跳到主要內容

臺灣博碩士論文加值系統

(3.231.230.177) 您好!臺灣時間:2021/08/02 11:16
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

我願授權國圖
: 
twitterline
研究生:賴信宏
研究生(外文):Sim-hong Lie
論文名稱:電子迴旋共振化學氣相沉積類鑽碳薄膜在微鑽針之研究
論文名稱(外文):Study on the DLC Film Deposition Microdrill by ECR-CVD
指導教授:翁恆義
指導教授(外文):H. Y. Ueng
學位類別:碩士
校院名稱:國立中山大學
系所名稱:電機工程學系研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2004
畢業學年度:92
語文別:中文
論文頁數:90
中文關鍵詞:類鑽碳膜印刷電路板微鑽針電子迴旋共振
外文關鍵詞:ECRPCBDLCmicrodrill
相關次數:
  • 被引用被引用:0
  • 點閱點閱:116
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:0
HBS 900 型為一混合物理氣相沉積與電子迴旋共振化學氣相沉積兩種方式的系統,用來在微鑽針上鍍上類鑽膜,此微鑽針具有較低的摩擦係數,有助於在電路板上鑽孔。此外,為了改善附著性的問題,首先我們會在鑽針表面鍍上Ti/TiN/TiCN 的多層膜來提高類鑽膜的附著性。硬質層如氮化鈦( TiN )與碳氮化鈦( TiCN )採用陰極電弧沉積法,以及濺鍍法等物理氣相沉積來完成,隨後我們在同一個腔體以電子迴旋共振輔助化學氣相沉積法,將類鑽膜鍍在上面。類鑽薄膜特性分析藉由拉曼光譜儀,以及刮痕測試與pin-on-disk 測試來完成。經過鍍膜後的微鑽針其特性如下:絕佳的附著性( 臨界荷重65N )、摩擦係數小於0.15。在鑽孔後,我們可以透過表面粗糙度與釘擊測試來知道鑽孔品質。經鍍膜後的的微鑽針其壽命可以增加2.5 倍
A hybrid physical vapor deposition- electron cyclotron resonance-chemical vapor deposition (PVD-ECRCVD) coating system HBS900 is used to deposit the diamond-like carbon (DLC) film on the microdrills. It could keep friction low
results in improving the productivity of the drill holes on the printed circuit board (PCB). In order to improve the adhesion strength of the DLC films,functionally gradient Ti/TiN/TiCN supporting multilayer were pre-deposited
initially on the microdrills. The hard coatings of titanium nitride (TiN) and titanium carbonitride (TiCN) as multilayer are deposited by PVD with high rate coating sources based on the principle of electrical arc vaporization and magnetron sputtering process. The on it following dry lubricant coating is composed of amorphous, diamond like carbon (DLC) deposited by ECRCVD plasma in the same recipient. The structural characteristics of DLC films were investigated by Raman spectroscopy and standard scratch and pin-on-disk test.The properties of DLC films coating on the microdrills are obtained and summarized as follows: excellent adhesion 65N, and coefficients of friction less than 0.15. After micro-hole drilling, we obtained the high quality drilled hole from the inspection of roughness and nailheading. As a result of adapting a
microdrill coated with DLC film, the drilling lifetime was significantly improved
to reach about 2.5 times than that of the uncoated one.
授權書
中文審定書
英文審定書
誌謝..................................................... I
中文摘要................................................ II
英文摘要............................................... III
目錄....................................................IV
表目錄..................................................VII
圖目錄.................................................VIII
第一章序論............................................... 1
1-1 前言................................................. 1
1-2 研究動機............................................. 2
1- 3 論文架構.............................................2
第二章理論基礎............................................3
2-1 類鑽碳膜..............................................3
2 - 1 - 1 類鑽碳膜之結構. . . . . . ..................... 5
2 - 1 - 2 類鑽碳膜之成長機制............................. 7
2-1-3 類鑽碳鍍層之限制及其改善方法........................10
2-2 微波電子迴旋共振化學氣相沈積法........................11
2-2-1 電漿理論................................ ...........12
2 - 2 - 2 微波電子迴旋共振之原理. . . . . . . . . . .. . .13
2-3 拉曼光譜儀...........................................14
第三章微鑽針.............................................16
3-1 鑽針簡介.............................................16
3-2 鑽針磨耗.............................................17
3-3 鑽孔品質之界定.......................................18
3-4 印刷電路板...........................................19
第四章實驗方法與步驟.....................................22
4-1 系統介紹.............................................22
4-1-1 真空系統...........................................23
4-1-2 真空度量測.........................................23
4-1-3 基材holder.........................................23
4-1-4 加熱與溫度控制.....................................23
4-1-5 氣體...............................................23
4-1-6 陰極電弧蒸鍍系統...................................24
4-1-7 ECR 系統...........................................24
4-1-8 Sputter 系統.......................................24
4-2 測試設備.............................................24
4-2-1 拉曼測試...........................................24
4-2-2 鑽孔測試...........................................25
4-2-3 附著性試驗.........................................25
4-3 實驗流程.............................................26
第五章實驗結果與討論.... ................................27
5-1 拉曼光譜分析.........................................27
5-2 鍍膜附著性的改善.....................................31
5-3 鑽孔測試.............................................32
第六章結論...............................................34
參考文獻.................................................77
Table 2-1 ECR電漿與RF電漿之比較..........................35
Table 4-1 各真空pumb 規格表..............................35
Table 4-2 各種通入氣體種類與流量.........................36
Table 4-3 Parameter recommendation for microdrill for FR4 printed circuit board....................................36
Table 4-4 Process regime for the production the DLC layer in the hybrid system HBS 900.Procedure steps and process data.....................................................37
Table 5-1 The G-peak position and ID/IG of Raman spectra at a differentbias..........................................38
Table 5-2 Summary of inspection for the adhesion and friction properties of the DLC and Ti/TiN/TiCN/DLC multilayers..............................................38
Table 5-3 Results of the dry drilling test of FR4 as a function of the coating type of microdrill...............39
Fig 2-1 鑽石結晶型態.....................................40
Fig 2-2 石墨結晶型態.....................................40
Fig 2-3 晶質含氫類鑽碳膜的三元相圖.......................41
Fig2-4 晶質含氫類鑽碳膜之結構示意圖......................42
Fig 2-5 電漿中反應成介穩態物質的活化能示意圖.............43
Fig 2-6 結晶碳的自由能對體積示意圖.......................44
Fig 2-7 碳離子進入非晶質類鑽碳膜的表面穿透機制示意圖(a)直接穿透(b)Knock-on 穿透.....................................45
Fig 2-8 非晶質成長示意圖(a)入射離子能量小( 0-0.1eV ) (b)適當的入射離子能量( 1-100eV ) (c)入射離子能量過大( >100eV )..46
Fig 2-9 電子(Te)與氣體(Tg)溫度與壓力的關係...............47
Fig 2-10 微波電子迴旋共振化學氣相沉積系統................48
Fig 2-11 電子在磁場中運動的示意圖(a) 電場= 0, (b).......49
Fig 2-12 (a)右旋偏振。(b)左旋偏振........................50
Fig 2-13 拉曼散射與雷利散射..............................50
Fig 3-1 微鑽針幾何外型...................................51
Fig 3-2 鑽針磨耗型態(1)刀腹磨耗(2)刀角磨耗(3)鑿刃磨耗(4)凹
陷磨耗(5)外緣磨耗........................................52
Fig. 3-3 Nail heading and surface roughness of hole quality..................................................53
Fig 3-4 Flow chart of image processing method............54
Fig 3-5 Definintion of edge position angle and fibre angle ............................................... ...55
Fig 3-6 the edge position angle and the surface roughness................................................56
Fig 3-7 The number of drilled holes and the surface roughness................................................57
Fig 3-8 The number of drilled holes VS the drilled hole radius and the damaged radius............................58
Fig 4-1 HBS 900 外觀.....................................59
Fig 4-2 HBS 900 hybrid 結構圖............................60
Fig 4-3 PCB 立式三軸工具機..............................61
Fig 4-4 FR4 雙面板的構造組合圖..........................62
Fig 4-5 鑽削配置及鑽削力量測流程圖......................62
Fig 4-6 鑽削路徑及鑽削位置配置圖........................63
Fig 4-7 刮痕試驗機......................................64
Fig 4-8 pin-on-disk測試.................................65
Fig 4-9 Dry lubricant TiN/TiCN/DLC multilayer structure..66
Fig 5-1 Illustrates the fitting of two decomposed Gaussian
distributions, their summations, and the measured Raman
spectra of deposited DLC films...........................67
Fig 5-2 (a) g E2 mode (b) u E1 mode......................68
Fig 5-3 g A1 mode........................................68
Fig 5-4 所有碳質結構的薄膜區依照G peak 波函數大小與I(D)/I(G)比例區分成的三種狀態.....................................69
Fig 5-5 G D I I / 的比與類鑽膜中石墨群的大小.............70
Fig 5-6 Raman spectra of DLC films at different DC bias values...................................................71
Fig 5-7 基板偏壓對G band及G D I I / 之影響...............72Fig 5-8 Result of frictional force versus load during the scrach test........................73
Fig 5-9 Tribological behavior of diamond-like carbon during
Sliding...................................................74
Fig 5-10 Tools life of non-coated, TiN, DLC in drilling of FR4 printed circuit board contact...................................................75
Fig 5-11 schematic illustration of a possible mechanism on the role of the low-fraction coating during a machining
application...............................................76
參 考 文 獻
第 一 章
1. Frnak Loffler, “Wear and cutting performance of coated microdrills”, Surface and Coating Technology, Vol.107, 1998,
pp. 191-196.
2. K. Ogawa, E. Anyama, H. Inoue, T. Hirogaki, H. Nobe, Y.Kitahara, T. Katayama, M. Gunjima, “Investigation on cutting mechanism in small diameter drilling for GFRP (thrust force and surface roughness at drilled hole wall)”, Composite Structure, Vol.38, No. 1-4, 1997, pp. 343-350.
3. Hisahiro Inoue, Eiichi Aoyama, Toshiki Hirogaki, Keiji Ogawa,
Hiroshi Matushita, Youji Kitahara, Tsutao Katayama,“Influence
of tool wear on internal damage in small diameter drilling in
GFRP”, Composite Structures,Vol.39, No.1-2, 1997, pp.55-62.
4. S. Miyake, R. Kaneko,” Microtribological properties and potential
applications of hard, lubricating coatings”, Thin Solid Films, Vol.212 , 1992 , pp. 256-261.
5. B.K. Gupta, B. Bhushan, “Mechanical and tribological properties
of hard carbon coatings for magnetic recording heads”, Wear, Vol.109, 1995 , pp.110-122.
6. K. Kobayashi, K. Yamamoto, N. Mutsukura and Y. Machi,
“ Sputtering characteristics of diamond and hydrogenated amorphous carbon films by R.F. plasma”,Thin Solid Films 185(1990), pp71-78.
7. M.A. Tamor, C.H. Wu, R.O. Carter and N.E. Lindsay, Appl. Phys. Lett. 55(1989)1388.
8. A. Raveh, J.E. Klenberg-Sapieha, L. Martinul and M.R. Wertheimer, J. Vac. Sci. Technol. 10(1992)1723.
9. J. Won, A. Hatta, Tssaki and A. Hiraki, Appl. Phys.Lett. 69 (1996)4179.
10.Y. C. Chan, X.S. Miao, X. M. He, and S. T. Lee, J. Elect. Materials, 27(1998)41.
11.S.F. Yoon, H. Yang, Rusli, J. Ahn, and Q. Zhang, J. Elect. Materials, 27(1998)44.

第 二 章
1. F.P. Bundy, H.T. Hall, H.M. Strong, and R.H. Wentorf, Nature 176, 51(1955)
2. Z. Ring and T.D. Mantei, J. Vac. Sci. Technol., A13 (1995) 1617
3. Z. Ring and T.D. Mantei, Appl. Phys. Lett., 66 (1995) 3380
4. C.R. Eddy, Jr., D.L. Youchison and B.D. Sartwell, Diamond and Related Materials, 3 (1993) 105
5. R.K. Singh, D. Gilbert, R. Tellshow, P. H. Holloway, R. Ochoa, and J.H. Simmons, Appl. Phys. Lett., 61 (1992) 2863
6. T. Yara, M. Yuasa, M. Shimizu and H. Makita, Jpn. J. Appl. Phys., 33 (1994) 4404
7. M. Ihara, H. Maeno, K. Miyamoto and H. Komiyama, Diamond and Related Materials, 1 (1992) 187
8. S.H. Kim, Y.S. Park and S.K. Jung, J. Vac. Sci. Technol., A13 (1995) 1619
9. I. Watanabe, T. Matsushita and K. Sasahara, Jpn. J. Appl. , Phys. 31 (1992) 1428
10. J. Seth, M.I. Chaudhry and S.V. Babu, J. Vac. Sci. Technol.,
10 (1992) 3125
11. G.F. Zhang and X. Zheng, Sur. Coat. Technol., 82 (1996)110
12. Diamond Relat. Mater. 3 (1994) 732
13. J. Robertson, Diamond Relat. Mater. 1 (1992) 397
14. S. Aiesenberg and F.M. Kimock, Mater. Sci. Forum, 52 & 53
(1989) 115. I.R. McColl and T.L. Parker and A.A. Goruppa, Diamond Relat. Mater. 3 (1993) 83
16. K. Zolynski, P. Witkowski, A. Kaluzny, Z. Has, P.Niedzielski and S. Mitura, J. Chem. Vapor Deposit., 4(1996) 232
17. V.L. Arbuzov, A.B. Vladmirov, V.B. Vykhodets, A.E. Davletshin, S.HA. Plotnikov, I.Sh. Trakhtenberg, A.P.Rubshtein, S.D. Gorpinchenko and E.V. Kuzmina, DiamondRelat. Mater., 3 (1994) 775
18.J. Robertson,”Properites of diamond-like carbon”, Surf.Coat.
Technol.,50(1992)185
19.W. Hockauf, H. Pro¨ ll, R. Ba¨uerle, G. Eisenbla¨tter, W. Rehbein,
VDI Berichte 1375 (1998) 135.
20.A.Grill, ”Plasma-deposited diamondlike carbon and related
materials”,IBM journal,168(1993)143
21.C.Y.Hsu,L.Y. Chen and F.C.N.Hong, “The effect of substrate
temperature on the growth CNx films with β -C3N4-like
microcrystallites by an inductively coupled plasma(ICP) sputtering method”,Diamond Relat.Mater.,8(1999)1315
22.J.J.Cuomo,D.L. Pappas,J.Bruley,J.P. Doyle and K.L. Saenger, ”Vapor deposition processes for amorphous carbon film with sp3 fractions approaching diamond”,J.Appl.Phys.,70(1991)
1706
23.S.S.Camargo,Jr. A.L.BaiaNeto,R.A.Santos,F.L. Freire,Jr,R Carius, F.Finger, “Improved high-temperature stability of Si incorporated a-C:H films”,Diamond Relat. Mater.,7(1998)1155
24.Weng-Jin Wu, Min-Hsiung Hon,”Thermal stability of diamond-like
carbon films with added silicon”,Surface and Coating Technology,
111(1999)134
25.H.L.Bai, E.Y. Jiang,”Improvement of the thermal stability of
diamond-like carbon films by incorporation of nitrogen”, Thin Solid Films,353(1999)157
26.D.R.Tallant, J.E. Parmeter,M.P. Siegal,R.L.Sompson,”The thermal
stability of diamond-like carbon”, Diamond Relat.Mater.4(1995)
191
27.C.M. Chan,t.m.Ko and H. Hiraoka,”Polymer surface modification by
plasma and photons”,Surf.Sci. Rep.,24(1996)241
28. J. Robertson, Diamond Relat. Mater., 3 (1994) 361
29. J. Robertson, Surface and Coating Technology, 50 (1992)185
30. A. R. Badzian et al, E-MRS Meeting XV, 63 (1987).
31. C.D. Martino, F. Demichelis and A. Tagliaferro, Diamond
Relat. Mater., 4 (1995) 1210
32. J. Robertson,The deposition mechanism of diamond-like a-C and
a-C:H, Diamond Relat.Mater.,3(1994)p.61
33. D.R. Mckenzie, D. Muller and B.A. Pailthorpe, Phys. Rev. Lett.,
67 (1991) 773
34. C. Weissmantel, Thin Solid Films, 92 (1982) 55
35. Y. Lifshitz, S.R. Kasi and J.W. Rabelais, phys. Rev. B,41 (1990) 1046
36. B.A. Pailthorpe, J. Appl. Phys., 70 (1991) 543
37. J. Robertson, Diamond Relat. Mater., 3 (1994) 361
38. H.P. Kaukonen and R.M. Nieminen, Phys. Rev. Lett., 68(1992) 620
39. J.J. Cuomo, D.L. Pappas, J. Bruley, J.P. Doyle and K.L.Saenger, J. Appl. Phys., 70 (1991) 1706
40. J. Robertson, J. Non-Cryst. Solids, 164/166 (1993) 1115
41. J. Robertson, Diamond Relat. Mater., 5 (1996) 519
42. B.B Pate ,M.H. Hecht,C. Binns,”Photoemission and photon-stimulated ion desorption studies of diamond(111): hydrogen”, Journal of Vacuum Science Technology,21(1981)364-367.
43. A. Ravch,L. Martinu,H.M. Hawthorne,M.R. Wertheimer,” Mechanical and tribological properties of dual-frequency plasma-deposited diamond-like carbon”,Surface and Coatings Technology,58(1993)45-55
44. A.A Minevich,” Wear of cemented carbide cutting inserts with multilayer Ti-based PVD coatings”,Surface and Coatings Technology,53(1992)161.
45. S. Yang,D. Camino,A.H.S. Jones ,D.G. Teer,”Deposition and tribological behaviour of sputtered carbon hard coatings”,Surface and Coatings Technology,124(2000)110-116.
46. J.C. Sanchez-Lopez,C. Donnet,J. Fontaine,et al.,”Diamond-like carbon prepared by high density plasma”,Diamond and Related Materials,9(2000)638-642.
47. Ronkainen, S. Varjus, J. Koskinen, K. Holmberg, "Differentiating
he tribological performance of hydrogenated and hydrogen-free
DLC coatings", Wear, Vol. 249, 2001, pp. 260-266.
48. 卓廷彬, "物理蒸鍍技術在3C 產業工模具的應用", 金屬工業35卷3 期, 中華民國90 年5 月。
49. Ronkainen, J. Likonen, J. Koskinen, S. Varjus, “Effect of tribofilm formation on the tribological performance of hydrogenated carbon coatings”, Surface and Coatings Technology, Vol. 79, 1996, pp.87-94.
50. B. Rother, J. Siegel and J. Vetter, “Cathodic arc evaporation of graphite with controlled cathode spot position”, Thin Solid Films,Vol. 188, 1990, pp. 293-300.
51. D.R. McKenzie, Y. Yin, N.A. Marks, et al., “Hydrogen-free
amorphous carbon preparation and properties”, Diamond and
Related Materials, Vol. 3, 1994, pp.353-360.
52. V. Kulikovsky, P. Bohac, F. Franc, A. Deineka, V. Vorlicek, L.
Jastrabik, “Hardness,intrinsic stress, and structure of the a-C and a-C:H films prepared by magnetron sputtering”, Diamond and
Related Materials, Vol. 10, 2001, pp.1076-1081.
53. D.Y. Wang, C.L. Chang, Wei-Yu Ho, ”Characterization of
hygrogen-free carbon films deposited by pulsed plasma
technology”, Thin Solid Films, Vol. 355-356, 1999, pp. 246-251.
54. Dimigen, C.P. Klages, ” Microstructure and wear behavior of
metal-containing diamond-like coatings”, Surface and Coatings
Technology, Vol. 49, 1991, pp.543-547.
55. L. Feng, J. Tang, et al., ”Tribological properties of
magnetron-sputtered TiC coatings”, Materials Science and
Engineering, Vol. A257, 1998, pp. 240-249.
56. Holleck, M. Lahres, P. Woll, ” Multilayer coatings. Influence of fabrication parameters on constitution and properties”, Surface and Coatings Technology, Vol. 41, 1990, pp. 179.
57. C.L. Chang, D.Y. Wang, ”Microstructure and adhesion
characteristics of diamond-like carbon films deposited on steel
substrate”, Diamond and Related Materials, Vol. 10, 2001, pp.
1528-1534.
58. A.A. Voevodin, R. Bantle, A. Matthews, ”Dynamic impact wear
of TiCxNy and Ti-DLC composite coatings”, Wear, Vol. 185, 1995,
pp.151-157.
59. Matthews, A. Leyland, et al., ”Design aspects for advanced
tribological surface coatings”, Surface and Coatings Technology,Vol. 100-101, 1998, pp.1-6.
60. Y.L. Su, W.H. Kao, “Optimum multilayer TiN-TiCN coatings for
wear resistance and actual application”, Wear, Vol. 223, 1998, pp.119-130.
61. Y.L. Su, W.H. Kao, ”Tribological behavior and wear mechanisms
of Ti-C:H/TiC/TiCN/TiN/Ti coatings when sliding against steel,
bronze and aluminum alloy rods ”, Journal of Materials
ScienceVol. 36, 2001, pp. 189-199.
62. Y.L. Su, W.H. Kao, ”Tribological and application of Ti-C:H and
Cr-C:H coated tungsten carbide substrate ”, Surface and Coatings
Technology, Vol. 37, 2001, pp. 293-303.
63. Erdemir, C. Bindal, G. Fenske, p. Wilbur, “Tribological properties of hard carbon films on zirconia ceramics”, Tribology
Transactions, Vol. 39, 1996, pp.735-744.
64. Sjöström, L. Hultman, J.-E. Sundgren, L.R. Wallengerg,
“Microstructure of amorphous C:H and metal-containing C:H
films deposited on steel substrates”, Thin Solid Films, Vol. 232,1993, pp. 169-179.
65. C.P. Klages, H. Koberle, M. Bauer, R. Memming, “Properties and
microstructure of metal-containging a-C:H films”, Proceedings of the First International Symposium on Diamond and
Diamond-Like Films, 1989, pp. 225-236.
66. S.J. Harris , A.M. Weiner, M. Grischke,” EVects of load on the
abrasion of steel by metal-containing diamond-like carbon”,
Surface and Coatings Technology, Vol. 120–121, 1999, pp.
561–564.
67. M. Stuber, S. Ulrich, H. Leiste,A. Kratzsch, H. Holleck, “Graded
layer design for stress-reduced and strongly adherent superhard
amorphous carbon films”, Surface and Coatings Technology, Vol.
116-119, 1999, pp. 591-598.
68. D.E. Wolfe, J. Singh, ”Titanium carbide coatings deposited by
reactive ion beam-assisted, electron beam-physical vapor
deposition”, Surface and Coatings Technology, Vol. 124, 2000, 142-153.
69. Maurice H. Francombe, “Plasma Sources for Thin Film
Deposition and Etching”,Phsics of Thin Films 18(1994)。
70.宁兆元、任兆杏,”電子迴旋共振等離子體技術及其應用”,
物理學進展,第12 卷第1 期(1992)。
71. Z. C. Feng, A. A. Allerman, P. A. Barnes and S. Perkowitz,
Appl. Phys. Lett. 60, 1848(1992)
72. J. P. Estrera, P. D. Stevens, R. Glosser, W. M. Duncan,Y. C. Kao,Y. H.Liu and E. A. Beam, Appl. Phys. Lett.61, 1927(1992)
73. G. Lucovsky, M. H. Brodsky, M. F. Chen, R. J. Chicotka
and A. T. Ward, Phys. Rev. B4, 1945(1971)
74. Koji Yano and Takashi Katoda, J. Appl. Phys.70,7036(1991)
75. D. P. Bour, J. R. Shealy, A. Ksendzov and Fred Pollak,
J . Appl. Phys. 64, 6456(1988)
76. F. H. Pollak and H. Shen, in Proceeding of the Society of Photooptical Instrumentation Engineers (SPIE, Bellingham, 1898), Vol. 1037,P 16.
第 三 章
1.施士塵,”碳化鎢微鑽針鑽削印刷電路板之膜潤性質研究”,90年,國立成功大學碩士論文。
2. M. A. Lieberman, “Design of high-density plasma sources for materials processing”, in Physics of thin films, edited by M. H. Francombe and J. L. Vossen(Academic Press, New York, 1994) pp.2-34
3. 李鎮日,“影響鑽頭之乾切削壽命探討”,69 年,成功大學碩士論文。
4. 朱惠民,“固質潤滑劑應用於微孔鑽製特徵研究”,70 年,國立成功大學碩士論文。
5. E.Aoyama, H.Inoue, T.Hirogaki, H.Nobe, Y.Kitahara & T.Katayama, in composition structure 32(1995),p567-573
6. Hisahiro Inoue, Eiichi Aoyama, T.Hirogaki, K. Ogawa, H.Nobe, Y.Kitahara & T.Katayama,in composition structure 39(1997) ,p55-62
第 五 章
1. K.W.R. Gilkes, S. Prawer, and K.W. Nugent, J. Appl. Phys. 87 (2000) 7283.
2. S. F. Yoon, H. Yang, A. Rusli, J. Ahn, and Q. Zhang, Diamond Relat. Mater. 7 (1998) 70.
3. T. Sharda, T. Soga, T. Jimbo, and M. Umeno, Diamond Relat. Mater. 9 (2000) 1331.
4. S. F. Yoon, Rusli. J. Ahn, Q. Zhang, Y. S. Wu, and H. Yang, Diamond Relat. Mater. 7 (1998) 1213.
5. A. Tamor, and W. C. Vassel, J. Appl. Phys. 76 (1994) 3823.
6. F.Tuinstra and J.L. Koenig,Raman Spectrum of Graphite,
J.Chen.Phys. ’53,[3] 1126-1130(1970)。
7. S.A. Solin,Raman and IR Studies of Graphite Intercalates,Physica B,99,443-452(1980)。
8. M.A. Tamor and W.C.Vassel,Raman Fingerpriniting of Amorphous Carbon Films,J.Appl.Phys.’76,[6]3823-3830(1994)。
9. M.A. Tamor and W.C.Vassel,Raman Fingerpriniting of Amorphous Carbon Films,J.Appl.Phys.’76,[6]3823-3830(1994)。
10. .Capano,N.T.McDeutt,R.K.Singh and F.Qian,Characterization of Amorphous Carbon Thin Film,J.Vac.Sci.Technol.A,’14,[2]431-435
(1966)
11. Tsai,D.B.Bogy,M.K.Kundmann,D.K.Veirs,M.R.Hilton and S.T.Mayer,Structure and Properties of Sputtered Carbon Overcoats on Rigid Magenetic Media Dicks,J.Vac.Sci.technol.A,6,4]2307-2315(1998)。
12. 何主亮,常挽瀾,陳育智,電漿化學氣相沉積氮化碳薄膜的微觀結構與機械性質,真空科技,第9 卷,第2 期,34-35,(1996)。
13. Tsai,D.B.Bogy,M.K.Kundmann,D.K.Veirs,M.R.Hilton and S.T.Mayer,Structure and Properties of Sputtered Carbon Overcoats on Rigid Magenetic Media Dicks,J.Vac.Sci.technol.A,6,4]2307-2315(1998)。
14. M.A. Tamor and W.C.Vassel,Raman Fingerpriniting of Amorphous Carbon Films,J.Appl.Phys.’76,[6]3823-3830(1994)
15. Tsai,D.B.Bogy,M.K.Kundmann,D.K.Veirs,M.R.Hilton and
S.T.Mayer,Structure and Properties of Sputtered Carbon
Overcoats on Rigid Magenetic Media Dicks,J.Vac.Sci.technol.A,6,[4]2307-2315(1998)。
16. J. Schwan, S. Ulrich, V. Batori, H. Ehrhardt and S.R.P.
Silva, J. Appl. Phys., 80 (1996) 440
17. Y. Lifshitz, S.R. Kasi and J.W. Rabelais, phys. Rev. B, 41 (1990)1046
18. B.A. Pailthorpe, J. Appl. Phys., 70 (1991) 543
19.A. C. Ferrari* and J. Robertson, Phys. Rev. B 61 (2000) 14095.
20. R. Vuppuladium, H.E. Jackson and R.L.C., J. Appl. Pphys.,
77 (1995) 2714 Characterization of Amorphous Carbon Thin Film,
J.Vac.Sci.Technol.A,’14,[2]431-435(1966)
21. Tsai,D.B.Bogy,M.K.Kundmann,D.K.Veirs,M.R.Hilton andS.T.Mayer,Structure and Properties of Sputtered Carbon Overcoats on Rigid Magenetic Media Dicks,J.Vac.Sci.technol.A,6,[4]2307-2315
(1998)。
22. A.C. Ferrai, J. Robertson, Phys. Rev. B 61(2000)14095.
23. M. Chhowalla, A.C. Ferrari, J. Robertson, G.A. J. Amaratunga,
Appl. Phys. Lett. 76(2000)1419.
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top