臺灣博碩士論文加值系統

TiO2因其為具有強大氧化還原能力的半導體，而成為最廣泛使用的光觸媒材料。TiO2 有防霧、淨化、除臭、及殺菌等光觸媒功能。本實驗以低溫電漿氧氣前處理高分子或Si-wafer基材，活化基材使表面有－OH、－COOH等自由基，再spin coating 上Sol-gel法製成之含鈦溶液Ti(OR)4，最後用氧氣低溫電漿氧化Ti及分解有機物使成鈦氧化物，期待其具有光觸媒功能。研究發現基材表面經氧氣電漿處理會增加其粗糙度及親水性。有助於有機鈦溶液的塗佈，塗佈後再以電漿氧化可於基材表面得含鈦氧化膜。隨著氧氣電漿處理瓦數及時間增加, 含鈦氧化膜之-CH鍵會減少而Ti-O及C-O鍵等會增加，氧氣電漿處理會去除表面有機物而形成鈦氧化物。表面氧氣處理瓦數及時間增加，使所得含鈦氧化膜由疏水漸變親水。含鈦氧化膜經照UV光，會提升其親水性，約60分鐘後，水接觸角可從60度降為10度。

Titanium dioxide (TiO2) is the well-known photocatalyst material; there is a wide range of potential applications of TiO2 for the purification of environmental air and water, deodorization, and antibacterial and self-cleaning coating. In order to develop a low temperature process; the substrates were pre-treated by oxygen plasma activated procedure, and then spin coating of Ti (OR) 4 precursor solution was carried out to prepare Ti-containing organic films. Finally, O2 plasma was employed to decompose organic compounds and oxidize Ti to form oxides. The effect of power, pressure, and post oxygen plasma treatment on the chemical structure and composition of the film will be investigated.
PET and Si-wafer were used as substrates. O2 plasma pretreatment can improve the wettability. From the observation of AFM and SEM, the substrates treated by O2 plasma develop more roughness and hydrophilic surface. Plasma pretreated substrates improve adhesion of Ti (OR) 4 precursor. Oxygen plasma post treatment can oxidize the organic compounds to form titanium oxide carbon this surface subsequently. From the analysis IR and ESCA, we can observe that O2 plasma treatment decrease –CH bond and increase Ti-O, C-O bonds. Their surface hydrophilic was enhanced by UV-irradiation, the degree of water contact angle decreased from 60 �ato 10�a.

CHINESE ABSTRACT………………………...……………………………………Ⅰ
ABSTRACT……………………………………………………………………….....Ⅱ
ACKNOWLEDGEMENTS……………………………………………….…………ⅢTABLE OF CONTENTS………………………………………………………….....Ⅳ
LIST OF FIGURES…………….……….………………………….………………..Ⅵ
LIST OF TABLES…...................................................................................................Ⅸ
CHAPTER 1 INTRODUCTION 1
CHAPTER 2 LITERATURE REVIEW 4
2-1 Plasma 5
2-1.1 What is plasma 5
2-1.2 Plasma generation 6
2-1.3 Plasma Modifications 7
2-1.4 Plasma Treatment 8
2-2 Sol-gel 10
2-2.1 Sol-gel Method 10
2-2.2 Sol-gel Process 11
2-3 Photocatalysis 13
2-3.1 Titanium dioxide 13
2-3.2 Hydrophilic 15
CHAPTER 3 EXPERIMENTAL 20
3-1 Flow chart 21
3-2 Material 22
3-2.1 Substrates 22
3-2.2 The precursor of TiO2 coating solution 22
3-2.3 Plasma treatment 23
3-3 Process 23
3-3.1 Preparation the precursor of TiO2 coating solution 23
3-3.2 O2 plasma pre-treatment of substrates 23
3-3.3 Spin coating sol-gel solution 24
3-3.4 O2 plasma treatment 24
3-3. 5 Impedance measurements 24
3-3.6 UV-light and photocatalystic effect 25

3-4 Equipments 25
3-4.1 Plasma reactor 25
3-4.2 UV-light systems 27
3-5 Analysis and test 27
3-5.1 Characteristic analyses 27
CHAPTER 4 RESULTS AND DISCUSSION 33
4-1 Weight measurement 34
4-1.1 Effect of O2 plasma pretreated on sol film bond to substrate 34
4-1.2 Effect of different treatment on formed Ti oxide films on PET substrate 34
4-2 Surface Analysis 35
4-2.1 SEM morphology 35
4-2.2 AFM topography 36
4-3 Chemical structures of coating TiOx films 37
4-3.1 By FTIR 37
4-3.2 ESCA composition analyses 38
4-3.3 Crystal properties of coated films 41
4-4 Conductive properties of coated films 42
4-4.1 A.C resistance and response time 42
4-4.2 Humidity measure 42
4-5 Wettability of coated films 43
4-6 Photo catalyst 44
4-6.1 Infrared ray illumination 44
4-6.2 UV light illumination 44
CHAPTER 5 CONCLUSION 86
REFERENCE 89

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