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研究生:杜茂楓
研究生(外文):Mao-feng Du
論文名稱:光強調變雷射書寫機之研製
論文名稱(外文):Laser direct writer with light intensity modulation
指導教授:陳顯禎
指導教授(外文):S. J. Chen
學位類別:碩士
校院名稱:國立中央大學
系所名稱:機械工程研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:66
中文關鍵詞:雷射書寫機光強調變灰階光罩製作
外文關鍵詞:LDW glass
相關次數:
  • 被引用被引用:3
  • 點閱點閱:184
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:0
傳統的繞射光罩製作技術大多利用二階(binary)光罩製作出多階的繞射元件,藉由多重曝光顯微技術以提昇繞射元件的光學效率,然將會造成製程上的煩瑣及繞射元件的誤差,若能直接製作出多階(multi-level)或灰階(grey-level)光罩,將會改善這些誤差的困擾。
國內對於灰階光罩的製程及機台尚屬於起步的研究階段,因此在本論文主要為研發灰階光罩的製作機台,名為光強調變雷射書寫機,並且利用此機台作實際的灰階光罩書寫並加以檢測,同時也將此灰階光罩經由半導體製程所製作出的成品加以量測比較,進而得知此機台所製作出的光罩是否達到要求,並以此來改善機台之精確性與可靠性,進而製作出符合需求的灰階光罩。
Traditionally, the diffractive optical element (ODE) is made by using the multiple binary-level lithography processes to enhance the diffractive efficiency. Due to the multiple exposures, the manufactory error will be included and more complicate processes is need to be considered. Therefore, to overcome these problems, the grey level mask can be used, in which only one exposure is needed to fabricate the optical element.
This project presents that a laser machine with light intensity modulation to fabricate grey level masks. In the writer system, a solid-state laser with the power of 180 mw is used as the working light source. The processed target is laser direct write glass developed by the Canyon Material company. An acoustic-optics modulator (AOM) is used to modulate the laser intensity. To make sure the result of the processed mask, a measurement system is built. The laser direct writer system is already out of the binary methods to manufacture optical mask. The optical elements designer can use the LDW system to design any appropriate mask. Thus, the LDW system is a quite useful system for the ODEs.
摘要i
Abstractii
目錄iii
圖v
表viii
第一章 緒論1
1-1前言1
1-2研究動機與目的2
1-3文獻回顧3
第二章 光強調變雷射書寫機5
2-1系統架構5
2-2程式操控7
第三章 雷射書寫系統11
3-1微處理器控制12
3-2光強調變14
3-2-1聲光調變器14
3-2-2電路控制16
3-2-3傳輸界面資料下載22
3-2-4資料量與記憶體擴充25
3-2-5書寫程序控制與外部中斷26
3-3書寫系統流程29
3-3-1書寫系統整合29
3-3-2書寫程序34
3-4書寫系統校正40
第四章 離線自動對焦45
4-1影像濾波前處理45
4-2自動對焦流程47
4-3對焦校正51
第五章 灰階光罩製作54
5-1系統操控54
5-2實驗結果與討論56
第六章 結論63
參考文獻65
[1]W. Däschner, P. Long, M. Larsson, et al., “Fabrication of diffractive optical elements using a single optical exposure with a grey level mask,” J. Vac. Sci. Technol B. 1995;13:2729-2731.[2]廖宏榮, ”雷射刻板機之研製-半導體與微光機電系統之製程母機,” 國立台灣大學應用力學研究所博士論文, 1998。[3]曲昌盛, ”灰階光罩微影技術製作繞射光學元件,” 光訊, 1999;80:23-27。[4]E. Kely, F. S. U. Jena, M. Platz, et al., ”Continuous profile writing by electron and optical lithography,” Microelectronic Engineering 1997;34:261-298.[5]W. Däschner, M. Larsson, and S. H. Lee, ”Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step,” Applied Optics 1995;34:2534-2539.[6]M. R. Wang and H. Su, “Laser direct-write grey-level mask and one-step etching for diffractive microlens fabrication,” Applied Optics 1998;37:7568-7576.[7]W. Däschner, P. Long, R. Stein, et al., “Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a grey-scale mask on high-energy beam-sensitive glass,” Applied Optics 1997;36:4675-4680.[8]V. Korolkov, A. Malyshev, A. Poleshchuk, et al., “Fabrication of grey-scale masks and diffractive optical elements with LDW-glass,” SPIE 2001;4440:73-84.[9]V. Korolkov, R. Shimansky, A. Poleshchuk, et al., ”Requirements and approaches to adapting laser writers for fabrication of grey-scale masks,” SPIE 2001;4440:256-267.[10]林俊廷, 林烜輝, 周正三, 張哲瑋, 林暉雄, “微凹面型光柵分光元件的分析與應用,” 台灣光電研討會, 高雄, 2001;295-297。[11]J. G. Proakis and D. G. Manolokis, Digital Signal Processing Principles, Algorithm, and Application:3rd edit, Prentice Hall, 1996.[12]R. C. Gonzales and R. E. Woods, Digital Image Processing, Addison Wesley, 1992.[13]F. A. Jenkins and H. E. White, Fundamentals of Optics:4th edit, McGraw-Hill, 1981.
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