跳到主要內容

臺灣博碩士論文加值系統

(23.20.20.52) 您好!臺灣時間:2022/01/24 17:51
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

我願授權國圖
: 
twitterline
研究生:鄭光珮
研究生(外文):Kung-Pei Cheng
論文名稱:X光波域光學薄膜之研究
論文名稱(外文):The Research of Optical Thin Film in the X-Ray Region
指導教授:李正中李正中引用關係
指導教授(外文):Cheng-Chung Lee
學位類別:碩士
校院名稱:國立中央大學
系所名稱:光電科學研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:英文
論文頁數:69
中文關鍵詞:X 光光 學 薄 膜粗糙度
外文關鍵詞:Optical Thin FilmX-ray
相關次數:
  • 被引用被引用:1
  • 點閱點閱:175
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:1
本論文研究軟X光區域的多層膜高反射鏡及使用銅靶 輻射量測X光反射率,檢測多層膜結構。
關於13.6nm的近垂直入射多層膜高反射鏡,可優化出高反射率的膜層結構。經優化53層鉬矽多層膜,鉬和矽的膜層厚度分別為3.03nm和4.07nm,對S偏振光而言,四分之一波膜堆的理想反射率為69.42%,我們優化後週期性膜堆的理想反射率為72.12%。對p偏振光而言,四分之一波膜堆的理想反射率為65.97%,我們優化後週期性膜堆的理想反射率為69.36%。
由於近垂直入射多層膜高反射鏡對膜厚及粗糙度的要求甚高,因此使用離子束濺鍍法製鍍出非晶態薄膜,藉著銅靶 輻射以掠角入射薄膜,根據Kiessig干涉條紋精準的求得薄膜的特性,包括薄膜密度、消光係數、厚度及各界面粗糙度。求得的結果與原子力顯微鏡比較,並非完全吻合。主要的原因為X光量測的範圍較大,因此提供的訊息是平均值,且包含高頻波。而原子力顯微鏡量測的範圍是局部性,且濾掉高頻波。
The paper is discussed about designing the nearly normal incident multilayer mirrors in the X-Ray region and analyzing the multilayer based on measuring X-Ray reflectivity .
For the nearly normal incident multilayer mirrors at 13.6 nm , our program can optimize the structure of the high—reflectivity mirrors . After optimizing the 53 layers Mo/Si mirrors , we can find out that the thickness of the Mo and Si thin film are 3.03nm and 4.07nm . For s-pol. , the reflectivity of the quarter wave stick is 69.42% , and the reflectivity of our design is 72.12% . For p-pol. , the reflectivity of the quarter wave stick is 65.97% , and the reflectivity of our design is 69.36% .
It is important for the thickness mistakes and roughness of nearly normal incident multialyer mirrors . We manufacture the amorphous thin film by using ion beam sputtering deposition , and obtain the characteristics of the multilayers by measuring the X-Ray reflectivity of radiation of Cu target , for example the mass density , extinction coefficient , thickness of the thin film and the roughness of the interface . Generally speaking , the roughnesses by fitting X-Ray reflectivity are different from the roughnesses of using AFM . This result is that the area by X-Ray illuminated is larger than by AFM measuring , and X-Ray reflectivity contains the data of high frequency waves.
目 錄
致謝辭I
中文摘要II
英文摘要III
目錄IV
圖目錄VI
表目錄IX
符號表X
第一章前言1
1-1X光發現及其特性1
1-2研究動機4
1-3文獻回顧7
1-4論文概要9
第二章理論10
2-1折射率10
2-2X光反射率15
2-2-1一個平整介面的X光反射率15
2-2-2多個界面的X光反射率17
2-3多層膜高反射鏡之理論19
2-3-1適當波長及適當材料的選擇19
2-3-2優化膜層厚度26
2-4簡形優化法30
第三章實驗儀器33
3-1掠角入射X光反射率分析多層膜結構33
3-1-1實驗裝置33
3-1-2實驗校準34
3-2離子束濺鍍(Ion Beam Sputtering Deposition) 36
3-2-1離子束濺鍍鍍膜系統架構37
3-3原子力顯微鏡39
第四章實驗與模擬結果40
4-1軟X光多層膜高反射鏡的光譜圖模擬40
4-2X光反射率解析多層膜結構44
4-2-1模擬結果44
4-2-2實驗結果53
第五章結論68
第六章參考文獻69
[1] 國家毫微米元件實驗室,積體電路製程技術訓練班(II),pp.6.1-6.78[2] Takeshi Namioka, “Overview of Japanese multilayer research”, SPIE 984, pp.124, 1988[3] R. C. Catura, E. G. Joki, T. E. Whittemore, W. J. Brookover, “Recent results in multilayer research”, SPIE 984, pp.214, 1988[4] 李正中, 薄膜光學與鍍膜技術, 藝軒出版社, 1999[5] E. Spiller, “Low-loss reflection coatings using absorbing materials”, Appl. Phys. Lett., 20(9), pp.365, 1972[6] Masaki Yamamoto, Takeshi Namioka, “Layer-by-layer design method for soft-x-ray multilayer”, Appl. Opt., 31(10), pp.1622, 1992[7] E. Spiller, Armin Segmuller, “Cotrolled fabrication of multilayer soft-x-ray mirrors”, Appl. Phys. Lett., 37(11), pp.1048, 1980[8] 王占山, “極紫外與軟X射線非週期多層膜優化設計及初步研制”, 光學儀器, 25(5-6), pp.138, 2001[9] Alan G. Michette, Zhanshan Wang, “Optimisation of depth-graded multilayer coatings for broadband reflectivity in the soft X-ray and EUV regions”, Optics Communications, 177, pp.47, 2000[10] V.V. Protopopov, V.A. Kalnov, “X-ray multilayer mirrors with an extended angular range”, Optics Communications, 158, pp.127, 1998[11] E. Spiller, in Physics, Fabrication, and Applications of Multilayered Structures, edited by P. Dhez and C. Weisbuch(Plenum, New York), pp.284, 1988[12] Muamer Zukic, Jongmin Kim, Michele Wilson, Jungho Park, Douglas G. Torr, “Non-grazing high reflective narrowband multilayer x-ray coatings”, SPIE 2011, pp.323, 1993[13] Paul B. Mirkarimi, Sasa Bajt, Mark A. Wall, “Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography”, Appl. Opt., 39(10), pp.1617, 2000[14] Troy W. Barbee, Jr., Stanley Mrowka, Michael C. Hettrick, “Molybdenum-silicon multilayer mirrors for extreme ultraviolet”, Appl. Opt., 24, pp.883, 1985[15] Claude Montcalm, Brain T. Sullivan, Henri Pepin, J. A. Dobrowolski, M. Sutton, “Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering”, Appl. Opt., 33(10), 2057, 1994[16] A. Ivan, R. Bruni, K. Byun, F. Christensen, P. Gorenstein, S. Romaine, ”Design and optimization of multilayer coatings for hard x-ray mirrors”, SPIE 3773, pp.107, 1999[17] M. Arbaoui, R. Barchewitz, C. Sella, K.B. Youn, ”Absolute reflectivity measurements at 44.79 of sputter deposited multilayer x-ray mirrors”, Appl. Opt., 29(4), pp.477, 1990[18] A. V. Tikhonravov, M. K. Trubetskov, V. V. Protopopov, A. V. Voronov, “Application of the needle optimization technique to the design of X-ray mirrors”, SPIE 3738, pp.248, 1999[19] I. V. Kozhevnikov et al., Nucl. Instrum. and Meth. A 345, pp.594-603, 1994[20] Benjawan SaeLao, Optics Letters 26( 7) , 2001[21] T. Salditt et al , Phys. Rev. B 54, pp.5860, 1996[22] Ken Skulina, Applied Optics 34, pp.3727 , 1995[23] H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 , pp.1873-1882, 1998[24] L.G. Parratt, C.F. Hempstead, “Anomalous dispersion and scattering of X-ray”, Phys. Rev., 94, pp.1593, 1954[25] Martin Huppauff, Klaus Bange, Bruno Lengeler, “Density ,thickness and interface roughness of SiO2, TiO2 and Ta2O5 films on BK-7 glasses analyzed by X-ray reflection”, Thin solid film, 230, pp.191-198, 1993[26]許樹恩, 吳泰伯, X光繞射原理與材料結構分析, 中國材料科學學會, pp.138, 1993[27] E. Spiller, Soft X-Ray Optics, SPIE, pp.145, 1994[28] Brian L. Evans and Barry J. Kent, “Soft X-ray platinum-carbon multiplayer mirrors”, Appl. Opt., 26, pp.4491, 1987[29] 1.Masahito NIIBE, Shigetaro OGURA, Masami TSUKAMOTO, Takashi IIZUKA, Akira MIYAKE, Yutaka WATANABE, Yasuaki FUKUDA, “Normal Incidence Multilayer Mirrors for Soft X-Rays”, The Review of Laser Engineering, Vol.24, No.1, 1996, pp.48-60[30] 光學常數來自http://www-cxro.lbl.gov/optical_constants/[31] 鄭天水、金慶原、邢中菁、王之江,”用於軟X光反射鏡Ni/C、Mo/Si多層膜的機制”, 真空科學與技術, No.10(4), 1990, pp.269-274[32] 呂俊霞、曹健林,”8.0nm附近Mo/B4C軟X射線多層膜初步研究”, 光學精密工程, No.4(5), 1996, pp.36-39
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top