與角度量測............................................................ 63
5-3 實驗誤差與討論............................................................................ 69
第六章 結論………………………………………………………… 70
附錄 ………………………………………………………………… 71
參考文獻 …………………………………………………………… 74

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