跳到主要內容

臺灣博碩士論文加值系統

(18.97.14.82) 您好!臺灣時間:2025/02/19 11:01
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

我願授權國圖
: 
twitterline
研究生:林嶸銓
研究生(外文):Rung-Chuan Lin
論文名稱:通用型虛擬量測機制與系統
論文名稱(外文):Generic Virtual Metrology Scheme and System
指導教授:鄭芳田鄭芳田引用關係
指導教授(外文):Fan-Tien Cheng
學位類別:碩士
校院名稱:國立成功大學
系所名稱:製造工程研究所碩博士班
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2005
畢業學年度:93
語文別:中文
論文頁數:95
中文關鍵詞:化學氣相沉積徑向基底函數類神經網路虛擬量測
外文關鍵詞:Chemical Vapor DepositionVirtual Metrology (VM)Radial Basis Function Neural Network
相關次數:
  • 被引用被引用:6
  • 點閱點閱:201
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:0
  在半導體廠與TFT-LCD廠,生產製程上之機台皆需進行週期性監控,以確保所有機台在製程上均有穩定且合乎品質規格的產出。以半導體廠為例,為達到監控機台效能,且亦偵測出所生產之晶圓品質,則需線上監控晶圓。目前一般的做法為每間隔一段時間,插入乙片以監控為目的之測試晶圓,進行週期性品質量測。因週期性之監控仍無法達到即時性偵測每片晶圓之品質,致無法即時發現機台效能漂移,因此仍可能導致產出之產品被作廢,造成極高的成本損失。基於此,本研究提出一套虛擬量測系統,其不僅可達到即時量測每片晶圓之品質,亦可減少測試晶圓之使用率,並即時監控生產機台效能將其回報予機台工程師。虛擬量測系統是在產品尚未進行實際量測之情況下,利用生產機台之參數,推估其所生產之產品品質,以進行晶圓品質預測及機台效能監控。此系統內部之核心機制為虛擬量測模組,其使用徑向基底函數類神經網路來建構。並設計參數調整器,用以設定及調整徑向基底函數類神經網路之參數。本研究並以半導體廠之化學氣相沉積製程為例,以驗證本架構之效能。
 In a semiconductor or TFT-LCD fab, the production equipment is periodically monitored to assure the stability of production processes and the quality of products. Taking the semiconductor fab for example, on-line monitoring on the wafer is required for equipment performance monitoring to assess wafer quality. At present, the semiconductor fab adopts the method of periodical monitoring by processing the test wafers through the main production equipment. However, periodical monitoring cannot provide real-time and overall monitoring data and quality assurance to each wafer, because the equipment performance drift may happen in the intervals of scheduled monitoring, scrap the wafers and greatly increase the production cost.
 Aiming at the difficulties mentioned above, this work proposes a virtual metrology (VM) system. The VM not only greatly decreases the demand of test wafers, but also realizes the real-time online monitoring of wafer quality to every production wafer and immediately reports the information about equipment performance to maintenance engineers. With the parameters collected from production equipment, VM can effectively prognoses the production quality both on wafer quality and equipment performance before the physical metrology operation is performed. The core mechanism of the proposed system is virtual metrology module developed with radial basis function neural network; besides the model parameter coordinator is also developed to VM to define and adjust the parameters of the radial basis function neural network. Further, in order to verify the performance of the scheme proposed, in this work, we implement VM to the practical production process of chemical vapor deposition in a semiconductor fab.
目錄
中文摘要
英文摘要
致謝

目錄 i
圖目錄 iii
表目錄 v
第一章 緒論 1
1.1 研究背景 1
1.2 研究動機與目的 3
1.3 研究流程 4
1.4 論文架構 5
第二章 文獻探討與理論基礎 6
2.1 相關文獻探討 6
2.1.1 預測系統之相關架構 6
2.1.2 品質預測之相關技術 10
2.2 相關理論基礎 12
2.2.1 常態分配之特性 12
2.2.2 主成份分析 16
2.2.3 類神經網路 19
2.2.3.1 類神經網路原理 19
2.2.3.2 徑向基底函數類神經網路 22
2.2.4 統一塑模語言 26
第三章 通用型虛擬量測機制與系統 30
3.1 通用型虛擬量測機制 30
3.2 通用型虛擬量測系統架構設計 34
3.2.1 需求分析 34
3.2.2 物件導向分析 34
3.2.2.1 使用者案例圖 35
3.2.2.2 循序圖 36
3.2.2.3 類別圖(OOA) 44
3.2.3 物件導向設計 45
3.2.3.1 類別圖(OOD) 45
3.2.3.2 活動圖 47
3.3 系統執行環境 52
第四章 案例分析 54
4.1 半導體製程簡介 54
4.2化學氣相沉積製程參數簡介 57
4.2.1 失效偵測分類資料格式 59
4.2.2 統計製程管制資料格式 62
第五章 系統實作 64
5.1 開發環境 65
5.2 資料前處理技術之建構 65
5.3 虛擬量測模組之建構 67
5.4 信心指標之建構 71
5.5 準確度評估之建構 75
5.6 模組參數調整之建構 76
第六章 實作結果與比較 81
6.1 RBFNN參數調整之比較 81
6.2 VMS與QPS之比較 83
第七章 結論 90
7.1 論文總結 90
7.2 未來研究方向 91
參考文獻 92
[1]Diebold, A.C. “Overview of metrology requirements based on the 1994National Technology Roadmap for semiconductor,” Advanced Semiconductor Manufacturing Conference and Workshop, 1995.ASMC 95 Proceedings. IEEE/SEMI 1995. 13-15 Nov. 1995 Page(s):50-60.
[2]Stanley, K.J.; Stanley, T.D.; Maia, J. “Realizing 300 mm fab productivity improvements through integrated metrology,” Simulation Conference, 2002. Proceedings of the Winter, Volume 2, 8-11 Dec. 2002 Page(s): 1369 -1376 vol.2.
[3]TSMC, “AEC/APC Challenges-Today and in the Future,” 2004.
[4]Y.-C. Su, F.-T. Cheng, Y.-C. Lin, M.-H. Hung, R.-C. Lin, and H.C. Huang “Intelligent Prognostics System Design and Implementation1,” 2004.
[5]林彥璋 「一個適用於半導體業網路式診斷應用之介面的通用型嵌入式裝置」,國立成功大學製造工程研究所碩士論文,2004.
[6]Y.-C. Su, F.-T. Cheng, G.-W. Huang, M.-H. Hung, and T. Yang, "A Quality Prognostics Scheme for Semiconductor and TFT-LCD Manufacturing Processes," in Proc. of The 30th Annual Conference of the IEEE Industrial Electronics Society (IECON 2004), Busan, Korea, November 2004.
[7]P.-F. Tsai, J.-Z. Chu, S.-S. Jang, S.-S. Shieh. “Developing a robust model predictive control architecture through regional knowledge analysis of artificial neural networks,” Journal of Process Control, Vol.13 no.5, 2003.
[8]Zurada J.M. “Introduction to Artificial Neural Systems,” St. Paul, MN: West Publishing, 1992.
[9]Web site of the Center for Intelligent Maintenance Systems (IMS). http://www.imscenter.net
[10]J. Lee, “E-Manufacturing/E-Business: Transformation, Needs, Issues, and Collaborative Research Opportunities,” 2001. http://www.uwm.edu/CEAS/ims
[11]M. Koc and J. Lee, “A System Framework for Next-Generation E-Maintenance System,” 2001.
[12]NSF Workshop, NSF I/UCR Center, Oct. 1-2,2001.
[13]黃國偉 「半導體機台網路式預防保養功能架構之設計與實作」,國立成功大學製造工程研究所碩士論文,2003.
[14]李柏甫 「TFT-LCD濺鍍製程之智慧型診斷系統發展」,國立成功大學製造工程研究所碩士論文,2004.
[15]S.-F. Lee, and C.-J. Spanos, “Prediction of wafer state after plasma processing using real-time tool data,” IEEE Trans. Semiconductor Manufacturing, Vol. 8, pp. 252-261, Aug 1995.
[16]B. Kim and K. Kim, “Prediction of profile surface roughness in CHF3 /CF4 plasma using neural network,” Appl. Surf. Sci. 222(2004)17-22.
[17]B. Kim, D.-W. Lee, K.-Y. Park, S.-R. Choi and S. Choi, “Prediction of plasma etching using a randomized generalized regression neural network,” Vacuum 76(2004)37-43.
[18]顧尚芳 「生產系統中利用製程不良率評估設備預防維護之研究」,中原大學工業工程學系碩士論文,2003.
[19]Benyong Zhang and Gary S. May “Towards Real-Time Fault Identification in Plasma Etching Using Neural Network,” IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 1998.
[20]Tsung-Nan Tsai, Shih-Yaug Liu, and Taho Yang, “A SMT Reflow Soldering Process Diagnosis System Using Neurofuzzy Approach,” International Journal of Fuzzy Systems, Vol.3, No.4, Dec. 2001.
[21]Huang S, and Zhang H., “Neural Network in Manufacturing: A Survey,” IEEE/CPMT International Electronics Manufacturing Technology Symposium, pp.177-190, 1993.
[22]楊博文 「鉻鉬鋼鑽孔擴孔量預測模式之探討」,國立屏東科技大學機械工程學碩士論文,2002.
[23]Byungwhan Kim, and Gary S. May, “An Optimal Neural Network Process Model for Plasma Etching,” IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 7, NO. 1, FEBRUARY 1994.
[24]Hogg and Tanis, “Probability and Statistical Inference,” Prentice Hall, NJ:07458, 1997.
[25]W.-J. Conover, “Practical Nonparametric Statistics,” New York, Wiley, 1980.
[26]Anderson, T.W, “An Introduction to Multivariate Statistical Methods,” 1984.
[27]陳業統 「多變量製程能力指標在評估環境風險上之研究」,國立成功大學統計學系碩士論文,2003.
[28]Y. L. Huang, T. F. Edgar, D. M. Himmmelblau, and I. Trachtenberg, “Constructing a reliable neural network model for a plasma etching process using limited experimental data,” IEEE Trans. Semicond. Manuf., Vol. 3, pp. 333-344, Aug 1994.
[29]F. Nadi, A. M. Agogino, and D. A. Hodges, “Use of influence diagram and neural networks in modeling semiconductor manufacturing processes,” IEEE Trans. Semicond. Manuf., Vol. 4, no. 1, Feb 1991.
[30]M. T. Mocella, J. A. Bondur, and T. R. Turner, “Etch process characterization using neural network methodology: A case study,” in SPIE proc. Process Module Metrology, Control, and Clustering, Vol. 1594, 1992, pp. 232-242.
[31]C. D. Himmel, and G. S. May, “Advantages of plasma etch modeling using neural networks over statistical techniques,” IEEE Trans. Semicond. Manuf., Vol. 6, pp. 103-111, May 1993.
[32]葉怡成 「應用類神經網路」,儒林圖書公司,1997.
[33]葉怡成 「類神經網路模式應用與實作」,儒林圖書公司,2003.
[34]張斐章,張麗秋,黃浩倫 「類神經網路理論與實務」,東華書局,2003.
[35]Simon Haykin, “Neural Networks, A Comprehensive Foundation,” Prentice Hall, NJ:07458, 1999.
[36]Grady Booch, James Rumbaugh, Ivar Jacobson, “The Unified Modeling Language User Guide,” ADDISON-WESLEY, April 2000.
[37]Gary B. Shelly, Thomas J. Cashman, Harry J. Rosenblatt, “Systems Analysis and Design,” Thomson Learning, 2001
[38]ISMI, “Data Quality Proof of Concept Test Method,” 2005.
[39]Ming Lu, S. M. AbouRizk and U. H. Hermann, “Sensitivity Analysis Of Neural Networks In Spool Fabrication Productivity Studies,” 2002.
[40]Honh Xiao, “Introduction to Semiconductor Manufacturing Technilogy,” PRENTICE HALL, 2001
[41]Borland C++ Bulider 6.0, Borland Corporation. http://www.borland.com/cbuilderx
[42]Matlab 7.0, The MathWork Corporation. http://www.mathworks.com/
[43]陳順宇 「多變量分析」,二版,華泰書局,2000.
[44]陳順宇 「迴歸分析」,三版,華泰書局,2000.
[45]羅華強 「類神經網路,MATLAB的應用」,清蔚科技,2001.
[46]張智星 「MATLAB程式設計與應用」,清蔚科技,2000.
連結至畢業學校之論文網頁點我開啟連結
註: 此連結為研究生畢業學校所提供,不一定有電子全文可供下載,若連結有誤,請點選上方之〝勘誤回報〞功能,我們會盡快修正,謝謝!
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top
1. 135.魏偉森,〈一個被忽略學者所留下之不可磨滅印記:漢學詮釋學之重構〉,《臺灣社會研究》,29(臺北,1998.03),頁131-152。
2. 129.謝政諭,〈中國正統思想的本義、爭論與轉型:以儒家思想為核心的論述〉,《東吳政治學報》,4(臺北,1995.01),頁241-266。
3. 116.雷聞,〈論隋唐國家祭祀的神祠色彩〉,《漢學研究》,21:2(臺北,1993.12),頁111-138。
4. 109.黃進興,〈權力與信仰--孔廟祭祀制度的形成〉,《大陸雜誌》,86:5(臺北,1993.05),頁8-34。
5. 108.黃進興,〈學術與信仰:論孔廟從祀制與儒家道統意識〉,《新史學》,5:2(臺北,1994.06),頁1-82。
6. 106.黃進興,〈毀像與聖師祭〉,《大陸雜誌》,99:5(臺北:1999.11),頁1-8。
7. 105.黃俊傑、蔡明田,〈中國政治思想史研究方法試論〉,《國立中央大學人文學報》,16(中壢市,1998.06),頁1-43。
8. 81.張維屏,〈從「四庫全書總目」「史部.史評類」對於所錄明代著作的評述分析明人的史評論著〉,《政大史粹》,4(臺北,2002.07),頁89-107。
9. 79.張哲郎,〈從明代皇帝之即位詔及遺詔論明代政權之轉移(下)〉,《國立政治大學歷史學報》,15(臺北,1998.05),頁1-27。
10. 64.邱炫煜,〈谷應泰「明史紀事本末」的史源新詮〉,《簡牘學報》,15(臺北,1994.12),頁235-257。
11. 62.林麗月,〈閣部衝突與明萬曆朝的黨爭〉,《師大歷史學報》,10(臺北,1982.06),頁1-19。
12. 61.林麗月,〈閩南士紳與嘉靖年間的海上走私貿易〉,《師大歷史學報》,8(臺北,1970.05),頁91-111。
13. 45.李晉華,〈關於明實錄問題材料彙輯〉,《大陸雜誌》,43:3(臺北,1971.09),頁41-57。
14. 40.吳振漢,〈王世貞「史乘考誤」所論嘉、隆之際史事〉,《國立中央大學人文學報》,17(中壢市,1998.06),頁65-92。
15. 39.吳大昕,〈明嘉靖倭寇研究的回顧〉,《明代研究通訊》,2(臺北,1999.07),頁91-106。