臺灣博碩士論文加值系統

本研究主要是利用電漿輔助氣相沉積法(plasma enhanced chemical vapor deposition)對於金屬基材沉積有機含矽中介層及表面電漿處理來對類鑽碳(diamond-like carbon)薄膜在應用上具有的接著性缺點來進行改良。由於類鑽碳薄膜具有極佳的物理及化學特性，因此可應用於模具保護層、光學元件與生醫材料等方面。在本研究中將利用含有Si-C-N等元素的Hexamethyldisilazane (HMDSZ) 進行薄膜沉積，之後進行氧氣電漿處理。所使用的系統為RF PECVD電漿系統。所形成的薄膜以micro-FTIR光譜分析薄膜的化學鍵結型態。由光譜上可發經過氧氣處理之含矽有機薄膜出現Si-O的鍵結。6061鋁合金基材上沉積HMDSZ薄膜經過O2電漿處理後，有變親水性的現象，但經過2天的時間就會由親水性轉為疏水性。將電漿處理之含矽有機薄膜當作中介層進行類鑽碳薄膜沉積於鋁合金基材上，由拉曼光譜圖可知類鑽碳薄膜可沉積於金屬基材上且仍有類鑽碳之特性。利用3M膠帶對薄膜進行附著性測試，結果顯示,利用含矽有機中介層之類鑽碳薄膜經過數十次的貼附測試，類鑽碳薄膜會脫落顯示附著性不佳。接著進行磨耗測試。直接沉積之類鑽碳膜經過磨耗測試後，磨擦係數可達0.28左右，而有中介層之類鑽碳複合膜磨擦係數則為0.5左右，與未處理基材接近顯示附著性不佳將會影響磨耗特性。

This study was deposited silicon-containing interlayer and surface plasma treated to improve diamond-like carbon’s defect of applications by plasma enhanced chemical vapor deposition. Due to diamond-like carbon films have excellences in physic and chemical properties, therefore its can employ to protective coating of molds, optical devices and biomedical materials etc... This study was used Hexamethyldisilazane (HMDSZ) monomer with Si-C-N bonding element to deposited thin film and oxygen plasma treated. The system is radio frequency plasma enhanced chemical vapor deposition system. 6061 aluminum-alloys deposited HMDSZ film and then treated by oxygen plasma. Chemical structure analyses of thin films by micro-FTIR spectrum that shows Si-O bonding produced. Weattability properties form hydrophilic changed to hydrophobic just for 2 days. Diamond-like carbon film coating on HMDSZ interlayer by PECVD method, the Raman spectrum to exhibit that still has the diamond–like carbon properties on metallic substrate. Adhesion test by 3M adhesive tape, adhesion of DLC coating with silicon containing interlayer be flake off after adhesion test. Friction Coefficient of DLC coating on Al alloy substrate was 0.281 after wear test. Friction coefficient of DLC coating with silicon containing interlayer on Al alloy substrate was 0.5, similar with Al alloy substrate that adhesion wasn’t well.

CONTENTS
CHINESE ABSTRACT…………………………………………….……..Ⅰ
ENGLISH ABSTRACT…………………………………………..……….Ⅱ
ACKNOWLEDGEMENTS………………………………………….…...Ⅲ
CONTENTS………………………………………………………….……Ⅳ
LIST OF FIGURES.............................................................................…....Ⅷ
LIST OF TABLES………………………………….……………….….ⅩⅢ
Chapter 1 Introduction………………………………………………….....1
1.1Introduction....……………………………………....………...……....2
Chapter 2 Literature Review……………….……….….……………….....5
2.1 Plasma Modification….…………….......…….………………..……..6
2.2 Plasma Treatment….………………….………………….…....……..7
2.3 Introduction of diamond-like carbon films….….……...……….......8
2.4 Review of diamond-like carbon films………………….....……......10
2.5 Deposition methods of diamond-like carbon….……………..……12
2.6 The characteristics and application of diamond-like carbon films.....................................................................................................13
Chapter3 Experimental Techniques….………………….………….…....27
3.1 Experimental Flowchart….….....………….…...……………..……28
3.2 Related Materials….………………….………...……...………..….28
3.3 Sample preparation….………………….………………….….……28
3.4 Reagents for cleaning sample surface….…………………..………29
3.5 Agents….………………….………………….……………….……..29
3.5-1 Gases for plasma treatment….………………….…….…..……29
3.5-2 Monomers for plasma deposition….……………….…..….…...29
3.6 Plasma surface modification….……………….……….……..…..29
3.6-1 cold plasma treatment….………….……….………………..….29
3.6-2 Cold plasma deposition….……….....……….……….…………30
3.6-3 O2plasma post-treated….……………….……………..……......31
3.6-4 DLC film deposition….……………….…………….......……….32
3.7 Characteristic analyses….………………….…………….…….…..32
3.7-1 Surface hydrophilicity….………………..………….…......……32
3.7-2 Aging effect of hydrophilicity….………………..……….…......33
3.7-3 Films thickness and deposition rate….………….…….…....…33
3.7-4 AFM morphology and roughness test….………….……....…..33
3.7-5 SEM micrograph….……………….………………..........…….34
3.7-6 micro-FTIR spectrometer analysis….…………….........……..34
3.7-7 Raman spectrometer analysis….……………….…......………34
3.7-8 Adhesion test….……………….………………….…….......……34
3.7-9 Friction coefficient….……… ……………….……….........……35
Chapter4 Results and Discussion….………………….……………….....44
4.1 The wettability effect of plasma deposition. ….…………….......…45
4.1-1 The wettability effect of different plasma treatment.…....……45
4.1-2 The wettability effect of HMDSZ plasma deposition with different conditions.................................................................……45
4.1-3 The wettability effect of DLC plasma deposition films…….....46
4.2 The aging effect of plasma treatment and deposition……….……46
4.2-1 The aging effect after each plasma treatment.….……......……46
4.2-2 The aging effect of HMDSZ plasma deposition with different power.….………………….………………….......…..............……46
4.3 Deposition rates of HMDSZ films. ….………………………..……47
4.4 AFM morphology and roughness test….……………………….….47
4.4-1 The roughness of HMDSZ films. ….……………………......….47
4.4-2 AFM morphology of HMDSZ film treated by O2 plasma….....47
4.5 FTIR spectrums analyses of silicon-containing thin films…......…47
4.6 SEM micrograph….………………….………………….……....….48
4.7 Raman spectrums analyses….………………….……………..……48
4.8 Adhesion test….………………….………………….…....…………49
4.9 Wear test….………………….………………….………...…………50
Chapter5 Conclusions….……..………….………………….…………....77
References….………………….………………….…………….………….79

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