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研究生:簡正明
研究生(外文):Cheng-Ming Chien
論文名稱:微製程技術於矽晶片上微管道製程之研究
論文名稱(外文):Microfabrication Processes on Silicon-Chip Microchannels
指導教授:謝曉星
指導教授(外文):S. S. Hsieh
學位類別:碩士
校院名稱:國立中山大學
系所名稱:機械與機電工程學系研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2002
畢業學年度:90
語文別:中文
論文頁數:74
中文關鍵詞:微管道矽晶片微製程技術
外文關鍵詞:MicrochannelMicrofabricationSilicon-Chip
相關次數:
  • 被引用被引用:2
  • 點閱點閱:214
  • 評分評分:
  • 下載下載:62
  • 收藏至我的研究室書目清單書目收藏:0
摘要
在本文中主要是採用矽基微製程技術作為微渠道的主要製程技術,在本技術中主要包含光刻微影技術、乾式蝕刻技術以及陽極接和技術,在製程結束後,我們配合AFM及表面輪廓儀量測微渠道表面,得到約3.34﹪表面粗躁度之微渠道(0.5μm×100μm×5000μm)。
在本研究中我們並配合理論數值計算,以連續方程式及滑移邊界條件來模擬氮氣(nitrogen)在微渠道內的流動情形,得到氮氣在微渠道內的初部的流場分部,其中包含壓力、速度及質量流率等。
Abstract
In this study, we use microfabrication processes on silicon to produce a rectangular microchannel. The fabrication technology includes exposing, dry etching, and anodic bounding technologies. After fabrication finished, we use AFM and alpha-step to secure surface roughness. It is found a relatively low surface roughness about 3.34% with dimension of 0.5μm×100μm×5000μm microchannel.
A theoretical study and calculations, we also made with continuity equation and proper slip condition to analyze fluid behavior in microchannel. At present, several fluid informations in microchannel that incloud pressure drop, fluid velocity, and fluid mass flow rate were obtained.
目 錄
頁 次
目錄i
圖目錄iv
表目錄vi
符號說明vii
中文摘要ix
第一章 緒論1
1-1 前言1
1-2 背景與目的2
1-2-1 研究背景2
1-2-2 研究目的2
1-3 文獻回顧2
1-4 研究範圍4
第二章 實驗設備6
2-1 實驗製程設備6
2-2 實驗量測設備8
第三章 實驗步驟11
3-1 微渠道的構想圖11
3-2 矽基微渠道的製程步驟11
3-2-1 塗佈光阻12
3-2-2 曝光12
3-2-3 顯影12
3-2-4 矽晶片的蝕刻13
3-2-5 去除表面光阻13
3-2-6 Pyrex鑽孔與矽晶片的接合13
第四章 理論分析23
4-1 流體性質分析23
4-1-1 Knudsen number23
4-1-2 微渠道的數值分析25
4-1-3 微渠道的數值解29
4-2 測試系統迴路設計30
4-2-1 測試系統迴路圖30
4-2-2 MPIV的量測30
第五章 結果與討論42
5-1 製程結果的探討42
5-1-1 曝光顯影技術結果之討論42
5-1-2 RIE矽蝕刻技術結果之討論44
5-1-3 Pyrex 的鑽孔技術45
5-1-4 Pyrex與矽晶片的接和46
5-1-5 微渠道完成結果與討論46
5-2 測試系統迴路的建立47
第六章 結論與建議60
6-1 結論60
6-2 建議60
參考文獻62
附錄A68
附錄B72
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