跳到主要內容

臺灣博碩士論文加值系統

(44.200.82.149) 您好!臺灣時間:2023/06/10 00:03
字體大小: 字級放大   字級縮小   預設字形  
回查詢結果 :::

詳目顯示

: 
twitterline
研究生:蕭旭助
研究生(外文):xu-zhu xiao
論文名稱:奈米級氧化鈰粉體的製備與研磨性質
論文名稱(外文):Preparation of nano-grade cerium oxide powder and it's polishing perpormance
指導教授:蔡明雄蔡明雄引用關係
指導教授(外文):Ming-Shyong Tsai
學位類別:碩士
校院名稱:南台科技大學
系所名稱:化學工程系
學門:工程學門
學類:化學工程學類
論文種類:學術論文
論文出版年:2005
畢業學年度:93
語文別:中文
論文頁數:74
中文關鍵詞:奈米級氧化鈰陳化立方晶螢石結構八面體CMP拋光實驗磨除率
外文關鍵詞:Nano-grade cerium oxide、aging、fluorite structure、octahedron、polishing test、removal rate
相關次數:
  • 被引用被引用:6
  • 點閱點閱:847
  • 評分評分:
  • 下載下載:424
  • 收藏至我的研究室書目清單書目收藏:0
奈米級氧化鈰粉體的製備是由硫酸鈰溶液添加尿素並進一步陳化,在本研究中,硫酸鈰經由添加尿素會產生大量的沉澱物,由XRD 圖譜判別此沉澱物為非結晶鈰的前驅物,如果以傳統製程此前驅物必須在400oC 的煅燒下,才顯現出氧化鈰立方晶螢石結構的特性峰,而本研究發現在低溫下添加尿素溶液並進一步陳化,此常壓水熱陳化製程有助於氧化鈰粉體的形成,且為晶形傾向八面體的成長。由TEM的觀察得知經陳化 5 小時後, 所得沉澱物為奈米級氧化鈰,本研究進一步發現在較高尿素濃度下,能產生結晶性較佳的氧化鈰粉體。
本實驗亦比較添加不同沉澱劑及使用不同價數鈰鹽,探討其陳化製程對晶形及晶粒的影響,由實驗結果得知,尿素-硫酸鈰陳化系統及氨水-硝酸鈰陳化系統有較佳的八面體晶形及窄的粒徑分佈,並且能由小型CMP 拋光實驗求證。
由研磨實驗的結果,以尿素-硫酸鈰及氨水-硝酸鈰所合成的漿料有較佳的磨除率,其磨除率分別為116Å/min 和 93 Å/min,此結果符合八面體晶形及較大粒徑的氧化鈰能有較佳的磨除率。
In this article, cerium oxide powder with fluorite structure is formed by the traditional process of precipitation and calcinations at the temperature above 400oC. Nano-grade cerium oxide powder is prepared by the method of precipitation cerium sulfate with urea and aging. According to the experimental results, the precipitate of urea and cerium sulfate is amorphous. The precipitate is transferred to the nano grade cerium oxide with fluorite structure after aging at 100 oC for 5 hours. Adding urea to cerium sulfate and adding ammonia to cerium nitrate, respectively can obtain the well crystalline octahedron and narrow distribution particle size. Two
kinds of ceria slurries one is formed by cerium sulfate and urea, another is formed by cerium nitrate and ammonia hydroxide are examined by polishing test. The removal rate of the product of cerium sulfate and urea is about 116 Å/min and the removal rate of product of cerium nitrate and ammonia hydroxide is about 93 Å/min.
目錄
中文摘要…………………………………………………………………………………Ⅰ
英文摘要…………………………………………………………………………………Ⅱ
致謝………………………………………………………………………………………Ⅲ
目錄………………………………………………………………………………………Ⅳ
表目錄……………………………………………………………………………………Ⅵ
圖目錄……………………………………………………………………………………Ⅶ
符號說明…………………………………………………………………………………Ⅹ
第一章 緒論………………………………………………………………………………1
1-1 氧化鈰粉體之介紹…………………………………………………………………1
1-2 氧化鈰粉體的應用…………………………………………………………………2
1-3 前人之氧化鈰合成文獻回顧………………………………………………………4
1-4 研究動機……………………………………………………………………………7
第二章 原理部分…………………………………………………………………………8
2-1 粉體合成製程簡介…………………………………………………………………8
2-2 顆粒的陳化步驟……………………………………………………………………9
2-3 化學機械研磨原理介紹……………………………………………………………10
2-4 化學機械研磨中研磨液之種類及簡介……………………………………………12
2-5 氧化鈰粉體與晶圓表面鍵結………………………………………………………16
2-6淺溝絕緣層(STI)平坦化……………………………………………………………18
2-7化學機械研磨之Preston方程式……………………………………………………20
第三章 實驗部分…………………………………………………………………………21
3-1 藥品…………………………………………………………………………………21
3-2 實驗分析儀器………………………………………………………………………22
3-3 實驗方法與實驗步驟………………………………………………………………23
V
3-3-1 以傳統煅燒方式…………………………………………………………………23
3-3-2 以常壓水熱陳化方式……………………………………………………………23
3-3-3 改變不同沉澱劑下陳化…………………………………………………………23
3-3-4 改變不同價數的鈰鹽的熟成……………………………………………………23
3-4 研磨實驗部分………………………………………………………………………27
3-5 分析方法……………………………………………………………………………29
3-5-1 粉體型態及粒徑大小與其分佈…………………………………………………29
3-5-2 由XRD 分析粉體之組成…………………………………………………………29
3-5-3 由XRD 之檢測推算粉體粒徑……………………………………………………29
3-5-4 由XRD 檢測粉體晶形之分析……………………………………………………30
3-5-5 陳化過程中之pH值之量測………………………………………………………30
第四章 結果與討論………………………………………………………………………32
4-1 沉澱前趨物之形態…………………………………………………………………32
4-2 煅燒方式下合成……………………………………………………………………34
4-3 常壓水熱陳化方式下合成…………………………………………………………40
4-4 比較不同沉澱劑下的陳化…………………………………………………………51
4-5 不同價數鈰鹽的所得氧化鈰之比較………………………………………………57
4-6 不同條件下合成的氧化鈰漿料對研磨結果的影響………………………………64
第五章 結論………………………………………………………………………………68
參考文獻…………………………………………………………………………………70
1.Herman F. Mary, Donald F. Othmer, Charles G. Overberger, and Glenn T. Seaborg, Encyclopedia of Chemical Teghnology, Vol 5, John Wiley & Sons, New York.
2.L. A. D. Faria and S. Trasatti, “The Point of Zero Charge of CeO2”, J. Colloid Interfact Sci., 167, 352-357, 1994.
3.L. A. Gschneidner, Jr. and L. R. Eyring, Handbook on the Physics and Chemistry of Rare Earths, vol. 3, p84-85, p370-373, p.383-385, North-Holland, 1984, New York.
4.N. B Kirk and J. V. Wood,“The Effect of the Calcinations Process on the Crystallite Shape of Sol-Gel Cerium Oxide Used for Glass Polishing”, J. Mater.Sci. 30, 2171-2175, 1995.
5.T. J. Hardwick and E. Robertson, “Association of Ceric Ions with Sulphate(A Special Study)” , Canadian J. Chem. , 29, 830, 1951.
6.H. K. Varma, P. Mukundan, K. G. K. Warrier, and A. D. Damodaran,“Flash Combustion Synthesis of Cerium Oxide”, J. Mater. Sci. Lett. , 9, 377-379, 1990.
7.T. V. Mani, H. K. Varma, A. D. Damodaran, and K. G. K. Warrier,“Sol-spray Technique for Fine-grained Ceria Particles”, Ceram. Int. , 19, 2, 125-128, 1993.
8.Y. C. Zhou and M. N. Rahaman,“Effect of Redox Reaction on the Sintering Behavior of Cerium Oxide ”,Acta Mater. , 45, 9 , 3635-3639, 1997.
9.E. Matijevic and W. P. Hsu,“Preparation and Properties of Monodispersed Colloidal Particles of Lanthanide Compounds”, J. Colloid Interfact Sci., 118, 2, 506-523, 1987.
10.B. Ailen, W. P. Hsu, and E. Matijevic, “ Preparation and Properties of Monodispersed Colloidal Particles of Lanthanide Compounds: Ⅲ, Yttrium(Ⅲ)
and Mixed Yttrium(Ⅲ)/Cerium(Ⅲ) Systems”, J. Am. Ceram. Soc. 71, 10,
845-853, 1988.
11.T. Yamaguchi, N. Ikeda, H. Hattori, and K. Tanabe, “Surface and Catalytic Properties of Cerium Oxide”, J. Catal., 67, 324-330 , 1981.
12.陳麗梅,陳俊雄,CMP 氧化研磨研磨液,化工技術,第五卷第十期,160-164,1997 年6 月。
13.W. P. Hsu, L. Ronnquist and E. Matijevic “Preparation and Properties of Monodispesed Colloidal Particles of Lanthanide Compounds.2.Cerium (Ⅳ) ”, Langmuir, 4, 31, 1988.
14.P. L. Chen and I. W. Chen,“Reactive Cerium (Ⅳ) Oxide Powders by the Homogeneous Precipitation Method”, J. Am. Ceram. Soc. 76, 6, 1577-1583, 1993.
15.塙健三,望月直義,直田成生,“氧化鈰超微粒及其製法” 中華民國專利公告
第328068 號, 1996。
16.J. L. G. Fierro, S. Mendioroz, and A. M. Olivan, “Surface Chemistry of Cerium Oxide Prepared by an Isobaric Thermal Procedure”, J. Colloid Interface Sci., 107, 1, 60-69,1995.
17.Y. C. Zhou, R. J. Phillip, and J. A. Switzer, “Electrochemical Synthesis and Sintering of Nano Crystalline Cerium (Ⅳ) Oxide Powder”, J. Am. Ceram. Soc.78, 4, 981-985, 1995.
18.M. Hirano, E. Kato, “Hydrothermal Synthesis of Cerium (Ⅳ)Oxide”, J. Am. Ceram. Soc. 79, 3, 778-780, 1996.
19.Y. Hakuta, S. Onal, H. Terayama, T. Adschiri, and K.Arai, “Production of Ultra-Fine Ceria Particles by Hydrothermal Synthesis under Supercritical Condition”, J. Mater. Sci. Lett., 17, 14, 1211-1213, 1998.
20.L. Yin, Y. Wang, G. Pang, Y. Koltypin and A. Gedanken,” Sonochemical Synthesis of Cerium Oxide Nanoparticles-Effect of Additives and Quantum Size Effect” , J. Colloid Interface Sci. 246, 78-84, 2002.
21.R. D. Purohit, B. P. Sharma, K. T. Pillai, A. K. Tyagi, “Ultra ceria powders via glycine-nitrate combustion” , Mater. Res. Bull. , 36, 2711-2721, 2001.
22.F. Zhang, S. P. Yang, H. M. Chen, X. B. Yu, “Preparation of discrete nanosize ceria powder” , Ceramics International, 30, 997-1002, 2004.
23.高至鈞,“溶液法製備精密陶瓷粉末的原理與製程”,445-456,精密陶瓷科技。
24.施文塵,劉如憙,蔡明蒔,“一種可實際應用於半導體化學機械研磨之奈米級二氧化鈰粉末新製程技術”中華民國陶業研究學會會刊,22-27 第19 卷第1 期。
25.O. Söhnel and J. Garside, Precipitation: Basic Principles and Industrial Applocation, Buttewortj-Heinemann, 1992.
26.胡恩崧,“淺溝絕緣層平坦化之製程因數改善” ,中原大學機械工程學系碩士
論文,P.4-11。
27.莊達仁,“VLSI 製造技術”,高立圖書有限公司,2000
28.王建榮、林必雿、林慶福,半導體平坦化CMP 技術,全華,2000。
29.黃忠良,新研磨技術與設備,復漢,2000。
30.L. M. Cook, “Chemical processes in glass polishing”, J. Non-Cryst. Solids, 120, 152-171, 1990.
31.皖之,“半導體製程 265 M 時代之LOCOS 對渠溝式 (Trench)隔離(lsolation)
技術”,電子月刊, 132-135, 1996 年11 月。
32.J. M. Steigerwald, S. P. Murarka, R. J. Gutmann, “Chemical Mechanical Planarization of Microelectronic Materials”,John Wiley & Sons, New York, 1997.
33.C. K. Huang, Matt Stell, Sing-Mp Taeng, “Chemical Mechanical Polishing: Process Manufacturability” , Solid State Technology, p71, 1994.
34.M. M. Martinez, paper presented at the SRC Topical Research Conference Polytechnic Institute, Troy, NY, p26-27, 1995.
35.戴寶通,“化學機械研磨機制探討及消耗材的發展”,電子月刊,第三卷第3期,1997 年3 月。
36.何潛淵,化學機械研磨漿之專利回顧,微粉應用技術研討會論文集,p4-1~4-3,1988 年1 月。
37.國家毫微米元件實驗室: “積體電路製程技術訓練班講義( )” Ⅰ ,p3-56,2002。
38.陳孟邦,“淺層溝渠隔離技術”電子月刊, pp92-101, 1998 年11 月。
39.林明智,化學機械研磨的微觀機制探討,國立中央大學/化學工程研究所碩士
論文,2000。
40.S. Wolf, Silicon Processing for the VLSI Era, Vol. II,Lattices press, 1986.
41.S. M. Sze, VLSI Technology, McGraw-Hill, New York, 1988.
42.I. C. Chen, et al., VLSITSA, 1993.
43.T. Nishimura, et al., Solid State Technology, 1994.
44.F. W. Preston, “The Theory and Design of Plate Glass Polishing Machines”, J.Soc. Glass Technology, Vol.11 p241,1927.
45.N. J. Brown, P. C. Baker, and R. T. Maney, Proc. SPIE., 306, 42, 1981.
46.J. M. Steigerwald, “A Fundamental study of Chemical Mechanical Polishing of Copper Thin Film”, PHD Thesis, Rensselaer Polytechnic Institute, Troy, NY, 1995.
47.F. Zhang,S. P. Yang, H. M. Chen, X. B. Yu, “Preparation of Discrete nanosize ceria powder”, Ceramics International 30, 997-1002, 2004.
48.T. Mahata, G. Das, R. K. Mishra, B. P. Sharma, “Combustion synthesis of gadolinia doped ceria powder” , Journal of Alloys and Compounds 391 , 129–135, 2005.
49.M. Hirano, E. Kato, “Hydrothermal Synthesis of Nanocrystalline Cerium(Ⅳ) Oxide Powders”, J. Am. Ceram. Soc. 82(3), 786-88, 1999.
50.M. Hirano, M. Inagaki, “Preparation of monodispersed cerium oxide(Ⅳ) particles by thermal hydrolysis: influence of the presence of urea and Gd doping on their morphology and growth” , J. Mater. Chem. , 10, 473-477, 2000.
51.莊萬發,“超微粒子理論應用”,復漢出版社,p.47-60,民國84 年4 月,台
南。
52.S. Nakane, T. Tachi, M. Yoshinaka, K. Hirota, and O. Yamaguchi,
“Characterization and Sintering of Reactive Cerium(Ⅳ) Oxide Powders Prepared by the Hydrazine Method”, J. Am. Ceram. Soc. , 80, 12, 3221-3224, 1997.
53.X. Chu, Woan-il Chung, and L. D. Schmidt, “Sintering of Sol-Gel-prepared Submicrometer Particles Studied by Transmission Electron microscopy”, J. Am. Ceram. Soc. , 76, 8, 2115-2118, 1993.
連結至畢業學校之論文網頁點我開啟連結
註: 此連結為研究生畢業學校所提供,不一定有電子全文可供下載,若連結有誤,請點選上方之〝勘誤回報〞功能,我們會盡快修正,謝謝!
QRCODE
 
 
 
 
 
                                                                                                                                                                                                                                                                                                                                                                                                               
第一頁 上一頁 下一頁 最後一頁 top