跳到主要內容

臺灣博碩士論文加值系統

(18.97.14.85) 您好!臺灣時間:2024/12/12 09:40
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

我願授權國圖
: 
twitterline
研究生:潘鼎翔
研究生(外文):Ding-Shang Pan
論文名稱:光學薄膜應力量測與分析之探討
論文名稱(外文):The measurement and analysis of Stress for Optic Thin Film
指導教授:李正中李正中引用關係
學位類別:碩士
校院名稱:國立中央大學
系所名稱:光電科學研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2003
畢業學年度:91
語文別:中文
論文頁數:74
中文關鍵詞:應力量測干涉儀Zernike 多項式相位還原演算法
外文關鍵詞:Zernike polynominal fittingstressPSI
相關次數:
  • 被引用被引用:12
  • 點閱點閱:521
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:1
本論文探討利用Twyman Green干涉儀,配合相位偏移技術,擷取干涉圖形,在經由Hariharan相位還原法,分析干涉圖形,可得到其相位圖,並可知其基板的表面輪廓,而經由測定基板在鍍膜前後的面形變化量,求的其應力值。另利用Zernike 多項式擬合法,來扣除人為的誤差,如傾斜,離焦等…其方法比其他的量測技術上,更為精確。接著則利用電子鎗蒸鍍薄膜材料在配合離子輔助鍍膜系統,製鍍光學薄膜,利用不同的回火溫度來作處理,來尋求其高折射率、低吸收、低表面粗糙度、低應力的光學薄膜。
The thesis make use of Twyman Green interferometry and phase shift interferometry to grab interferogram. By Hariharan PSI algorithm we can analyze interferogram in order to get the phase map and know the substr- ate contour map. The stress in thin film can be derived by comparing the deflection of the substrate before and after film deposition . We also use Zernike polynomial fitting algorithm to remove errors,such as tilt and dfocus.Compared with other techniques,the present method is more accurate.we use e-beam evaporation(PVD) with ion-assisted deposition(IAD) to evaporate optical thin film,by using diffenent baking temperature to find high refractive index、low extinction coefficient、low roughness、and low stress in the optical thin film.
中文摘要‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧I
英文摘要‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧II
致謝辭‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧III
目錄‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧IV
圖目錄‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧VII
表目錄‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧X
第一章 緒論‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧1
1-1研究應力的基本動機‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 1
1-2薄膜應力成因‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 2
1-3能量法推導單層膜應力公式‧‧‧‧‧‧‧‧‧‧‧‧ 4
第二章 基本理論‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧8
2-1 PSI(phase shift interferometry)相位還原演算‧‧‧8
2-2 PSI相位還原疊加雜訊的濾除‧‧‧‧‧‧‧‧‧‧‧ 14
2-2-1 平均法濾鏡(Mean Filter) ‧‧‧‧‧‧‧‧‧‧15
2-2-2中值濾鏡(Median Filter) ‧‧‧‧‧‧‧‧‧‧16
2-2-3 Capanni’s 適當中值濾鏡‧‧‧‧‧‧‧‧ ‧‧16
2-2-4 Qian’s 可調制適合大小點數之濾鏡‧‧‧ ‧‧17
2-3 波前擬合‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧20
2-3-1 Zernike多項式‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧21
2-3-2 Zernike多項式擬合的演算法‧‧‧‧‧‧‧‧‧24
2-3-3 Zernike多項式的驗證‧‧‧‧‧‧‧‧‧‧‧‧27
2-3-4 Seidel aberration 係數 ‧‧‧‧‧‧‧‧‧ ‧33
第三章 薄膜應力量測技術‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 38
3-1傳統應力量測方法‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧38
3-1-1懸臂樑法‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧38
3-1-2 牛頓環法‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ ‧39
3-1-3 X光繞射法‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 40
3-2干涉相移式(Twyman-Green)應力量測系統‧‧‧‧‧‧‧42
3-3系統誤差分析‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧47
第四章 實驗儀器架構與測量儀器‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 51
4-1實驗架構 ‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 51
4-1-1 電子槍蒸鍍系統‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 51
4-2 測量儀器‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧53
4-2-1光譜儀‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 53
4-2-2原子力顯微鏡(AFM) ‧‧‧‧‧‧‧‧‧‧‧‧‧54
4-2-3顯微鏡干涉儀(WYKO SP3200) ‧‧‧‧‧‧‧‧‧56
4-2-4 Twyman-Green干涉相移式應力量測‧‧‧‧‧‧ 57
第五章:實驗結果與分析討論‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧58
5-1 實驗參數‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧ 58
5-2 退火處理對光學常數的影響‧‧‧‧‧‧‧‧‧‧‧ 60
5-3 退火處理對表面粗糙度的影響‧‧‧‧‧‧‧‧‧‧ 63
5-4 退火處理對應力的影響‧‧‧‧‧‧‧‧‧‧‧‧‧ 64
第六章:結論及未來展望‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧70
參考文獻‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧‧71
1.D.S. Campbell,Mechanical Properties of Thin Films,in Handbook of Thin Film Technology,L.I.Maissel and R.Glang ed.,McGRAW-HILL Book Company,New York,Ch.12,1970.
2.江政忠、李正中、田春林, ”干涉相移式薄膜應力量測儀”, 科儀新知, 第二十一卷, 第五期, PP.65-72, 89.4
3.M. Ohring, The Materials Science of Thin film, (ACADEMIC. PRESS, INC. San Diego, 1992), pp.419.
4.物理學名詞, 2nd ed., 國立編譯館編訂, 台灣商務印書館發行, 230(1990).
5.K.L.Chopra,Mechanical effects in thin films,in Thin Film Phenomena,p.266,McGRAW-HILL:New York,1969.
6.G.Gore,on the Properties of Electro-deposited Antimony,Trans.Roy.Soc.(London),Part 1,p.185,1858.
7.K.Kinosita,K.Maki,K.Nakamizo,and K.Takeuchi,“Stress in vacu- um deposited films of silver,”Jpn.O.Appl.Phys.,6,pp.42-53,1967.
8.P.Hariharan, B.F.Oreb, and T.Eiju, Digital phase-shifting Interfero-metry: simple error-compensitng phase calculation algorithm,Appl.Opt.,26,pp2504-2506,1987.
9.Daniel Malacara,“Optical Shop Testing”,2nd edition,John Wiley&Sons,Inc.1992
10.Capanni A, Pezzati L, Bertani D, Cetica M, Francini F. Phase-shifting speckle interferometry:a noise reduction filter for phase un-wrapping.Opt Eng 1997;36:2466-72.
11.Qian F, Wang X, Wang X, Bu Y. Adaptive filter for unwrappingnoisy phase image in phase-stepping interferometry.Optics&Laser Technology 33(2001) 479-486.
12.C.K.Jim, Polynomial fit of interferograms,Appl.Opt.,21,pp.4521-4525,1982.
13.C.K.Jim,Polynomial fit of interferograms ,ph.D.Dissertation , Uni-verrsity of Arizona,Tucson,1982.
14.王耀龍 ,透鏡像差量測與MTF的驗證,中央大學光電科學研究所碩士論文,90.6
15.許金益 ,小波在光學系統上之應用 ,中央大學光電科學研究所博士論文,91.6
16.H. K. Pulker, “Stress measurement and calculation for vacuum deposited MgF2 films”, Thin Solid Film, 58 , pp.371-376, 1979.
17.Hidetoshi YANAI, Nobuyuki KISHINE, Yukari KOMABA, and Tukitaka MURAKAMI, “Measurement of Young,s modulus and stress analysis of a magnetic thin film“, JSME Inter. J. Series A,Vol.39, No.1, p.129-134, 1996.
18.Anthony E. Ennos, “Stresses developed in optical film coatings”,Applied Optics, Vol.5, No.5, No.1, Jan 1966, pp.51-61.
19.H. Liungcrantz, L. Hultman, and J. E. Sundgren , “Residual Str-ess and Fracture Properties of Magnetron Sputtered Ti Films an SiMicroelements”, J. Vac. Sci. Technol. A 11(3), p.543-553, May/Jun 1993.
20.田春林,光學薄膜應力與熱膨脹係數量測之研究,中央大學光電科學研究所博士論文,89.5
21.江政忠,離子源輔助真空蒸鍍高反射拋物面鏡之研究,中央大學光電科學研究所博士論文,85.6
22.黃文雄,製程參數對薄膜應力影響之研究,中央大學光電科學研究所碩士論文,90.5
23.J.R.Taylor, An Introduction to error analysis, University Science Books,California,Ch.3,1982.
24.黃承揚,薄膜應力及其微觀結構之分析,中央大學光電科學研究所碩士論文,88.6
25.李正中,薄膜光學與鍍膜技術,第三版,藝軒出版社。
26.WYKO 技術資料-Interferometry theory,1999.
27.WYKO SP3200 Setup Guide,1998.
28.Yamaguchi I, Ohta S, Kato J, Surface contouring by phase-shift- ing digital holography, Optics and Lasers in Engineering 36 (20 01) 417-428.
29.H.Kadono, H.Takei ,S.Toyooka, A Noise-immune Method of Pha-se Unwrapping in Speckle Interferometry, Optics and Lasers in Engineering 26 (1997)151-164.
30.A.Guillaud, A.Benzinou, H.Troadec,V.Rodin, J.L.Bihan, Autono- mous agents for edge detection and continuity perception on oto-lith images, Image and Vision Computing 20(2002) 955-968.
31.Dennis C.Ghiglia, Mark D.Pritt ,Two-dimensional phase unwrapp-ing theory,algorithms,and software, New York:Wiley,1998.
32.M.A.Herraez, D.R.Burton, M.J.Lalor, and M.A.Gdeisat, Fast two-dimensional phase-unwrapping algorithm based on sorting by reli-ability following a noncontinuous path, APPLIED OPTICS/Vol.41,NO.35/December 2002.
33.M.A.Herraez, M.A.Gdeisat, D.R.Burton,and M.J.Lalor, Robust,fast,
and effective two-dimensional automatic phase unwrapping algori- thm based on image decomposition, APPLIED OPTICS/Vol.41, NO.35/December 2002.
34.J.A.Quiroga and E.Bernabeu, Phase-unwrapping algorithm for noisy phase-map processing, APPLIED OPTICS/Vol 33, NO.29/ October 1994.
35.P.G.Charette and L.W.Hunter, Robust phase-unwrapping method
for phase images with high noise content, APPLIED OPTICS/Vol.35, NO.19/July 1996.
36.K.A.Stetson, J.Wahid, and P.Gauthler,Noise-immune phase unwra-pping by use of calculated wrap regions, APPLIED OPTICS /Vol.36, NO.20/10 July 1997.
37.K.M.Hung, T.Yamada, Phase unwrapping by regions using least- squares approach, 1998 Society of Photo-Optical Instrumentation Engineers 2965.
38.T.J.Flynn,Two-dimensional phase unwrapping with minimum wei-ghted discontinuity, 1997 Optical Society of America.
39.D.C.Ghiglia,L.A.Romero, Minimum Lp-norm two-dimensional pha-se unwrapping ,Vol.13 No.10/October 1996/J.Opt.Soc.Am.A.
40.Mason McCuskey著,黃聖峰譯,Direct X特效 ,博碩文化。
41.鍾國亮,影像處理與電腦視覺 ,91年六月,東華書局。
42.Jae S.Lim, Two-dimensional signal and image processing p468-p494,Hall 1990.
43.沈偉,共路徑干涉之研究,中央大學光電科學研究所博士論文, 85.9
44.Anthony E.Ennos, Stresses developed in optical film coatings,Vol.5(1),51-61(1966),Applied Optics.
45.D.S.Campbell, Internal stresses in thin films,pp.223-230(1965),Proceedings of the basic problems in thin films physics symposium.
46.J.Y.Robic,H.Leplan,Y.Pauleau,B.Rafin,Residual stress in silicon di-oxide thin films produced by ion-assisted deposition,thin solid fi- lms 290-297 (1996)34-39.
47.F.Richter,H.Kupfer,P.Schlott,T.Gessner,C.Kaufmann, Optical properties and mechanical stress in SiO2/Nb2O5 multilayers.thin solid films 389(2001)278-283.
48.C.C.Lee,C.L.Tien,J.C.Hsu,Internal stress and optical properties of
Nb2O5 thin films deposited by ion-beam sputtering.Vol.41,No.10, Applied Optics.
49.M.Zhou,M.Nose,Y.Makino,K.Nogi, Annealing effects on the structure and mechanical properties of r.f.sputtered Cr-B hard thin fil-ms. thin solid films 359(2000)165-170.
50.W.H.Cheng,S.F.Chi,A.K.Chu,Effect of thermal stresses on temperature dependence of refractive index for Ta2O5 dielectric films. th- in solid films 347(1999)233-237.
51.H.Kupfer,T.Flugel,F.Richter,P.Schlott, Intrinsic stress in dielectric thin films for micromechanical components. Surface and coatings technology 116-119(1999)116-120.
52.Petar Vretenar, The stress reduction in TiO2 films,Vacuum/Vol.40/numbers 1/2 /pages173-176/1990.
53.G.Atanassov,J.Turlo,J.K.Fu,Y.S.Dai, Mechanical,optical and structu-ral properties of TiO2 and MgF2 thin films deposited by plasma ion assisted deposition.thin solid films 342(1999)83-92.
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top