臺灣博碩士論文加值系統

本文乃基於過去三年來本研究團隊對於1998年Nature期刊所發表有關光的異常穿透現象後，一系列對這樣的次波長週期性結構對於光行進行為的研究為基礎。在2002年本團隊林鼎晸學長對指向性對問題作了定性的研究，2003年余良彬博士對於光的指向性提出了表面電漿繞射的思考模式，因此本研究團隊對於奈米直寫儀的開發工作正如火無筡的進行中。論文的內容是以工程的方法來利用這樣的一個有光學指向性現象元件，為其設計與製作搭配的元件系統、定義其聚焦現象的特徵參數、撰寫控制用的人機介面，並嘗試對於這樣新穎的聚焦直寫系統尋求最佳化的調校方式。
由最後的試驗結果可知，在系統的搭配與調校上大都也經完成了，整體系統也已經可以穩定的工作，但刻寫線寬仍然未達預估的大小，刻寫品質也未達實用化的水準。這與曝光所需的時間，次波長週期性結構的製作品質都有相當的關係，所幸本研究之研究成果，對於解決這樣的問題及改善其刻寫的品質均已提出解決之方法。

The thesis work can find its foundation form the extraordinary optical transmission phenomena published in Journal Nature in 1998. The focus is to utilize the focusing and directional beaming phenomenon, which is strongly influenced by the subwavelength period structure, in an engineering system. In 2002, D. J. Lin, a master graduate of our team had completed his thesis on the qualitative analysis of directional beaming. In 2003, L. B. Yu, a Ph.D. of our group had proposed a new viewpoint on directional beaming.
With an attempt to capitalize on the above-mentioned research, our team has been trying to create a nanowriter machine. In this dissertation, works was done to analyze design parameter of optical head, to design the components needed, to program the GUI (graphical user interface) and to optimize the alignment method needed. We attempted to improve lithography technology by using the nanowriter system even though the underlying physical understanding related to directional beaming is still incomplete.
Finally, according to direct writing test results done by this newly developed machine, the nanowriter system was found to be stable and reliable. Nonetheless, line width and writing quality did not meet our original expectations. The profile of period structures and other design parameters were proposed to be the underlying mechanism for this less than perfect performance.

第一章 緒論 1
1.1 前言與研究動機 1
1.2 研究背景與文獻回顧 3
1.3 論文架構摘要 6
第二章 原理 7
2.1 奈米結構表面電漿指向性 7
2.1.1 透鏡聚焦所面臨的物理極限 7
2.1.2 奈米結構之光傳指向性發現 9
2.2 指向性傳遞的物理機制 10
2.2.1 表面電漿 10
2.2.2 週期性結構與表面電漿的交互作用 14
2.2.3 可能的物理機制 17
2.3 數值模擬方法 18
2.3.1 RCWA理論 18
2.3.2 利用FDTD與RCWA估算指向性結果 24
第三章 系統架設 27
3.1 直寫儀光學頭設計與製作 27
3.1.1 模擬與分析 27
3.1.2 決定製作參數跟銀磨基版製備 33
3.1.3 光學頭之檢驗與修正 36
3.2 光機系統設計 40
3.2.1 光場條件 40
3.2.2 機械結構與規格 40
3.2.3 間隙良策方法與架設 45
3.3 曝光光阻之選擇與調整 48
3.3.1 光阻規格與特性 48
3.3.2 調整後光阻特性與製備方法 50
第四章 奈米直寫儀之建構與校準 51
4.1 工作環境 51
4.2 光路校正方法 53
4.2.1 光路架構 53
4.2.2 光路調整程序 55
4.3 運動平台控制系統 57
4.3.1 PID控制基本架構 58
4.3.2 XY軸運動控制 62
4.3.3 Z軸控制 65
第五章 刻寫結果分析與討論 67
5.1 初步曝光結果 67
5.1.1 系統架設條件 67
5.1.2 曝光結果不佳的情形 68
5.1.3 分析改進 70
5.2 較佳的曝光結果 72
5.2.1 Z軸參數最佳化方法 72
5.2.2 光阻塗佈製程的改善 75
5.2.3 曝光結果 75
第六章 結論與未來展望 77
6.1 結論 77
6.2 未來展望 78
參考文獻 80

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