臺灣博碩士論文加值系統

半導體製程中ADI/AEI檢驗工作主要是透過顯微鏡進行，在長時間的視覺檢驗作業中，檢驗員常覺得眼睛疲勞不適。本研究主要目的在評估ADI/AEI檢視作業視覺疲勞的程度並改善作業模式以減低檢驗員視覺疲勞，增進工作績效。
本研究第一階段是透過訪談ADI/AEI 18位檢驗員、問卷調查217位有效樣本及現場觀察來了解視覺疲勞產生的原因與進行作業分析。結果發現影響ADI/AEI檢驗作業視覺疲勞的主要因素包括：顯示模式、視覺搜尋方式、檢驗策略(用眼/休息時間調整)。第二階段以3因子2水準完全隨機化要因設計來探討視覺疲勞改善情形。自變項為顯示模式分為顯微鏡檢驗及外接液晶顯示器檢驗，搜尋策略分為順時針搜尋法及S型搜尋法，用眼/休息時間調整分為第三、四、五檢驗點檢驗4個Dies或6個Dies。應變項為閃光融合閾值(CFF)和近點調節值(NPA)變化值、視銳度、對比敏感度作為視覺疲勞衡量效標。以每片晶圓檢驗時間、缺陷片數、8個POD發現的缺點數及單位時間發現的缺點數作為檢驗績效。以主觀評量問卷作為主觀視覺疲勞衡量工具。
研究結果為在CFF與NPA皆顯示外接液晶顯示模式與檢驗Dies數的減少對於視覺疲勞的改善有顯著效果。檢驗績效分析方面，顯微鏡檢驗較外接液晶顯示檢驗有較佳的績效，但檢驗Dies數的減少並不會影響績效。

In semiconductor manufacturing industry, the manufacturing process of wafer is complex and change rapidly. For ensuring high quality product low defect rate, inspection is one of most important manufacturing processes. After developing inspection (ADI) and after etching inspection (AEI) are the main inspection tasks in FAB. ADI and AEI are carried out on microscopes. Operators being responsible for ADI or AEI complain of visual fatigue problems. According to preliminary survey results, we found that display mode, visual search strategy and work pace (resting and working) are main factors affecting visual fatigue. A 3 factors factorial experiment was designed. Display modes included microscope inspection and LCD inspection. Visual search strategies included S type search pattern and clockwise search pattern. Work pace included the third, fourth, fifth inspection points inspect 4 or 6 dies. Dependent variables included: critical fusion flicker (CFF), near point accommodation (NPA), visual acuity and contrast sensitivity. In addition, inspection performance such as average inspect time per wafer, defect wafer number, defects finding in 8 POD and defect find per second were measured. The results indicate that display modes had significantly influences in reducing visual fatigue. In inspection performance, microscope inspection was better than LCD inspection.

目 錄 I
圖目錄 III
第一章 緒論 1
1-1 研究動機 1
1-2 研究目的 2
1-3 研究方法 3
第二章 文獻探討 5
2-1檢視作業視覺疲勞問題與視覺疲勞衡量指標 5
2-1-1視覺過程 6
2-1-2視覺疲勞的定義 7
2-1-3視覺疲勞的來源 7
2-1-4視覺疲勞衡量的方法 8
2-1-5減輕視覺疲勞的對策與視力保健 11
2-2晶圓檢驗作業 12
2-2-1目視檢驗 14
2-2-2顯微鏡檢驗技術 15
2-2-3晶圓缺陷檢驗技術 16
2-2-4視覺檢驗管理資訊系統 19
2-3影響檢視作業視覺疲勞的因素 21
2-3-1顯示模式對視覺疲勞的影響 21
2-3-2視覺搜尋策略 23
2-3-3檢驗策略：工作休息時間的調整 24
2-3-4檢驗作業的照明問題 24
第三章 作業分析與探討 26
3-1 ADI/AEI檢驗作業分析 26
3-1-1 作業分析 26
3-1-2 抽樣計畫 28
3-1-3 檢驗缺陷 28
3-1-4 檢驗點順序與檢驗方式 30
3-1-5 ADI/AEI工作站尺寸與工作姿勢 34
3-1-6 用眼時間與工作姿勢持續時間 39
3-2訪談工作 42
3-3問卷調查 47
第四章 實驗方法 54
4-1受試者 54
4-2實驗設計 54
4-3實驗設備 55
4-4實驗流程及說明 64
第五章 實驗結果與討論 67
5-1 主觀問卷分析 67
5-2 視覺疲勞分析 75
5-2-1 CFF分析 76
5-2-2 NPA分析 79
5-2-3視銳度與對比敏感度分析 80
5-3 檢驗績效分析 81
5-4 日夜班差異分析 85
5-5 相關分析 85
第六章 結論與建議 87
6-1 研究結論與建議 87
6-2 未來研究方向建議 89
參考文獻 90

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