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[1] Box, G. E. P., Jenkins, W. G. and Reinsel, G. C. (1994), Time Series Analysis, Forecasting and Control, Prentice-Hall, Englewood Cliffs. [2] Box, G. E. P., and Luceno, A. (1997), Statistical Control by Monitoring and Feedback Adjustment, John Wiley & Sons, Inc. [3] Butler, S. W. and Stefani, J. A. (1994), “Supervisory Run-to-Run Control of Polysilicon Gate Etch Using In Situ Ellipsometry,” IEEE Trans. Semiconduct. Manufact., 7, 193-201. [4] Del Castillo, E. (1999), “Long-run and Transient Analysis of a Double EWMA Feedback Controller”, IIE Transactions, 31, 1157-1169. [5] Ingolfsson, A. and Sachs, E. (1993), “Stability and Sensitivity of an EWMA Controller,” Journal of Quality Technology, 25, 271-287. [6] Sachs, E., Hu, A. and Ingolfsson, A. (1995), “Run by Run Process Control: Combining SPC and Feedback Control,” IEEE Trans. Semiconduct. Manufact., 8, 26-43. [7] Tseng, S. T., Chou, R. J., and Lee, S. P. (2001a), A Study of MEWMA Controller, To appear in IIE Transactions. [8] Tseng, S. T., The, B. A., Tsung, Fugee, and Chan, Y. I. (2001b), Optimal variable EWMA Controller, Submitted for publications. [9] Tseng, S. T., Chou, R. J., and Lee, S. P. (2001), Statistical Analysis of Double EWMA Controller, [10] Yeh, Tseng, and Chan (2001), EWMA控制器最適變動折扣因子之研究 [11] 何人杰碩士論文(2000), EWMA控制器非固定折扣因子之研究
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