參考文獻
[1] Box, G. E. P., Jenkins, G. M. and Reinsel, G. C. (1994). Time Series Analysis, Forcasting, and Control, 3rd ed., Prentice Hall, Englewood Cliffs, NJ.
[2] Bulter, S.W. and Stefani, J. A. (1994). “Supervisory Run-to-Run Control of a Polysilicon Gate Etch using in Situ Ellipsometry.” IEEE Transactions on Semiconductor Manufacturing, 7, pp. 193-201.
[3] Del Castillo, E., and Hurwitz, A. (1997). “Run-to-Run Process Control: Literature Review and Extensions.” Journal of Quality Technology, 29, pp. 184-196.
[4] Del Castillo, E., (1999). “Long Run and Transient Analysis of a Double EWMA Feedback Controller.” IIE Transactions, 31, pp. 1157-1169.
[5] Del Castillo, E. (2002). Statistical Process Adjustment for Quality Control, John Wiley & Sons Inc., New York.
[6] Ingolfsson, A. and Sachs, E. (1993). “Stability and Sensitivity of an EWMA Controller.” Journal of Quality Technology, 25, pp. 271-287.
[7] Tseng, S. T., Chou, R.J. and Lee, S. P. (2002). “Statistical Design of Double EWMA controller.” Applied Stochastic Models in Business and Industry, 18, pp. 313-322.
[8] Tseng, S. T. and Hsu, N. J. (2005). “Sample-Size Determination for Achieving Asymptotic Stability of a Double EWMA Control Scheme.” IEEE Transactions on Semiconductor Manufacturing, 18, pp. 104-111.
[9] 林資程 (2004) “Single EWMA控制器在動態模型下之績效分析”。國立清華大學統計學研究所碩士論文。[10] 莊達人 (1996), VLSI製造技術,第三版,高立圖書有限公司。