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研究生:李文傑
研究生(外文):Wen-Chieh Li
論文名稱:電探針在電漿量測系統中的設計與模擬
論文名稱(外文):Design and Simulation of Langmuir Probe in Plasma Diagnostic System
指導教授:陳炳宏陳炳宏引用關係
指導教授(外文):Bing-Hung Chen
學位類別:碩士
校院名稱:國立東華大學
系所名稱:電機工程學系
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:95
中文關鍵詞:電探針
相關次數:
  • 被引用被引用:3
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電探針(electrical probe)又名為藍姆探針(Langmuir probe),其操作方式是將電探針伸入電漿(plasma)系統中,並對電探針施加正負50伏特的直流電壓,之後記錄探針隨電壓變化所量得的電流,將其繪製成電流-電壓特性曲線圖(I-V characteristic),並配合適當的探針理論,即可由此特性曲線得知電漿內部的重要資訊,如電漿電位(plasma potential)、浮動電位(floating potential)、電漿密度(plasma density)、電子溫度(electron temperature)以及電子能量分佈函數(Electron Energy Distribution Function,EEDF)等。本論文主要的目的,就是利用電探針技術建立一個電漿量測系統。就過去而言,電探針常應用於直流式電漿系統中,電探針在此環境下所得出的電流-電壓特性曲線均為正確的結果;由於射頻電漿(RF plasma)系統的發展,電探針在此系統中量測時,會受到射頻干擾的影響,而導致電流-電壓特性曲線會有所誤差。於是吾人便要去設計能適用於射頻電漿的電探針量測系統,並將所設計的電探針量測系統搭配不同的電漿參數加以模擬,觀察其在不同的電漿參數下,能否將射頻干擾的影響都予以消弭,進而獲得正確的電流-電壓特性曲線,如此才能由此特性曲線圖去得知電漿內部的重要資訊。
The electrical probe is called Langmuir probe, which is immersed in a plasma system to get important plasma information. Generally, the probe is connected by an adjustable voltage source (-50~+50 DC). The measured current collected by the probe is a function of the applied voltage. This resulting relationship between the probe current and probe voltage is the current voltage characteristic(I-V characteristic). From the I-V characteristic we can derive the plasma parameter such as:plasma potential、floating potential、plasma density、electron temperatureand electron energy distribution function(EEDF)etc. The purpose of this study is to establish a plasma measurement system using electrical probe technique. Probe technique has been applied in DC plasma measurement, but it is a suffering to directly use in RF plasma because of the RF interference which will distort the I-V characteristic. In this research, we design the probe measurement system with wider frequency compatibility and present the simulation results with different plasma conditions to verify RF interference has been diminished in I-V characteristic.
目錄
致謝﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒i
目錄﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ii
圖索引﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒v
表格索引﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒viii
中文摘要﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ix
英文摘要﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒x
第一章 簡介﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 1
第二章 電漿原理﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 5
2-1 序論﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 5
2-2 氣體﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 5
2-2-1 氣壓﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 5
2-2-2 平均自由徑﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 8
2-3 氣體碰撞原理﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 10
2-3-1 彈性碰撞﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 10
2-3-2 非彈性碰撞﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 11
2-4 電漿的產生﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒13
2-5 電漿參數﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒19
2-5-1 離子化程度﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒19
2-5-2 電子溫度﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒20
2-5-3 杜拜長度﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒22
2-5-4 電漿暗區之電壓與厚度﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒24
2-5-5 電漿頻率﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒26
第三章 電探針原理﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒28
3-1 序論﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒28
3-2 電探針分類﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒28
3-3 電探針原理分析﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒30
3-3-1 浮動電位與離子飽和電流﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒32
3-3-2 過度區與電子飽和電流﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒35
3-3-3 厚電漿暗區之軌道運動﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒38
3-4 電漿參數之計算﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒44
3-5 電子能量分佈函數﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒46
第四章 電探針電路﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒51
4-1 序論﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒51
4-2 射頻干擾的來源﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒52
4-3 電探針在射頻電漿源中的等效電路﹒﹒﹒﹒﹒﹒﹒﹒﹒54
4-4 電探針補償電路﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒58
4-5 電探針量測系統架構﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒63
第五章 模擬結果—搭配不同電漿參數﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒ 65
第六章 結論﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒74
參考文獻﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒﹒79
附錄一 -50~+50可調電源供應器與電流電壓轉換電路內部電路圖..1
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