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研究生:童啟弘
研究生(外文):Chi-Hong Tung
論文名稱:離子輔助熱蒸鍍紫外光學薄膜之研究
論文名稱(外文):Optical Thin Film Deposited with Ion Assisted for UV Application
指導教授:李正中李正中引用關係
指導教授(外文):Cheng-Chung Lee
學位類別:碩士
校院名稱:國立中央大學
系所名稱:光電科學研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:76
中文關鍵詞:氟化鑭紫外光離子助鍍
外文關鍵詞:LaF3ultravioletion-beam assisted deposition
相關次數:
  • 被引用被引用:11
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  • 收藏至我的研究室書目清單書目收藏:1
本論文將介紹在電阻加熱及電子槍蒸鍍系統中加入離子助鍍法(IAD)製鍍深紫外光區(193nm)之氟化鑭(LaF3)之光學薄膜,主要研究離子輔助法對於薄膜折射率、消光係數、穿透率等光學性質之影響,以及薄膜之水氣吸附、微觀結構、表面粗糙度與結晶性之分析,並探討會令薄膜造成能量損耗的原因,以製鍍出一高品質之光學薄膜,期望能搭配各種低折射率材料做疊加設計,便於提供紫外光區光電科學之應用。
The study of lanthanum fluoride optical thin film deposited by boat and e-beam evaporation (PVD) with ion-assisted deposition (IAD) for UV application was concerned in this thesis. Due to IAD, we can improve optical and micro-structural properties including refractive index、 extinction coefficient、surface roughness and packing density for the production of advanced coatings which are required in laser material processing and semiconductor lithography.
目錄
中文摘要I
英文摘要II
誌謝辭III
目錄IV
圖目錄VII
表目錄X
第一章 緒論1
1.1前言1
1.2光源分類3
1.3文獻回顧4
第二章 原理7
2.1能帶間隙7
2.2離子鍵與金屬鍵、共價鍵之區別10
2.3能量損耗的原因13
2.3.1負離子缺位13
2.3.2雜質15
2.3.3次要鍵結16
2.3.4散射18
2.4氟化物的材料特性19
2.5氟化鑭(LaF3)材料特性22
2.6光學常數計算方法25
第三章 實驗架構與測量儀器29
3.2實驗架構29
3.2.2真空系統29
3.2.3熱電阻加熱蒸鍍系統29
3.2.4電子槍蒸鍍系統30
3.2.5離子輔助系統33
3.2.6監控系統36
3.3測量儀器37
3.3.2紫外光/可見光、近紅外光分光光譜儀37
3.2.2紅外光光譜儀37
3.2.3原子力顯微鏡 (AFM) 原理和架構38
3.2.3.1原子力顯微鏡原理38
3.2.3.2原子力顯微鏡架構41
3.2.4X光繞射儀 (XRD)42
3.2.5場發射掃瞄式電子顯微鏡原理 (SEM)43
第四章 實驗結果與討論44
4.1實驗參數44
4.1.1固定參數44
4.1.2調變參數44
4.2LaF3穿透率光譜圖之分析45
4.3LaF3折射率與消光係數之分析53
4.4堆積密度之分析58
4.5水氣吸收之分析60
4.6微觀結構之分析62
4.7表面粗糙度之分析65
4.8結晶狀態之分析68
第五章 結論70
參考文獻71
圖目錄
圖1-1 短波光源分類圖3
圖2-1 一般光學薄膜材料之穿透率光譜圖8
圖2-2 (a) 直接吸收過程 (b) 間接吸收過程8
圖2-3分子內原子位能函數圖10
圖2-4 兩個振子(oscillators)的座標關係11
圖2-5 正離子缺位跟負離字缺位圖14
圖2-6 兩偶極間凡得瓦鍵的極略圖16
圖2-7 (a) 電對稱原子 (b) 感應電子偶極概略示意圖17
圖2-8為氟化鑭與氟化鋰(LiF)吸收光譜圖24
圖2-9套裝軟體Essential Macleod計算結果27
圖2-10最小平方回歸法密合曲線結果28
圖3-1 蒸發用電子槍工作原理32
圖3-2 離子源系統架構圖34
圖3-3 AFM 儀器圖39
圖3-4 AFM探針的形狀40
圖3-5原子力顯微鏡架構圖41
圖3-6 X光繞射儀之架構42
圖3-7 SEM 儀器圖43
圖4-1 穿透濾光譜圖 (Ts=200℃,沒有加IAD)45
圖4-2 穿透濾光譜圖(a) Ts=150℃, Beam Voltage=250V(b) Ts=150℃, Beam Voltage=300V(c) Ts=150℃, Beam Voltage=350V 46
圖4-3 穿透濾光譜圖(a) Ts=室溫, 沒有加IAD(b) Ts=150℃, 沒有加IAD47
圖4-4 穿透濾光譜圖(a) Ts=室溫, Beam Voltage=300V(b) Ts=室溫, Beam Voltage=500V48
圖4-5 穿透濾光譜圖(a) Ts=150℃, Beam Voltage=150V(b) Ts=150℃, Beam Voltage=200V(c) Ts=150℃, Beam Voltage=300V49
圖4-6折射率(350nm)與離子束電壓關係圖53
圖4-7折射率(193nm)與離子束電壓關係圖54
圖4-8消光係數(193nm)與離子束電壓關係圖54
圖4-9折射率與波長關係圖(Ts=150℃, Beam Voltage=200V)55
圖4-10消光係數與波長關係圖(Ts=150℃, Beam Voltage=200V)55
圖4-11堆積密度關係圖58
圖4-12 水氣吸收分析圖(室溫)60
圖4-13 水氣吸收分析圖(150℃)61
圖4-14 SEM量測結果圖(放大倍率:70000)62
圖4-15 SEM量測結果圖(放大倍率:110000)63
圖4-16 表面粗操度與離子束電壓關係圖65
圖4-17原子力顯微鏡測量立體圖(Ts=室溫)66
圖4-18原子力顯微鏡測量立體圖(Ts=150℃)67
圖4-19 XRD測量結果(150℃)69
表目錄
表1.1 短波光源分類表4
表1.2 基板溫度與微觀結構關係圖6
表2.1 F與 Mg的特性比較20
表2.2 氟化鑭 ( LaF3 )基本特性23
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