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研究生:黃建富
研究生(外文):Jan-Fu Huang
論文名稱:磷化鋁鎵銦高亮度發光二極體表面週期性結構對於外部量子效率提昇之設計、模擬、製作與量測
指導教授:吳恩柏
學位類別:碩士
校院名稱:國立臺灣大學
系所名稱:應用力學研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2005
畢業學年度:93
語文別:中文
論文頁數:96
中文關鍵詞:磷化鋁鎵銦外部量子效率表面週期性結構
外文關鍵詞:AlGaInPExternal Quantum EfficiencySurface Periodic structure
相關次數:
  • 被引用被引用:1
  • 點閱點閱:225
  • 評分評分:
  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:1
近年來,高亮度發光二極體(High-Brightness Light Emitting Diodes)發展速度一日千里,已廣泛運用在通訊、交通、汽車、戶外看板以及顯示器背光源等,更由於其有體積小、耗電量低、使用壽命長、反應速度快、環保無污染等優點,期望未來能運用在照明上面,取代日光燈源與白織燈源。然而儘管磷化鋁鎵銦(AlGaInP)材料的磊晶技術可將內部量子效率(Internal Quantum Efficiency)幾乎達到100%,但是外部量子效率(External Quantum Efficiency)仍有許多改進的空間。原因在於光的取出受限於史涅耳定律(Snell’s Law),以及光被基板材料所致。本論文的主要研究目的在於改變發光二極體晶片上的外型,藉由製作表面週期性結構,以提供光子不同的出光角度以及增加出光面積,藉以提昇發光效率。
我們首先針對二維表面週期性結構於磷化鎵窗口層(GaP Window layer)上的光取出行為作一模擬的預測,得知表面弧狀結構可以改善出光效率,接著運用半導體製程中,黃光顯影以及電感式耦合型電漿蝕刻(Inductive Coupling Plasma Etching)技術,成功製造不同圓形結構尺寸、間距與深度的表面週期性結構於發光二極體的窗口層上,並針對未封裝的軸上光與封裝後的光通量作量測,發現隨著週期性結構愈密,其表面散射出光機會增加,因此發光效率愈高,模擬預測與實驗結果相符;此外,由於窗口層上的週期性結構凹槽,讓其原本電流分佈均勻的功用受影響,當加工深度愈深,發光效率反而降低。最佳的發光效率發生在圓形結構尺寸為8μm,間距為4μm,深度為2μm的弧狀結構,其平均外部量子效率為4.79%,相較於未加工表面週期性結構的3.62%,平均提昇34.55%,在此取樣點中其最佳提昇47.23%,此時之外部量子效率為5.33%,發光效率為9.74lm/W(If=20mA)。
最後我們針對表面週期性結構設計一套結合晶片接合(Wafer-bonding)的製程,期望達到磷化鋁鎵銦高亮度發光二極體之發光極致。
摘要 I
目錄 II
圖目錄 IV
表目錄 XII

第一章 緒論 1
1-1 研究背景與動機 1
1-2 研究目的與論文架構 4

第二章 發光二極體工作原理、發光效率暨高亮度發光二極體之文獻回顧
與討論 5
2-1 引言 5
2-2 發光二極體之工作原理 6
2-3 發光二極體之發光效率 11
2-4 高亮度發光二極體之文獻回顧與討論 18
2-4-1 透明基板型LEDs 18
2-4-2 表面織狀型LEDs 21
2-4-3 光子晶體型LEDs 24
2-4-4 薄膜型LEDs 26

第三章 高亮度發光二極體之設計、模擬與製作 30
3-1 引言 30
3-2 高亮度發光二極體之設計 31
3-3 高亮度發光二極體之光取出效率模擬分析 34
3-4高亮度發光二極體之製程 43
3-4-1 試片準備 44
3-4-2 光罩設計 45
3-4-3 光阻塗佈 46
3-4-4 曝光顯影 47
3-4-5 電感式耦合型電漿蝕刻 48
3-4-6 歐姆接觸 55
3-4-7 元件切割與封裝 56

第四章 實驗結果與分析 57

第五章 結論與未來展望 87
5-1 結論 87
5-2 未來展望 89

參考文獻 91
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