跳到主要內容

臺灣博碩士論文加值系統

(44.210.83.132) 您好!臺灣時間:2024/05/27 01:27
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

: 
twitterline
研究生:王凡
研究生(外文):Fan Wang
論文名稱:以PLS為基礎的dEWMA控制器於多變數半導體製程之研究
論文名稱(外文):PLS Based dEWMA Controller for MIMO Semiconductor Processes
指導教授:陳榮輝陳榮輝引用關係
指導教授(外文):Junghui Chen
學位類別:碩士
校院名稱:中原大學
系所名稱:化學工程研究所
學門:工程學門
學類:化學工程學類
論文種類:學術論文
論文出版年:2005
畢業學年度:93
語文別:中文
論文頁數:122
中文關鍵詞:部分最小平方法化學機械研磨半導體控制策略
外文關鍵詞:chemical-mechanical polishingRun-to-Run controlpartial least squares
相關次數:
  • 被引用被引用:3
  • 點閱點閱:621
  • 評分評分:
  • 下載下載:126
  • 收藏至我的研究室書目清單書目收藏:1
由於在半導體製造產業中,具有品質要求高、產品價格高、批次產量低,與變數複雜性的特性,因此發展一套控制策略改進製程絕對有其必要性。除了上述特性外,由於半導體製造產業產品之多樣性與生命週期短,要於短時間內對其製程推導物理模式以建構控制策略實屬不易,因此利用數據模式發展之控制策略較有可行性。

對於多變數之半導體製程,傳統多變數程序系統控制方法之優點可將變數之間的關聯性影響去除,並拆解配對為多單環路獨立控制;而其缺點為數據模式參數均假設固定不變。因此當製程會隨時間或是批次操作改變時,其控制效能不彰。而過去半導體多變數控制技術之優點為能處理製程隨時間或是批次操作改變之情況,但是受限於其控制方法,其缺點是控制結果可能會引發控制不穩定情況。

基於以上理由,本研究主要為發展一結合傳統程序系統控制方法與過去半導體控制技術之控制策略,並利用其優缺點互補之特性,保留優點剔除缺點使控制效能有所提升。最後,本研究將以一半導體化學機械研磨製程範例,利用傳統多變數程序控制方法及過去半導體多變數控制策略,與本研究所擬的方法進行比較,說明本研究所提方法之優勢性。
The modification of the PLS(partial least squares) modeling procedure is developed. It permits incorporation of a dEWMA(double exponentially weighted moving average) control algorithm into the standard run-to-run controller design. This makes it possible to extract the strongest relationship between the input and the output variables by using the resulting structure PLS model. It is particularly useful for inherent noise suppression. Also, the non-squared MIMO control system can be decomposed into a multiloop control system by employing precompensators and postcompensators of the PLS model constructed from the input and output loading matrices. Then the conventional dEWMA controller can be separately and directly applied to each SISO control loop. The performance of the proposed method is illustrated through a Chemical-Mechanical Polishing(CMP) process which is a critical semiconductor manufacturing processing step.
目錄

摘要 ...........................................................................I
Abstract ......................................................................II
誌謝 .........................................................................III
目錄 ..........................................................................IV
圖目錄 .......................................................................VII
表目錄 .........................................................................X

第一章 前言 ....................................................................1
1-1 簡介 .......................................................................1
1-2 文獻回顧 ...................................................................2
1-3 研究目的與動機 .............................................................5

第二章 多變數程序控制之控制策略回顧 ............................................7
2-1 引言 .......................................................................7
2-2 去偶合配對法(Decoupling) ...................................................7
2-3 奇異值分解法(SVD) .........................................................12
2-4 部分最小平方法(PLS) .......................................................19

第三章 半導體控制策略回顧 .....................................................28
3-1 引言 ......................................................................28
3-2 單變數指數加權移動平均(SISO EWMA)RtR控制策略 ..............................29
3-3 單變數雙指數加權移動平均(SISO dEWMA)RtR控制策略 ...........................33
3-4 多變數雙指數加權移動平均(MIMO dEWMA)RtR控制策略 ...........................37
3-5多變數之數學例子測試 .......................................................41
3-5-1 以Decoupling搭配單變數雙指數加權移動平均之控制測試 ......................43
3-5-2 多變數之指數加權移動平均RtR控制測試 .....................................48

第四章 以PLS為基礎之dEWMA控制策略設計 .........................................55
4-1 引言 ......................................................................55
4-2 以PLS為基礎之dEWMA控制器設計 ..............................................56
4-3 以PLS為基礎之dEWMA內部更新模式的分析與討論 ................................62
4-4 適當主成分數之選取法則 ....................................................65
4-5 PLS based dEWMA控制策略之優勢 .............................................70
4-6 PLS based dEWMA控制策略之PLS模式更新時機 ..................................72
4-7 PLS based dEWMA控制策略執行流程 ...........................................72
4-8多變數之數學例子測試 .......................................................74
4-8-1 SVD based dEWMA控制測試 .................................................74
4-8-2 PLS based dEWMA控制測試 .................................................81
4-8-3 Adaptive PLS based dEWMA控制測試 ........................................90

第五章 模擬測試 ...............................................................93
5-1 CMP製程介紹 ...............................................................93
5-2 線性模式測試 ..............................................................95
5-3 非線性模式測試 ...........................................................105
5-4 Adaptive PLS based dEWMA控制方法之線性與非線性製程行為測試 ...............109

第六章 結論 ..................................................................113

參考文獻 .....................................................................115

符號說明 .....................................................................118

作者自述 .....................................................................122


圖目錄

圖(2-1) SVD控制架構圖 ........................................................16
圖(2-2) PLS數據對應圖 ........................................................21
圖(2-3) PLS主成分配對萃取流程圖 ..............................................24
圖(2-4) PLS運算幾何圖 ........................................................26
圖(3-1) dEWMA控制器之穩定操作區域 ............................................36
圖(3-2) 多變數數學範例之控制變數數據 .........................................42
圖(3-3) 多變數數學範例之操作變數數據 .........................................42
圖(3-4) Multi-SISO dEWMA RtR控制之控制結果 ...................................47
圖(3-5) Multi-SISO dEWMA RtR控制之控制作動 ...................................47
圖(3-6) MIMO dEWMA RtR控制之控制結果(mu=1) ...................................51
圖(3-7) MIMO dEWMA RtR控制之控制作動(mu=1) ...................................51
圖(3-8) MIMO dEWMA RtR控制之控制結果(mu=100) .................................52
圖(3-9) MIMO dEWMA RtR控制之控制作動(mu=100) .................................52
圖(3-10) MIMO EWMA RtR控制之控制結果(mu=1) ....................................53
圖(3-11) MIMO EWMA RtR控制之控制作動(mu=1) ....................................53
圖(3-12) MIMO EWMA RtR控制之控制結果(mu=100) ..................................54
圖(3-13) MIMO EWMA RtR控制之控制作動(mu=100) ..................................54
圖(4-1) PLS based dEWMA控制設計架構圖 ........................................61
圖(4-2) 主成分數與offset之關係 ...............................................68
圖(4-3) PLS based dEWMA控制策略執行流程圖 ....................................74
圖(4-4) SVD based dEWMA控制結果(主成分選1時) .................................77
圖(4-5) SVD based dEWMA控制作動(主成分選1時) .................................78
圖(4-6) SVD based dEWMA控制結果(主成分選2時) .................................78
圖(4-7) SVD based dEWMA控制作動(主成分選2時) .................................79
圖(4-8) SVD based dEWMA控制結果(主成分選3時) .................................79
圖(4-9) SVD based dEWMA控制作動(主成分選3時) .................................80
圖(4-10) PLS based dEWMA控制結果(主成分選1時) .................................84
圖(4-11) PLS based dEWMA控制作動(主成分選1時) .................................84
圖(4-12) PLS子空間下之控制變數(主成分選1時) ...................................85
圖(4-13) PLS based dEWMA控制結果(主成分選2時) .................................85
圖(4-14) PLS based dEWMA控制作動(主成分選2時) .................................86
圖(4-15) PLS子空間下之控制變數(主成分選2時) ...................................86
圖(4-16) PLS based dEWMA控制結果(主成分選3時) .................................87
圖(4-17) PLS based dEWMA控制作動(主成分選3時) .................................87
圖(4-18) PLS based dEWMA控制結果(主成分選4時) .................................88
圖(4-19) PLS based dEWMA控制作動(主成分選4時) .................................88
圖(4-20) Adaptive PLS based dEWMA控制結果 .....................................91
圖(4-21) Adaptive PLS based dEWMA控制作動 .....................................92
圖(5-1) CMP製程設備示意圖 ....................................................94
圖(5-2) CMP控制變數訓練數據 ..................................................96
圖(5-3) CMP操作變數訓練數據 ..................................................96
圖(5-4) 線性測試下MIMO dEWMA控制方法之控制結果 ...............................98
圖(5-5) 線性測試下MIMO dEWMA控制方法之控制作動 ...............................98
圖(5-6) 線性測試下SVD based dEWMA控制方法之控制結果 ..........................99
圖(5-7) 線性測試下SVD based dEWMA控制方法之控制作動 .........................100
圖(5-8) 線性測試下PLS based dEWMA控制方法之控制結果 .........................101
圖(5-9) 線性測試下PLS based dEWMA控制方法之控制作動 .........................102
圖(5-10) 150批訓練數據MIMO建模與PLS建模之模式預測值比較 ......................103
圖(5-11) 非線性測試下MIMO dEWMA控制方法之控制結果 ............................106
圖(5-12) 非線性測試下MIMO dEWMA控制方法之控制作動 ............................107
圖(5-13) 非線性測試下SVD based dEWMA控制方法之控制結果 .......................107
圖(5-14) 非線性測試下SVD based dEWMA控制方法之控制作動 .......................108
圖(5-15) 非線性測試下PLS based dEWMA控制方法之控制結果 .......................108
圖(5-16) 非線性測試下PLS based dEWMA控制方法之控制作動 .......................109
圖(5-17) 線性測試下Adaptive PLS based dEWMA控制方法之控制結果 ................110
圖(5-18) 線性測試下Adaptive PLS based dEWMA控制方法之控制作動 ................111
圖(5-19) 非線性測試下Adaptive PLS based dEWMA控制方法之控制結果 ..............111
圖(5-20) 非線性測試下Adaptive PLS based dEWMA控制方法之控制作動 ..............112


表目錄

表(4-1) MIMO dEWMA與PLS based dEWMA控制模式更新方式之比較 ....................64
表(4-2) SVD各主成分所捕捉之變異程度 ..........................................76
表(4-3) SVD based dEWMA控制下各主成分數之統計數據 ............................80
表(4-4) PLS各主成分所捕捉之變異程度 ..........................................82
表(4-5) 多變數測試範例各方法之統計數據整理 ...................................89
表(5-1) SVD各主成分所捕捉之變異程度 ..........................................99
表(5-2) PLS各主成分所捕捉之變異程度 .........................................100
表(5-3) 線性測試範例各方法之統計數據整理 ....................................102
表(5-4) 非線性測試範例各方法之統計數據整理 ..................................105
1.Boning, D. S.; Moyne, W. P.; Smith, T. H.; Moyne, J.; Telfeyan, R.; Hurwitz, A.; Shellamn, S. and Taylor, J., “Run by Run Control of Chemical-Mechanical Polishing,” IEEE Trans. CPMT(C), 19, 307 (1996)

2.Bristol, E. H., “On a New measure of Interaction for Multivariable Process Control,” IEEE Trans. Automatic Control, 11, 133 (1966)

3.Bruns, D. D. and Smith, C. R., “Singular Value Analysis: a Geometrical Structure for Multivariable Processes,” AIChE Winter Meeting, Orlando, Florida (1982)

4.Butler, S. W. and Stefani, J. A., “Supervisory Run-to-Run Control of a Polysilicon Gate Etch Using in Situ Ellipsometry,” IEEE Trans. Semicond. Manuf., 7, 193 (1994)

5.Chen, J. and Cheng, Y.-C., “Applying PLS-based Decomposition Structure to Multi-loop Adaptive PID Controllers in Nonlinear Processes, Ind. Eng. Chem. Res., 43, 5888 (2004)

6.Del Castillo, E. and Hurwitz, A., “Run to Run Process Control: Literature Review and Extensions,” J. Qual. Technol., 29, 184 (1997)

7.Del Castillo, E. and Rajagopal, R., “A Multivariable Double EWMA Process Adjustment Scheme for Drifting Processes,” IIE Trans., 34, 1055 (2002)

8.Del Castillo, E. and Rajagopal, R., “An Analysis and MIMO Extension of a Double EWMA Run-to-Run Controller for Non-squared Systems,” Int. J. Reliability, Quality Safety Eng., 10, 417 (2003)

9.Del Castillo, E. and Yeh, J. Y., “An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Semiconductor Processes,” IEEE Trans. Semicond. Manuf., 11, 285 (1998)
10.Fuchs, C. and Benjamini, Y., “Multivariate Profile charts for Statistical Process Control,” Technometrics, 36, 182 (1994)

11.Gan, F. F., “Joint Monitoring of Process Mean and Variance,” Nonlinear Analysis, Theory, Methods & Application, 30, 4233 (1997)

12.Höskuldsson, A., “Analysis of latent Structures in Linear Models,” J. Chemom., 2, 211 (1988)

13.Höskuldsson, A., “PLS Regression Methods,” J. Chemom., 2, 211 (1988)

14.Ingolfsson, A. and Sachs, E., “Stability and Sensitivity of an EWMA Controller,” J. Quality Technol., 25, 271 (1993)

15.Kaspar, M. H. and Ray, W. H., “Chemometric Methods for Process Monitoring and High Performance Controller Design,” AIChE J., 38, 1593 (1992)

16.Kaspar, M. H. and Ray, W. H., “Dynamic PLS Modelling for Process Control,” Chem. Eng. Sci., 48, 3447 (1993)

17.Kourti, T. and MacGregor, J. F., “Multivariate SPC Methods for Process and Product Monitoring,” J. Qual. Technol., 28, 409 (1996)

18.Lakshminaraynan, S.; Shan, S. L. and Nandakumar, K., “Modeling and Control of Multivariable Processes: the Dynamic Projection to Latent Structure Approach,” AIChE J., 43, 2307 (1997)

19.Lin, K. and Spanos, C. J., “Statistical Equipment Modeling for Vlsi Manufacturing: an Application for Lpcvd,” IEEE Trans. Semicond. Manuf., 3, 216 (1990)

20.Lowry, C. A. and Montgomery, D. C., “A Review of Multivariate Control Charts,” IIE Trans., 27, 99 (1995)

21.Moyne, J. R.; Chaudry N. and Tefeyan R., “Adaptive Extensions to a Multi-branch Run-to-Run Controller for Plasma Etching,” J. Vac. Sci. Technol. B, 13, 1787 (1995)

22.Mozumder, P. K. and Barna, G. G., “Statistical Feedback Control of a Plasma Etch Process,” IEEE Trans. Semicond. Manuf., 7, 1 (1994)

23.Mozumder, P. K.; Saxena, S. and Collins, D., “A Monitor Wafer based Controller for Semiconductor Processes,” IEEE Trans. Semicond. Manuf., 7, 400 (1994)

24.Ogunnaike, B. A. and Ray W. H., Process Dynamics, Modeling and Control, New York: Oxford University Press (1994)

25.Quirk, M. and Serda, J, Semiconductor Manufacturing Technology, Prentice Hall, New Jersey (2001)

26.Rao, C. R., “Separation theorems for singular values of matrices and their applications in multivariate analysis,” J. Multivariate Anal., 9, 362 (1979)

27.Sachs, E.; Hu, A. and Ingolfsson, A., “Run by Run Process Control: Combing SPC and Feedback Control,” IEEE Trans. Semicond. Manuf., 8, 26 (1995)

28.Sachs, E.; Hu, A.; Ingolfsson, A. and Langer, P. H., “Modeling and Control of an Epitaxial Silicon Deposition Process with Step Disturbances,” In IEEE/SEMI Advanced Semiconductor Manufacturing Conference 73, San Francisco, CA. (1992)

29.Tracy, N. D.; Young, J. C. and Mason, R. L., “Multivariate Control Charts for Individual Observations,” J. Qual. Technol., 24, 88 (1992)

30.Tseng, S. T.; Chou, R. J. and Lee, S. P., “A Study of a Multivariable EWMA Controller,” IIE Trans., 34, 541 (2002)
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top