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研究生:黃雅詩
研究生(外文):Ya-shih Huang
論文名稱:微凹平面鏡及矽光學桌之組裝設計
論文名稱(外文):Design of Concave Micro-mirrors and Optical Element Packaging
指導教授:紀國鐘紀國鐘引用關係
指導教授(外文):Guo-chung Chi
學位類別:碩士
校院名稱:國立中央大學
系所名稱:物理研究所
學門:自然科學學門
學類:物理學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:英文
論文頁數:72
中文關鍵詞:微凹平面鏡微光電系統矽光學桌
外文關鍵詞:micro-mirrorMEMSpackaging
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  • 收藏至我的研究室書目清單書目收藏:1

本篇論文設計了兩種微平面鏡。第一種微平面鏡稱為離軸微平面鏡,主要是根據光線描線法的概念用來設計出等效的微透鏡光學元件。此微平面鏡可利用電子束微影機及電漿蝕刻技術來製作。我們也從製程上難易程度的觀點來比較繞射光學元件及離軸平面鏡若要達到相同的光學條件所需的最大長寬比,我們得到的結論是:當所需的數值孔徑小於 0.6 時, 製作離軸微平面鏡會比製作 SiO2 材料的繞射光學元件容易;當所需的數值孔徑小於 0.2 時, 製作離軸微平面鏡會比製作GaN 材料的繞射光學元件容易。
第二種設計為一微平面鏡加上光柵。此平面鏡的設計主要是根據羅倫圓定律。此微平面鏡的設計可利用電子束微影機及電漿蝕刻技術來製作,而光柵則可利用濕蝕刻技術來達成。
我們也提出了一種被動式的對準方法將微光學元件組裝到一個矽光學桌上。我們利用電漿蝕刻技術以及濕蝕刻技術來達成此設計的製作。這個設計不但可以讓各種微光學元件都整合在矽光學桌上,並且可以精準的控制每個方向上的對準。


In this dissertation, two kinds of concave micro-mirrors are designed. The off-axis micro-mirror is designed based on ray tracing for the fabrication on silicon substrate using e-beam writer and inductively coupled plasma. The aspect ratios of the surface relief of the diffractive micro-lenses and the micro-mirrors are compared to reduce the fabrication difficulty for the identical optical function. The results show that compared with the micro-lenses in SiO2 and GaN, the micro-mirrors are preferred to be fabricated than micro-lenses if their numerical apertures are lower than 0.6 and 0.2, respectively. Free space echelle grating is designed for Dense Wavelength Division Multiplexing (DWDM) system. It is based on the law of Rowland. It is a hybrid of a concave micro-mirror and blazed gratings. The design of the concave micro-mirror can be carried out on silicon substrate using e-beam writer and plasma etching .The blazed grating can be achieved by fine V-groove etching.
We also demonstrate a novel method to mount micro-opto-electronic devices on a Si bench. Inductively Coupled Plasma ( ICP ) and KOH etching and are performed for carrying out this novel method. The Si-based component after through wafer etching was picked by the optical fibers and placed on the optical bench. This can not only make X, Y, Z, θ and the tilt directions precisely controlled but also be suitable for all components mounting on the optical bench.


Abstract (in Chinese) i
Abstract (in English) iii
Contents v
Figure Captions viii
Table Captions xiii
Chapter1. Introduction
1.1The background of Micro-mirror 1
1.2Overview of this Dissertation 6
Chapter 2. Theoretical Calculation and Simulation
2.1 The Design of Off-Axis Micro-mirror
2.1.1 Theoretical Calculation 7
2.1.2 Design of Off-axis Micro-mirror 9
2.1.3 Formula for Measurement of Focal Length
of the Micro-mirror 12
2.1.4 Maximum Aspect Ratio of the Surface Relief of Diffractive Micro-lenses 13
2.1.5 Simulation 16
2.1.6 Results of the Off-axis Micro-mirror 18
2.2 The Design of Free Space Echelle Grating
2.2.1 Introduction 20
2.2.2 The Design of the Free Space Echelle Grating 20
2.2.3 Results of the Free Space Echelle Grating 25
Chapter 3. Packaging of Optical Elements on Si Optical Bench
3.1 Introduction 26
3.2 Concepts of the Package 26
3.3 The Mask Design for the Packaging of Optical
Components 28
3.4 Through Wafer Etching
3.4.1 Inductive Coupled Plasma Etching 29
3.4.2 KOH Etching 32
3.5 Process 33
3.6 Results of KOH Etching 35
3.7 Results of the Package 36
Chapter 4. Future Work
4.1 Fabrication of Free Space Echelle Grating 38
4.2 Design of the Light Path for Free Space Echelle Grating 39
Figures 40
Tables 66
Reference 67


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