跳到主要內容

臺灣博碩士論文加值系統

(18.97.9.175) 您好!臺灣時間:2024/12/10 16:48
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

: 
twitterline
研究生:張振福
研究生(外文):Jen-Fung Chang
論文名稱:微波化學氣相沉積及磁控濺鍍成長類鑽石之研究
論文名稱(外文):Combined magnetron sputtering and ECR-CVD deposition of diamond-like carbon films
指導教授:楊台發翁恆義
指導教授(外文):Tai-Fa YoungHerng-Yih Ueng
學位類別:博士
校院名稱:國立中山大學
系所名稱:電機工程學系研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:131
中文關鍵詞:類鑽碳膜微波化學氣相沉積磁控濺鍍
外文關鍵詞:Diamond-like CarbonSputteringECR-CVD
相關次數:
  • 被引用被引用:25
  • 點閱點閱:453
  • 評分評分:
  • 下載下載:83
  • 收藏至我的研究室書目清單書目收藏:2
封面
誌謝
中文提要
英文提要
總目錄
第一章 緒論
1-1 緒論
1-2鑽石及石墨的特性
1-3系統回顧
1-4 鑽石及類鑽石的成長方法
1-5 類鑽石的結構及成長機制
1-6濺鍍理論
1-7 磁控濺鍍
1-8微波電子迴旋共振化學氣相沉積法
第二章 材料分析之理論基礎
2-1拉曼光譜儀
2-2 鍍膜性質之檢測
第三章實驗設備與步驟
3-1實驗設備
3-2 實驗流程
3-3 樣品的準備
第四章結果與討論
4-1機械性質
4-2 成長機制
4-3實驗結果討論
第五章DLC膜的應用
5-1 DLC膜在機械方面的應
5-2 DLC膜在相變化材料方面的應用
第六章 結論
參考文獻
附圖目錄
附表目錄
第一章1.J. Robertson, “Properties of diamond-like carbon”. Surface and Coating Technology 50(1992), pp185-203.2.A. Rengan, J. Narayan, C. Jahnke, S. Bedge, J.L. Park and Ming Li, “Characterics of diamond-like carbon films formed by hybrid laser-plasma ablation of graphite”, Materials Science and Engerring, B15(1992), pp15-24.3.Z.F. Li, Z.Y. Yang and R.F. Xiao, Appl. Phys. 63(1996)243.4.P. Vanden Brande, S. Lucas, R. Winand, A. Weymeersch and L. Renard, “Determination of the chemical and physical properties of hydrogenated carbon deposited produced by D.C. Technology, 68/69(1994), pp656-661.5.M. Matsuoka, K. Hoshino and K. Ono, J. Cac. Sci. Technol., 11(1993)2994.6.K. Kobayashi, K. Yamamoto, N. Mutsukura and Y. Machi, “ Sputtering characteristics of diamond and hydrogenated amorphous carbon films by R.F. plasma”, Thin Solid Films 185(1990), pp71-78.7.M.A. Tamor, C.H. Wu, R.O. Carter and N.E. Lindsay, Appl. Phys. Lett. 55(1989)1388.8.A. Raveh, J.E. Klenberg-Sapieha, L. Martinul and M.R. Wertheimer, J. Vac. Sci. Technol. 10(1992)1723.9.J. Won, A. Hatta, Tssaki and A. Hiraki, Appl. Phys. Lett. 69 (1996)4179.10.Y. C. Chan, X.S. Miao, X. M. He, and S. T. Lee, J. Elect. Materials, 27(1998)41.11.S.F. Yoon, H. Yang, Rusli, J. Ahn, and Q. Zhang, J. Elect. Materials, 27(1998)44.12. X. M. He, and S. T. Lee, I. Bello, A. C. Cheung, W. Z. Li, D. S. Chiu, Y. W. Lam, C. S. Lee, L. M. Leung, and X. T. Zhou, J. Mater. Res., No. 4, 14(1999)1617.13.A. Grill and B. Meyerson, in Synthetic Diamond: Emerging CVD Science and Technology, K. E. Spear and J. P. Dismukes, Eds., John Wiley & Sons, Inc., New York, 1994, p91.14.A. Grill, Surf. Coat. Technol. 507(1997)94.15.郭瑞剛,”陰極電弧蒸著類鑽石碳膜之磨耗研究”,華梵大學機電學系碩士論文(1998)16.劉國新,”經非平衡磁控被覆類鑽碳膜對銑刀磨耗性質之影響”,國立成功大學機械學系碩士論文(1998)17.龍柏華,”射頻偏壓輔助微波電子迴旋共振化學氣相沉積法成長類鑽碳膜之研究”,國立成功大學材料學系碩士論文(1998)18.林慧玲,”以電漿化學氣相沉積法蒸鍍含鈦類鑽碳膜之研究”,國立成功大學材料學系碩士論文(1996)19.朱俊勳,”化學氣相沉積鑽石膜之研究”, 國立成功大學材料系學士論文(1993)20.蔡蒨蒨,”偏壓對鑽石膜成長影響之研究”,國立成功大學材料系學士論文(1996)21.謝文彬,”含鈦類鑽碳膜之微結構及殘留應力研究”,國立中興大學材料學系碩士論文(1997)22.吳文進,”矽添加對類鑽膜結構與性質之影響”,國立成功大學材料系博士論文(1998)23.周秀玲,”鑽石與類鑽薄膜之拉曼光譜”,國立中央大學物理學系碩士論文(1998)24.J.J. Cuomo, D.L. Pappas, J.Bruley, J.P. Doyle and K.L. Saenger, Vapor Deposition Processes for Amorphous Carbon Films with sp3 Fractions Approaching Diamond”, J. Appl. Phys., 70(1991) 1706.25.C. Weissmantel, “Ion Based Growth of Special Films: Techniques and Mechanisms”, Thin Solid Films, 92(1982) 55.26.Y. Lifshitz, S.R. Kasi and J.W. Rabelais, “Molecular-Dynamics of Amorphization by Introduction of Chemical Order in Crystalline NiZr2”, Phys. Rev. B., 41(1990) 10468.27.J. Koike, D.M. Parkin and T.E. Mitchell, “Displacement Energy Threshold for Type IIa Diamond”, Appl. Phys. Lett., 60(1992) 1450.28.D.R. Mckenzie, D. Muller and B.A, Pailthorpe, “Compressive Stress-Induced Formation of Thin-Film Tetrahedral Amorphous Carbon”, Phys. Rev. Lett., 67(1992) 773.29.B.A. Pailthorpe, “Molecular-Dynamics Simulation of Atomic Process at the Low Temperature Diamond(111) surface”, J. Appl. Phys., 70(1991) 543.30.H.P. Kaukonen and R,M, Nieminen, “Molecular-Dynamics of the Growth of Diamondlike Films by Energetic Carbon-Atim Beams”, Phys. Rev. Lett., 68(1992) 620.31.J. Robertson, “Mechanical Properties and Structure of Diamond-like Carbon”, Diamond Relat. Mater., 2(1993) 984.32.C.A. Davis, “A Simple Model for Formation of Compressive Stress in Thin Films by Ion Bombardment”, Thin Solid Films, 226(1993) 30.33.J. Robertson, “The deposition Mechanism of Diamond-like a-C and a-C:H”, Diamond Relat. Mater., 3(1994) 361.34.Y. Catherine, in R.E. Clausing (ed.) Diamond and Diamond-like Carbon, Plenum, New York, (1991) 193.35.A. Von Keudell, W. Moller and R. Hytry, “Deposition of Dense Hydrocarbon Films from a Non-Biased Microwave Plasma”, Appl. Phys. Rev., 62(1993) 937.36.Maurice H. Francombe, “Plasma Sources for Thin Film Deposition and Etching”,Phsics of Thin Films 18(1994)。37.胡一貫,”電子迴旋共振等離子技術”,半導體技術 n.6 v.12(1991)。38.宁兆元、任兆杏,”電子迴旋共振等離子體技術及其應用”,物理學進展,第12卷第1期(1992)。39.甄澤生,“微波電子迴旋共振等離子體技術及其應用”,真空科學與技術,第13卷第2期(1993)。40.阿部東彥,家田正之,”電漿化學”,高正雄譯,復漢書局出版社,(1984)p.141.A. Inspektor-koren, “Principles of plasma-activated chemical vapour deposition”, Surf. Coat. Technol., 33(1987), pp31-48.42. S. Aisenberg, R. Chabot, J. Appl. Phys. 42(1971)2953.第二章1.Z. C. Feng, A. A. Allerman, P. A. Barnes and S. Perkowitz, Appl. Phys. Lett. 60, 1848(1992)2.J. P. Estrera, P. D. Stevens, R. Glosser, W. M. Duncan, Y. C. Kao,Y. H.Liu and E. A. Beam, Appl. Phys. Lett. 61, 1927(1992)3.G. Lucovsky, M. H. Brodsky, M. F. Chen, R. J. Chicotka and A. T. Ward, Phys. Rev. B4, 1945(1971)4.Koji Yano and Takashi Katoda, J. Appl. Phys. 70,7036(1991)5. D. P. Bour, J. R. Shealy, A. Ksendzov and Fred Pollak, J. Appl. Phys. 64, 6456(1988)6. F. H. Pollak and H. Shen, in Proceeding of the Society of Photooptical Instrumentation Engineers (SPIE, Bellingham, 1898), Vol. 1037, P 16.7.F.Tuinstra and J.L. Koenig,Raman Spectrum of Graphite,J.Chen.Phys. ’53,[3] 1126-1130(1970)。8.S.A. Solin,Raman and IR Studies of Graphite Intercalates,Physica B,99,443-452(1980)。9. M.A. Tamor and W.C.Vassel,Raman Fingerpriniting of Amorphous Carbon Films,J.Appl.Phys.’76,[6]3823-3830(1994)。10. .Capano,N.T.McDeutt,R.K.Singh and F.Qian,Characterization of Amorphous Carbon Thin Film,J.Vac.Sci.Technol.A,’14,[2]431-435(1966)11. Tsai,D.B.Bogy,M.K.Kundmann,D.K.Veirs,M.R.Hilton and S.T.Mayer,Structure and Properties of Sputtered Carbon Overcoats on Rigid Magenetic Media Dicks,J.Vac.Sci.technol.A,6,[4]2307-2315(1998)。12. 何主亮,常挽瀾,陳育智,電漿化學氣相沉積氮化碳薄膜的微觀結構與機械性質,真空科技,第9卷,第2期,34-35,(1996)。13. Vuppuladium,H.E.Jackson and R.L.C.Wu,Raman Scattering From Hydrogenated Amorphous Carbon Films,J.Appl.Phys.,77,[6] 2714-2718 (1995)。14.符永豪,國立成功大學資源工程研究所碩士論文,1998。15.A.C. Ferrai, J. Robertson, Phys. Rev. B 61(2000)14095.16.M. Chhowalla, A.C. Ferrari, J. Robertson, G.A. J. Amaratunga, Appl. Phys. Lett. 76(2000)1419.第四章1. D. P. Monaghan, D. G. Teer, P. A. Logan, I. Efeoglu, and R. D. Arnell, Surf. And Coating Technol, 60(1993) 525.2.A. A. Voevodin, M. A. Capano, A. J. Safriet, M. S. Donley, and J. S. Zabinski, Appl. Phys. Lett. 69(1996)188.3.F. Tuinstra and J.L. Koenig, “Raman Spectra of Graphite”, J. Chem. Phys. 53(1970)1126.4.D. Beeman, J. Silverman, R. Lynds, “molding studies of amorphous carbon”, Phys. Rev. B30(1984) 870.5.A. Richter, H.J. Scheibe, W. Pompe, “About the structure and bonding of laser generated carbon films by Raman and electron energy loss spectroscopy”, J. Non-cryst. Solid, 88(1986) 131.6.W. S. Basca, J. S. Lannin, D.L. Pappas, Phys. Rev. B 47(1993) 1127.7.P.J. Kelly, R.Hall, J. O’Brien, J.W. Bradley, G. Roche, R.D. Arnell,“Substrate effects during mid-frequency pulsed DC biasing”,Surface Coating Technology 142-144(2001)635-641.第五章1.J. Feinleib, J. de Neufuille, S. C. Moss, S. R. Ovshinsky: Appl. Phys. Let., 18(1971) 254.2.T. Ohta, K. Inoue, T. Ishida, Y. Gotoh, I. Satoh: Jpn. J. Appl. Phys., 32 (1993) No. 11B, 5214.3.T. Sugaya, T. Taguchi, K. Shimura, K. Taira, Y. Honguh, H. Satoh: Jpn. J. Appl. Phys., 32(1993) 5402.4.K. Nagata, N. Yamada, K. Nishiuchi, S. Furukawa, and N. Akahira: Jpn. J. Appl. Phys. 38(1999) 1679.5.M. Yamaguchi, T. Togashi, S. Jinno, H. Kudo, E. Muramatsu, S. Tanoguchi, and A. Inoue: Jpn. J. Appl. Phys. 38(1999) 1806.6.Z. F. Li, Z. Y. Yang and R. F. Xiao:Appl. Phys. 63 (1996) 243.7.M. A. Tamor, C. H. Wu, R. O. Carter and N. E. Lindsay:Appl. Phys. Lett. 55(1989) 1388.8.F. Demichelis, C. F. Pirri and A. Tagliaferro: Materials Science and Engineering, 11(1992) 313.9.L. C. Chen, H. Y. Lin, C. S. Wong, K. H. Chen, S. T. Lin, Y. C. Yu, C. W. Wang, E. K. Lin, K. C. Ling:Diamond and Related Materials, 8(1999) 618.10.H. W. Chen, T. E. Hsieh, J. R. Liu and H. P. D. Shieh: Jpn. J. Appl. Phys. 38(1999) 1691.11.M. Yamaguchi, T. Togashi, S. Jinno, H. Kudo : Jpn. J. Appl. Phys. 38(1999) 1806.12.J. Tominaga, T. Kikukawa, M. Takahashi, T. Kato and T. Aoi : Jpn. J. Appl. Phys. 36(1997) 3598.
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top
無相關期刊