本論文提出平面式矽基折射率漸變透鏡之概念，在矽基板上沉積不同折射率的氮氧化矽膜層，再以蝕刻方式定義透鏡的輪廓、大小與位置。運用梯度折射率材質與透鏡曲面之特性，使透鏡分別在水平及垂直基板方向皆有聚焦、準直之能力。此透鏡具定位精準、易與其它半導體元件結合、系統積體化與微型化等優點。
論文中針對不同的系統需求，提出符合規格之透鏡設計。另外將此透鏡應用於光耦合系統與光學讀取頭系統，並討論此透鏡之優缺點與適用性。

摘要 Ⅰ
誌謝 Ⅱ
目錄 Ⅲ
圖索引 Ⅴ
表索引 Ⅷ
第一章 緒論 1
1.0 前言 1
1.1 微光學系統 2
1.2 本論文之內容與架構 5
第二章 相關理論介紹 6
2.1 折射率漸變透鏡相關理論 6
2.2 光束傳播法 9
2.3 光纖的耦合 14
第三章 折射率漸變透鏡設計 19
3.1 設計概念 19
3.2 設計流程與初階設計 21
3.3 模擬結果 29
3.4 步階式與連續式折射率漸變透鏡之比較 32
第四章 折射率漸變透鏡之應用 36
4.1 光學耦合器 36
4.2 光學讀取頭 47
第五章 結論與展望 56
參考文獻 58

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