臺灣博碩士論文加值系統

由於鋯鈦酸鉛（lead-zirconate-tinate, 簡稱PZT）鐵電陶瓷材料具備高折射率及強電光效應的特性，因此可藉由外加電場的調變，造成所需的折射率改變量，使它應用在電光調製（Electro-optical Modulation, 簡稱E.O.M.）元件上極具潛力，如光交換器（Optical Switch）、布拉格波導光柵（Bragg Waveguide Grating）。
本論文研究主要以溶膠-凝膠法配製摻有非晶形PZT微粉或結晶形PZT微粉的SiO2溶膠，利用旋鍍法將溶液旋鍍在矽基板或石英基板上，以傳統爐管退火或快速退火方式進行700℃的熱處理後，成為光學薄膜。利用橢圓偏光儀對此薄膜進行厚度、折射率及消散係數的量測，並使用掃瞄式電子顯微鏡（SEM）配合能量散佈光譜儀（EDS）、電子背向繞射儀（EBSD）觀察PZT粒子在膜中的分佈及結晶情形，探討其材料特性。
由實驗結果得知，在摻雜結晶形PZT微粉的SiO2薄膜中，PZT粒子會有較好的鑲埋性，並具有典型的鈣鈦礦結構（perovskite structure）；同時，薄膜的光學消散係數低，與沒有摻雜的SiO2薄膜比較起來，有合理的折射率改變量。

With its high refractive index and strong electro-optic properties, lead-zirconate-tinate (PZT) has a good potential of being a electro-optical modulation device, such as optical switch and Bragg waveguide grating, by utilizing its tunability of the refractive index.
In this study, the PZT powder doped silica films on silicon or quartz substrate were prepared by a modified TEOS sol-gel process. The films were then annealed by conventional furnace or rapid thermal annealing method at 700℃ respectively, and were examined by field emission scanning electron microscope and spectro-ellipsometer.
The crystallized PZT powder doped silica films followed by annealing treatment revealed good embedded adhesion, typical perovskite structure, low extinction coefficient, and reasonable refractive index change.

一、緒論.................................................1
二、文獻回顧.............................................6
2.1 微粉的製備方法.....................................6
2.2 水熱晶化法.........................................8
2.3 溶膠-凝膠法的理論背景..............................9
2.3.1 溶膠-凝膠法的基本原理.......................10
2.3.2 溶膠-凝膠法的主要影響因素...................11
2.3.3 溶膠-凝膠法的覆膜過程.......................18
2.4 PZT的電光特性.....................................22
三、實驗方法............................................29
3.1 PZT微粉的製備.....................................29
3.2 非晶形PZT微粉的結晶化.............................30
3.3 配製摻有PZT微粉的SiO2溶膠.........................30
3.4 旋鍍SiO2薄膜......................................32
3.4.1 矽基板的清洗準備............................32
3.4.2 旋鍍薄膜....................................32
3.5 製備三種薄膜夾層結構：TiO2∕PZT∕TiO2、SiO2∕PZT∕SiO2、
SiO2∕TiO2∕PZT∕TiO2∕SiO2.......................33
3.5.1 配製TiO2溶膠................................33
3.5.2 旋鍍夾層薄膜結構............................33
3.6 熱處理............................................34
3.7 電極製作..........................................34
3.8 特性分析..........................................35
3.8.1 動態雷射散射儀..............................35
3.8.2 X光繞射分析儀...............................36
3.8.3 能量散佈光譜儀..............................36
3.8.4 電子背向繞射儀..............................37
3.8.5 紫外光/可見光/近紅外光分光光譜儀............37
3.8.6 反射式橢圓偏光儀............................38
3.8.7 差分式穿透橢圓偏光儀........................38
四、結果與討論..........................................43
4.1 PZT微粉的特性.....................................43
4.2 於SiO2溶膠中PZT微粉所摻雜的量.....................43
4.3 摻雜非晶形PZT微粉的SiO2薄膜之X光繞射結晶分析......45
4.4 三種薄膜夾層結構之X光繞射結晶分析.................45
4.5 摻雜非晶形PZT微粉的SiO2薄膜之SEM分析..............46
4.6 摻雜結晶形PZT微粉的SiO2薄膜之SEM分析..............47
4.7 薄膜之光學性質分析................................48
五、結論................................................59
參考文獻................................................60

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