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研究生:張昌霖
研究生(外文):Chang-Lin Chang
論文名稱:磁流體旋塗不穩定之研究
指導教授:周復初周復初引用關係
學位類別:碩士
校院名稱:國立中央大學
系所名稱:機械工程研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2005
畢業學年度:93
語文別:中文
論文頁數:70
中文關鍵詞:旋轉塗佈不穩定
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摘 要
半導體製程中,對於矽晶圓表層覆膜大多採用旋轉塗佈的方式進行,液體在旋轉塗佈的過程,因為離心力的作用,使得不穩定手指狀流會在連續薄膜波前處產生,如何針對不穩定手指狀流的產生機制加以控制更是目前的重點。
本實驗採用磁性流體作為實驗流體,觀察磁性流體與矽油兩者在旋轉塗佈製程上的差異性,實驗結果發現磁性流體如矽油一般,臨界半徑會隨 Boω 增加而呈現先遞減後增加的趨勢。但是,針對磁性流體而言,這種開口向上拋的曲線之反曲點卻有提前發生的現象;而兩實驗流體隨著Boω > 50 之後逐漸地有匯集的現象。此外,針對磁性流體外加磁場的實驗中發現,磁性流體液膜之臨界半徑特徵長度隨磁場增加而有減少的趨勢。而不穩定手指狀流的數目則隨磁場增加而有增加的現象。
目錄
摘要……………………………………………………………………Ⅰ
致謝……………………………………………………………………Ⅱ
目錄……………………………………………………………………Ⅲ
表目錄…………………………………………………………………Ⅴ
圖目錄…………………………………………………………………Ⅵ
符號說明表……………………………………………………………XI
第一章 緒論 ………………………………………………………1
1-1 前言 …………………………………………………………1
1-2 文獻回顧 ……………………………………………………2
1-2.1 旋轉塗佈相關文獻回顧 ………………………………2
1-2.2 風剪效應相關文獻回顧 ………………………………5
1-2.3 不穩定手指狀流相關文獻回顧 ………………………6
1-2.4 磁性流體相關文獻回顧 ………………………………10
第二章 實驗設備與方法 ……………………………………………13
2-1 旋塗轉速控制系統 …………………………………………13
2-2 影像擷取系統 ………………………………………………15
2-3 垂直磁場產生系統 …………………………………………16
2-4 實驗方法 ……………………………………………………17
第三章 結果與討論 …………………………………………………21
3-1 磁性流體與矽油之旋轉塗佈比較……………………………21
3-2 不同轉速對磁場作用下的磁流體旋塗之影響………………25
3-2.1 磁場的測定 ……………………………………………25
3-2.2 靜止狀態下磁場對磁流體液膜表面的影響 …………26
3-2.3 改變轉速對垂直磁場旋轉塗佈的影響 ………………27
3-3 固定轉速下垂直磁場大小對旋塗臨界半徑的影響…………29
第四章 結論 …………………………………………………………32
參考文獻………………………………………………………………34
附表……………………………………………………………………39
附圖……………………………………………………………………41
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