本論文將使用磁控式電漿濺鍍技術製備變色層，輔助變色層級離子傳導層於導電玻璃基材上。當變色層薄膜物質(如氧化鎢或氧化鎳)，被施加外加電位時，呈現出可逆性化學反應，並表現出兩種不同顏色變化之光學性質。此電致色變智慧型建築窗材可隨日照強度的不同，調節室內空調與照明度，以達節約能源之目的。
主要工作以磁控式電漿濺鍍技術製備變色層及輔助變色層，探討離子傳導層與變色層間電化學量測；同時並製備離子傳導層，研究其相關特性為將來元件的製備。此電漿濺鍍之操作參數為供給電源型式（DC或RF）、輸出功率、操作壓力、操作氣體種類、基材與靶材距離與濺鍍時間等不同條件製備。製備之薄膜使用循環伏安儀、電子光譜化學分析作特性量測，並測試各種製備之薄膜電化學變色反應特性與充放電荷量之平衡，以尋求元件最佳操作條件達到良好穩定特性與耐久性質。

In this paper, an electrochromic thin film, which is characterized by its ability to sustain reversible and persistent change of the optical property when a voltage is applied to it, will be prepared by magnetron plasma sputtering deposition technology. The tungsten oxide and nickel oxide materials were used as the electrochromic thin film and this material remains the most promising candidate for electrochromic device that can vary the through of visible light and solar energy and is called the smart windows.
The prepared electrochromic thin film, the design of charge balance, the life-time measurement and the coloration efficiency of the electrochromic devices were experimentally investigated. Many experiment operation parameters, which are DC or RF power generator,different powers, operation pressures, operation gases and the ratio of mixture, gas flow rate various target compositions, distance between sample and target and electrode design, sputtering time were used to design the electrochromic thin film by plasma sputtering technology. The prepared electrochromic thin film was experimentally tested by using the spectroscopy and cyclic voltammetry in order to get the optimum operation conditions.

中文摘要……………………………………………………………….…i
英文摘要…………………………………………………………………ii
目錄……………………………………………………………………...iii
圖目錄………………………………………………………………...…vi
表目錄………………………………………………………………….viii
第一章 前言……………………………………………………………..1
第二章 文獻回顧………………………………………………………..3
2.1 發展背景………………………………………………………….3
2.2 節能窗種類……………………………………………………….4
2.3 變色節能窗之分類……………………………………………….5
2.3.1 電致色變(Electrochromic)…………………………………...6
2.3.2 光致色變(Photochromism)…………………………………..6
2.3.3 熱致色變(Thermochromism)………………………………...7
2.3.4 光、熱與電致色變的比較…………………………….……..7
2.4 電致色變薄膜之研發……………...……………………………..8
2.5 電致色變元件…………………………………………………….9
2.6 電荷平衡………………………………………………...………13
2.7 離子傳導層……………………………………………………...14
2.7.1 以溶膠凝膠法（Sol-gel process）製備…………..………..15
2.7.2 以電漿濺鍍法（plasma sputtering）製備………..………..18
2.8 薄膜光學理論……..…………………………………………….19
2.9 真空鍍膜技術………………...…………………………..……..20
2.10 電漿原理簡述…………………………………………….……21
第三章 實驗方法……………………………………………………..40
3.1實驗裝置………………..………………………………………..40
3.2 變色薄膜製備…………………………………………………...40
3.3 變色薄膜充放電量測…………………………………………...42
3.4 薄膜光學量測…………………………………………………...42
3.5 固態離子傳導層Ta2O5薄膜製備………………………………43
3.5.1 以溶膠凝膠法製備…………………………………………43
3.5.2 以電漿濺鍍法製備………………………………...……….44
第四章 結果與討論……………………………………………………52
4.1 偏軸旋鍍對薄膜厚度之影響…………………………………...52
4.2 變色薄膜充放電測試…………………………………………...53
4.2.1不同外加電位下氧化鎢充放電測試……………………….53
4.2.2不同外加電位下氧化鎳充放電測試……………………….55
4.3 固態離子儲存層之光電測試…………………………………...57
4.3.1 厚度對於穿透光譜與折射率之影響………………………57
4.3.2偏軸旋鍍對薄膜厚度之影響……………………………….57
4.3.3 氧化鎢搭配氧化鉭元件變色之電量與穿透率量測………58
4.4 堆疊密度………………………………………………………...59
第五章 結論……………………………………………………………84
參考文獻………………………………………………………………..86
附錄……………………………………………………………………..91

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