臺灣博碩士論文加值系統

本實驗利用奈米壓痕儀 (Nanoindenter) 研究合金及薄膜在奈米尺度下的機械性質。樣品有合金及薄膜。合金為 2.5 μm 之 WC / 6.5% Co，及 0.4 μm 之WC / 10% Co；薄膜為 TiN 薄膜鍍在 Si 基材上，及 Ti 薄膜鍍在 Sapphire 基材上。實驗分為兩部分，第一部份為量測 WC / Co 合金的硬度，同時探討壓痕深度及 WC 晶粒大小對 WC / Co 合金的硬度之影響。第二部份為量測 TiN 及 Ti 薄膜的硬度及楊氏係數，同時探討基材對薄膜硬度及楊氏係數的影響，並和 Hertz 及 Sneddon 理論值相比較。實驗結果顯示，對 WC / Co 合金樣品，0.4 μm WC / 10% Co之奈米壓痕量測結果較2.5 μm WC / 6.5% Co有局部效應的影響。對 TiN / Si 樣品，當壓痕深度小於膜厚 1/3 時，硬度值約為 30 GPa，楊氏係數約為 306 GPa，並維持定值，但壓痕深度加大時，硬度值及楊氏係數隨壓痕深度增加而減少；對 Ti / Sapphire 樣品，當壓痕深度小於膜厚時，硬度值幾乎維持在 7 GPa，而楊氏係數隨壓痕深度增加而增加。本實驗定量顯示基材效應開始作用的範圍，同時也證實 Ti / Sapphire 受基材效應影響較小。另外，結果顯示 Hertz 及 Sneddon 理論分析不太適用於本實驗的奈米壓痕量測。

In this thesis, mechanical properties of alloys and thin films have been studied by nanoindentation. For WC-Co alloys, WC / 6.5% Co with an average grain size of 2.5 μm and WC / 10% Co with an average grain size of 0.4 μm are investigated. The results reveal variation in hardness values of finer grained WC-Co alloys due to indentations between the binder phase and the hard phase. For a titanium nitride film on silicon, which represents a system of a hard film on a soft substrate, the measured hardness and Young’s modulus remains a value of 30 GPa and 306 GPa respectively until the indentation depth is approximately 1/3 of the film thickness and starts to decrease as the indentation depth increases. For a titanium film on sapphire, which represents a system of a soft film on a hard substrate, the measured hardness maintains a value of 7 GPa and Young’s modulus increases with increasing the indentation depth. Our results are also compared with theoretical values from Hertz mechanics and Sneddon mechanics.

中文摘要………………………………………………………………..Ⅰ
英文摘要………………………………………………………………..Ⅱ
誌謝……………………………………………………………………..Ⅲ
目錄……………………………………………………………………..Ⅳ
圖目錄…………………………………………………………………..Ⅴ
表目錄…………………………………………………………………..Ⅵ
第一章、 前言……………………………………………………………1
第二章、 文獻回顧………………………………………………………3
2.1 硬度及楊氏係數的量測及發展……………………………...3
2.2 接觸力學……………………………………………………...5
2.2.1 彈性接觸力學…………………………………………5
2.2.2 壓痕接觸力學…………………………………………8
2.3 薄膜與基材的形變………………………………………….13
2.4 基材效應…………………………………………………….15
2.5 壓痕大小效應……………………………………………….17
2.6 粗糙度效應…………………………………………….……17
第三章、奈米壓痕量測簡介……………………………………………18
3.1 原子力顯微鏡(AFM)簡介…………………………………..18
3.2 奈米壓痕儀(Nanoindenter)簡介…………………………….22
3.2.1 儀器架構……………………………………………..22
3.2.2 實驗步驟……………………………………………..25
3.2.3 誤差來源……………………………………………..26
3.3 fused quartz 校正…………………………………………...29
3.3.1 壓頭形狀……………………………………………...29
3.3.2 校正方法……………………………………………..31
3.3.3 fused quartz 之奈米壓痕量測………………………31
第四章、WC / Co合金之奈米壓痕量測……………………………….34
4.1 樣品製備…………………………………………………….34
4.2 WC / Co合金之量測結果………………………………….36
4.2.1 壓痕深度對硬度值之影響…………………………..36
4.2.2 晶粒大小對硬度值之影響…………………………..37
第五章、薄膜之奈米壓痕量測…………………………………………40
5.1 樣品製備…………………………………………………….42
5.1.1 基板清洗……………………………………………..42
5.1.2 鍍膜步驟……………………………………………..43
5.2 TiN 薄膜之量測結果……………………………………….44
5.2.1 AFM 表面形貌……………………………………...44
5.2.2 壓痕影像……………………………………………..44
5.2.3 荷重 - 壓痕深度曲線……………………………….46
5.2.4 壓痕深度對硬度與楊氏係數之影響………………..47
5.3 Ti 薄膜之量測結果…………………………………………55
5.3.1 AFM 表面形貌……………………………………...55
5.3.2 壓痕影像……………………………………………..55
5.3.3 荷重 - 壓痕深度曲線……………………………….57
5.3.4 壓痕深度對硬度與楊氏係數之影響………………..58
第六章、結論……………………………………………………………65
參考文獻………………………………………………………………..66

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