# 臺灣博碩士論文加值系統

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 本研究試圖在薄膜成長的光學監控中另闢道路，不以一般Runsheet圖監控，而改以導納軌跡圖。 Runsheet圖監控除了有極值點判斷不易的缺點，其圖形特性也只能看出光強度的變化，對於膜成長的變化亦無法有效掌握。導納軌跡圖本身的圖形特性不僅彌補了這述缺點，關於薄膜的相厚度的觀察更是其獨有。 論文中將以數學及實驗驗證上述特性，並利用其觀察相厚度的特性即時做膜厚補償。
 Optical monitoring is the main method for determinating film thickness. Unlike monitoring by runsheet diagram, we raise a new method by admittance diagram. Runsheet has some popular defects such as diffcult to determinate the extreme point and ineffectiveness of observing film growth. Admittance diagram not only overcome these defects, but can oberve the variation of phase thickness. In this thesis, we vertify these qualities mathematically and by experiment. And real-time compensating by the property observing phase
 英文摘要.................................................................................................................I中文目錄 ...............................................................................................................II目錄.........................................................................................................................III圖目錄.....................................................................................................................V表目錄.....................................................................................................................VII第一章 緒論.......................................................................................................1第二章 原理.......................................................................................................22-1 基本物理量的建立...............................................................................22-1 單介面穿透與反射...............................................................................42-3 單層膜的等效導納與折射率...............................................................52-4 多層膜的等效導納與穿透率...............................................................72-5 導納軌跡圖...........................................................................................8第三章 各種監控方式的比較...........................................................................113-1 石英監控...............................................................................................113-2 計時法監控...........................................................................................123-3 間接監控與直接監控...........................................................................123-4 反射式與穿透式...................................................................................133-5 光譜法...................................................................................................133-6 極值點法與定值監控法.......................................................................143-7 Overshoot Turning Point monitoring (OTPM)...........................................163-8 導納軌跡圖監控法...............................................................................17第四章 導納軌跡圖監控...................................................................................184-1 圖形原理...............................................................................................184-2 靈敏度— Sensitivity................................................................................194-3 從穿透率推算等效導納.......................................................................224-4 導納軌跡法的膜厚補償.......................................................................254-4-1 抗反射膜補償..............................................................................254-4-2 四分之一膜堆補償......................................................................284-4-3 熱鏡的補償..................................................................................30第五章 設備與實驗...........................................................................................325-1 實驗設備與硬體架設...........................................................................325-2 訊號評價...............................................................................................345-3 實驗結果...............................................................................................355-3-1 單層Ta2O5 ...................................................................................355-3-2 單層Ta2O5 加雜訊......................................................................375-3-3 抗反射膜......................................................................................38第六章 結論.......................................................................................................41參考資料 ...............................................................................................................42
 [1]B. Vidal, A. Fornier, and E. Pelletier, “Optical monitoring of nonquarterwave multilayer filters”, Appl. Opt. 17, 1038~1047(1978).[2]李正中, 薄膜光學鍍膜技術, 藝軒出版社, 2002年.[3]H.A. Macleod, Thin-Film Optical Filters, McGraw Hill, New York, 1986.[4]Ronald R. Willey, “Optical thickness monitoring sensitivity improvement using graphical methods”, Appl. Opt. 26, 729(1987).[5]C. Grbzes-Besset, F. Chazallet, G. Albrand, and E. Pelletier, “Synthesis and research of the optimum conditions for the optical monitoring of non-quarter-wave multilayers”, Appl. Opt. 32 , 5612~5618(1993).[6]H.A. Macleod, “Monitoring of optical coatings”, Appl. Opt. 20, 82~89(1981).[7]Bradley Bobbs and J. Earl Rudisill, “Optical monitoring of nonquarterwave film thicknesses using a turning point method”, Appl. Opt. 26, 3136~3139(1987).[8]J.A. Dobrowolski, Numreical Methods For Optical Coatings, National Research Council of Canada.[9]H.A. Maleod, E. Pelletier, “Error compensation mechanisms in some thin-film monitoring systems”, Optica Acta, 24, 915(1977).[10]Futing Zhao, “Monitoring of periodic multilayers by the level method”, Appl. Opt. 24, 3339~3342(1985).[11]Cheng-Chung Lee, Shang-Hui Chen, and Cheng-chung Jaing, “Optical monitoring of silver-based transparent heat mirrors”, Appl. Opt. 35, 5698~5730(1996).[12]C. J. van der Laan, “Optical monitoring of nonquarterwave stacks”, Appl. Opt. 25, 759 (1986).
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