臺灣博碩士論文加值系統

本研究是以射頻濺鍍法(RF Magnetrong Sputtering)製備具有銳鈦礦(anatase)晶形的二氧化鈦(TiO2)光觸媒薄膜與氮摻雜之二氧化鈦(TiO2-XNX)光觸媒薄膜。利用XRD、FE-SEM、AFM、UV-Vis Spectrum等儀器分析薄膜之結構及特性，並探討濺鍍壓力(Pt)、沉積時間(t)和氣體流量(ψ and Γ)等參數變化對於二氧化鈦光觸媒薄膜結構及特性的影響。另外，藉由水與薄膜間的接觸角變化及亞甲基藍溶液的分解測試，進行TiO2及TiO2-XNX薄膜的親水性及光催化活性之評估，進而探討出最佳的鍍膜參數。
依XRD的實驗結果顯示，在不同的製備參數下，TiO2薄膜的結晶構造大多是屬於anatase與rutile的混合晶形，於較低的濺鍍壓力下，是以rutile晶型為主，隨著濺鍍壓力的增加，anatase結晶強度有明顯增加之趨勢。另外，氧氣的添加量也會影響薄膜的結晶構造，隨著氧氣流量的增加，anatase晶型強度亦會隨之增強。由SEM與AFM的分析結果可知，氧氣流量增加時薄膜的粗糙度會隨之增大，但過量時則有減小的趨勢，乃因為氧氣會形成負離子，受到陰極電場的加速，獲得高能量後撞擊基材，當表面受大量的氧負離子撞擊時，則會導致粗糙度下降。當氮氣添加及流量的改變時會影響TiO2-XNX薄膜的吸收波長、anatase的結晶強度及薄膜的表面粗糙度。
依薄膜的親水性與亞甲基藍光分解試驗顯現，TiO2薄膜的親水性隨濺鍍壓力與氧氣流量的增加而提升，當濺鍍壓力12 mtorr、氧氣流量比為0.6、沉積時間90分鐘等條件下所製備之TiO2薄膜，經紫外光照射20分鐘後，有助於提升薄膜之親水性，水的接觸角可下降至10°以下。在光催化活性測試方面，經紫外光照射21小時後，對亞甲基基藍的光分解效率可達90%以上。經氮氣的摻雜後的TiO2-XNX薄膜，其親水性有明顯的提升，濺鍍壓力8 mtorr、氮氣流量比0.020、沉積時間90分鐘等條件下製備之TiO2-XNX薄膜，亦具備良好的親水性質，且其吸收波長偏移至460nm的可見光區。

The main purpose of this subject is to describe titanium dioxide (TiO2) and nitrogen doped titanium dioxide (TiO2-XNX) photocatalytic thin films that are prepared by reactive RF magnetron sputtering on the glass substrates without additional external heating. The polycrystalline structure and surface morphology of the thin films were investigated by using X-Ray Diffraction(XRD), Field Emission Scanning Electron Microscope(FE-SEM), Atomic Force Microscope(AFM) and UV/Vis absorption spectrometer, and the effects of the sputtering pressure, deposition time, and oxygen partial pressure on the polycrystalline structure and characteristics of TiO2 and TiO2-XNX thin films were studied. In addition, water contact angle and the degradation of methylene blue aqueous solution were used to evaluate the photocatalytic activity of TiO2 and TiO2-XNX thin films, and then determined the optimum process parameters.
The XRD pattern indicated that the crystalline structure of TiO2 thin films were anatase and rutile mixture structure at the different parameters. At the low sputtering pressure, TiO2 major crystalline structure was mainly rutile crystal, but the intensity of anatase crystalline was increased with rising of the sputtering pressure. Moreover, the crystalline structure of TiO2 thin films was affected by the addition of the oxygen gas flow, and the intensity of anatase crystalline structure is increased with rising of the oxygen gas flow as well. The surface morphologies of TiO2 films were observed with AFM and SEM techniques. The result showed that the surface roughness of TiO2 thin films increased with increasing of the oxygen gas flow, but decreased once the oxygen gas flow went beyond the limit. The anions of oxygen atoms were accelerated by the electric field of the cathode, and bombarded the substrate with kinetic energy. The surface roughness for TiO2 thin films would decrease with the anions of oxygen atoms bombardment. Addition of nitrogen gas and the variation of nitrogen flow change would affect the absorption wavelength, anatase crystalline intensity, and the surface roughness of TiO2 thin films.
According to the results of water contact angle and degradation of methylene blue of TiO2 photocatalytic thin films, the hydrophilic of TiO2 film increased with rising of the sputtering pressure and the oxygen gas flow. The TiO2 thin films were prepared under the conditions of sputtering pressure at 12 mtorr, oxygen gas flow ratio at 0.6, and deposited time of 90 minutes. After UV-light treatment for 20 minutes, the thin films possess hydrophilic property and the water contact angle was dropped down to 10 degree. On the other hand, after the UV-light treatment for 21 hours, the degradation of methylene blue of TiO2 photocatalytic thin film could reach up to 90%. The TiO2-XNX thin films was prepared under the conditions of sputtering pressure at 8 mtorr, nitrogen gas flow ratio at 0.020, deposited time of 90 minutes. The TiO2-XNX thin film also revealed excellent hydrophilic property, and the absorption wavelength was shifted to the range of visible light.

目錄

中文摘要------------------------------------------------------------------------------------- Ⅰ
英文摘要------------------------------------------------------------------------------------- Ⅲ
誌謝------------------------------------------------------------------------------------------- Ⅴ
目錄------------------------------------------------------------------------------------------- Ⅵ
表目錄---------------------------------------------------------------------------------------- Ⅸ
圖目錄---------------------------------------------------------------------------------------- Ⅹ
第一章 緒論-------------------------------------------------------------------------------- 1
1-1 前言------------------------------------------------------------------------------------- 1
1-2 研究目的及內容---------------------------------------------------------------------- 2
1-2-1 研究目的------------------------------------------------------------------------ 2
1-2-2 研究內容------------------------------------------------------------------------ 4

第二章 文獻回顧-------------------------------------------------------------------------- 5
2-1光觸媒介紹----------------------------------------------------------------------------- 5
2-2半導體光催化效應-------------------------------------------------------------------- 6
2-3二氧化鈦之介紹----------------------------------------------------------------------- 9
2-3-1二氧化鈦的結構及特性------------------------------------------------------- 10
2-3-2二氧化鈦光催化反應原理---------------------------------------------------- 13
2-3-3二氧化鈦光觸媒的製備方法------------------------------------------------- 16
2-4二氧化鈦的改質----------------------------------------------------------------------- 27
2-4-1觸媒光催化效率的提升------------------------------------------------------- 27
2-4-2可見光光觸媒------------------------------------------------------------------- 30
2-5 二氧化鈦的應用與發展------------------------------------------------------------- 32
2-6二氧化鈦的超親水性質-------------------------------------------------------------- 35

第三章 實驗內容與方法----------------------------------------------------------------- 38
3-1 研究內容------------------------------------------------------------------------------- 38
3-2實驗藥品與材料----------------------------------------------------------------------- 41
3-3實驗儀器--------------------------------------------------------------------------------- 42
3-4二氧化鈦薄膜之製備------------------------------------------------------------------ 45
3-4-1 TiO2薄膜製備------------------------------------------------------------------- 45
3-4-1-1基材前處理-------------------------------------------------------------- 48
3-4-1-2 SiO2鍍層製備----------------------------------------------------------- 49
3-4-1-3 TiO2薄膜製備----------------------------------------------------------- 50
3-4-1-4 TiO2-xNx光觸媒薄膜之製備------------------------------------------ 51
3-4-2光觸媒薄膜結構與性能之分析----------------------------------------------- 53
3-4-3二氧化鈦薄膜固液相光分解效率測定-------------------------------------- 58
3-4-4二氧化鈦光觸媒薄膜的親水性測試----------------------------------------- 64

第四章 結果與討-------------------------------------------------------------------------- 65
4-1TiO2光觸媒薄膜的性質分析--------------------------------------------------------- 66
4-1-1沉積時間與結晶型態的關係-------------------------------------------------- 66
4-1-1-1 XRD分析---------------------------------------------------------------- 68
4-1-1-2 SEM & AFM分析------------------------------------------------------ 71
4-1-2濺鍍壓力、氧氣流量比與TiO2薄膜特性之關係------------------------- 74
4-1-2-1 XRD 分析------------------------------------------------------------- 78
4-1-2-2 SEM & AFM分析---------------------------------------------------- 84
4-1-2-3 SEM之橫截面觀察--------------------------------------------------- 96
4-1-2-3 UV-Vis 光譜分析----------------------------------------------------- 97
4-2 TiO2光觸媒薄膜的光催化效率及親水性之量測-------------------------------- 102
4-2-1 TiO2薄膜親水性之量測------------------------------------------------------- 102
4-2-2 TiO2薄膜的光催化效率------------------------------------------------------- 108
4-3 TiO2-xNx光觸媒薄膜的性質分析--------------------------------------------------- 110
4-3-1討濺鍍壓力與氮氣流量對TiO2薄膜的影響------------------------------ 110
4-3-1-1 XRD分析-------------------------------------------------------------- 112
4-3-1-2 SEM & AFM分析---------------------------------------------------- 115
4-3-1-3 UV-Vis光譜分析----------------------------------------------------- 122

4-4 TiO2-xNx光觸媒薄膜的光催化效率及親水性之量測---------------------------
125
4-4-1 TiO2-xNx薄膜親水性之量測-------------------------------------------------- 125
4-4-1-1 TiO2-xNx薄膜在可見光照射時親水性之變化--------------------------- 127
4-4-2 TiO2-xNx薄膜的光催化效率-------------------------------------------------- 128

第五章 結論與未來研究方向----------------------------------------------------------- 131
5-1結論--------------------------------------------------------------------------------------- 131
5-2未來研究方向--------------------------------------------------------------------------- 134

參考文獻------------------------------------------------------------------------------------- 135
自述------------------------------------------------------------------------------------------- 143



















表目錄

Table 2-1 Anatase和Rutile物理性質之比較表--------------------------------------- 11
Table 2-2氧化劑相對位能比較表------------------------------------------------------- 15
Table 2-3硫酸法和氯化法製備TiO2之的比較表------------------------------------ 17
Table 2-4光觸媒研究開發史------------------------------------------------------------- 33
Table 2-5光觸媒的應用概況------------------------------------------------------------- 35
Table 3-1 SiO2層的鍍膜參數------------------------------------------------------------- 50
Table 3-2 TiO2薄膜的濺鍍參數---------------------------------------------------------- 51
Table 3-3 TiO2-xNx薄膜的濺鍍條件----------------------------------------------------- 52
Table 3-4亞甲基藍的特性與結構------------------------------------------------------ 58
Table 4-1 TiO2薄膜製備參數------------------------------------------------------------- 67
Table 4-2二氧化鈦薄膜的製備條件(1)------------------------------------------------- 67
Table 4-3二氧化鈦薄膜的製備條件(2)------------------------------------------------- 73
Table 4-4分析TiO2薄膜的儀器及使用目的之列表---------------------------------- 81
Table 4-5二氧化鈦薄膜的製備條件(3)------------------------------------------------- 82
Table 4-6 TiO2-xNx薄膜的濺鍍條件----------------------------------------------------- 123
Table 4-7 TiO2-xNx薄膜的濺鍍條件----------------------------------------------------- 123
Table 4-8不同實驗條件下，TiO2-xNx薄膜之UV-Vis吸收波長------------------- 141











圖目錄

Fig. 2-1 絕緣體、半導體、導体的典型導電度範圍---------------------------------- 7
Fig. 2-2 能隙圖概述:(a)絕緣體;(b)半導體;(c)導體---------------------------------- 7
Fig. 2-3半導體能隙圖--------------------------------------------------------------------- 8
Fig. 2-4 二氧化鈦電極電解水裝置示意圖-------------------------------------------- 9
Fig. 2-5 TiO2之晶格結構------------------------------------------------------------------ 12
Fig. 2-6 二氧化鈦之分子鍵結方式----------------------------------------------------- 12
Fig. 2-7 二氧化鈦光觸媒照光激發之氧化還原反應示意圖----------------------- 15
Fig. 2-8 氬氣離子撞擊靶材示意圖----------------------------------------------------- 23
Fig. 2-9 典型的直流鍍膜系統的構造示意圖----------------------------------------- 24
Fig. 2-10 典型射頻濺鍍系統的構造示意圖------------------------------------------ 25
Fig. 2-11 TiO2被激發後電子、電洞的行徑示意圖---------------------------------- 28
Fig. 2-12 金屬改質後半導體內電子、電洞的行徑示意圖-------------------------- 29
Fig. 2-13 週期表中常被用來改質二氧化鈦的金屬元素--------------------------- 29
Fig. 2-14 太陽光的光譜圖--------------------------------------------------------------- 30
Fig. 2-15 TiO2-CdS複合半導體的光激發程序示意圖------------------------------- 31
Fig. 2-16 二氧化鈦在環境淨化上主要的應用--------------------------------------- 33
Fig. 2-17 二氧化鈦親水性的機制------------------------------------------------------ 36
Fig. 2-18 接觸角量測計算的示意圖--------------------------------------------------- 37
Fig. 3-1 研究架構圖----------------------------------------------------------------------- 40
Fig. 3-2 可見光燈管波長分佈圖-------------------------------------------------------- 45
Fig. 3-3 濺鍍機的簡單示意圖----------------------------------------------------------- 46
Fig. 3-4 溅鍍機的外觀-------------------------------------------------------------------- 47
Fig. 3-5 玻璃基材前處理步驟----------------------------------------------------------- 49
Fig. 3-6 實驗流程圖----------------------------------------------------------------------- 53
Fig. 3-7 掠角X光繞射法的幾何關係示意圖----------------------------------------- 54
Fig. 3-8 光電子發生原理之示意圖----------------------------------------------------- 57
Fig. 3-9 亞甲基藍之UV-Vis吸收光譜圖---------------------------------------------- 59
Fig. 3-10亞甲基藍濃度與吸收度之關係圖(最大吸收波峰位置665nm)--------- 60
Fig. 3-11 亞甲基藍光分解反應機制---------------------------------------------------- 62
Fig. 3-12 液相光分解反應系統示意圖------------------------------------------------ 63
Fig .3-13 動態接觸角儀器裝置示意圖------------------------------------------------ 64
Fig. 4-1 濺鍍壓力5mtorr、沉積時間30分鐘、不同氧氣流量比之TiO2薄膜
XRD分析圖，(a)ψ=0.2、(b)ψ=0.4、(c)ψ=0.6、(d)ψ=0.7------------ 68
Fig. 4-2 濺鍍壓力8mtorr、沉積時間30分鐘、不同氧氣流量比之TiO2 薄膜 XRD分析圖，(a)ψ=0.2、(b)ψ=0.4、(c)ψ=0.6、(d)ψ=0.7---------- 69
Fig. 4-3 沉積時間60分鐘、氧氣流量比為0.6下，不同濺鍍壓力之TiO2薄
膜XRD分析圖(a)Pt=2mtorr、(b)Pt=5mtorr、(c)Pt=8mtorr、
(d)Pt=12mtorr--------------------------------------------------------------------- 70
Fig. 4-4 沉積時間90分鐘、氧氣流量比為0.6下，不同濺鍍壓力之TiO2薄
膜XRD分析圖(a)Pt=2mtorr、(b)Pt=5mtorr-------------------------------- 71
Fig. 4-5 在Pt = 5 mtorr，ψ= 0.6，D.T.= 30min的鍍膜條件下，TiO2薄膜之
AFM分析圖--------------------------------------------------------------------- 72
Fig. 4-6 在Pt = 5 mtorr，ψ= 0.6，D.T.= 60min的鍍膜條件下，TiO2薄膜之
AFM分析圖---------------------------------------------------------------------- 73
Fig. 4-7 在Pt = 5 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之
AFM分析圖---------------------------------------------------------------------- 73
Fig. 4-8 在Pt = 5 mtorr，ψ= 0.6，D.T.= 30min的鍍膜條件下，TiO2薄膜之
AFM分析圖---------------------------------------------------------------------- 72
Fig. 4-9 在Pt = 5 mtorr，ψ= 0.6，D.T.= 60min的鍍膜條件下，TiO2薄膜之
AFM分析圖---------------------------------------------------------------------- 73
Fig. 4-10 在Pt = 5 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之
AFM分析圖-------------------------------------------------------------------- 73
Fig. 4-11 在Pt=5mtorr、ψ= 0.6的條件下，TiO2的表面粗糙度與沉積時間的
關係------------------------------------------------------------------------------ 74
Fig. 4-12 濺鍍壓力2mtorr、沉積時間90分鐘、不同氧氣流量比之TiO2薄
膜XRD分析圖，(a)ψ=0.2、(b)ψ=0.4、(c)ψ=0.6、(d)ψ=0.7----- 81
Fig. 4-13 濺鍍壓力5mtorr、沉積時間90分鐘、不同氧氣流量比之TiO2薄
膜XRD分析圖，(a)ψ=0.2、(b)ψ=0.4、(c)ψ=0.6、(d)ψ=0.7----- 82
Fig. 4-14 濺鍍壓力8mtorr、沉積時間90分鐘、不同氧氣流量比之TiO2 薄
膜XRD分析圖，(a)ψ=0.2、(b)ψ=0.4、(c)ψ=0.6、(d)ψ=0.7---- 82
Fig. 4-15 濺鍍壓力12mtorr、沉積時間90分鐘、不同氧氣流量比之TiO2薄
膜XRD分析圖，(a)ψ=0.2、(b)ψ=0.4、(c)ψ=0.6、(d)ψ=0.7---- 83
Fig. 4-16 不同濺鍍壓力下，TiO2薄膜中anatase(101)含量百分比隨氧氣流
量比(ψ)之變化，圖中◆代表Pt=2mtorr，■代表Pt=5mtorr，
▲代表Pt=8 mtorr，╳代表Pt=12 mtorr------------------------------------ 83
Fig. 4-17 不同濺鍍壓力下，TiO2薄膜中Rutile(110)含量百分比隨氧氣流量
比(ψ)之變化，圖中◆代表Pt=2mtorr，■代表Pt=5mtorr，
▲代表Pt=8 mtorr，╳代表Pt=12 mtorr------------------------------------ 84
Fig. 4-18在Pt = 2 mtorr，ψ= 0.2，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 86
Fig. 4-19在Pt = 2 mtorr，ψ= 0.4，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 86
Fig. 4-20在Pt = 2 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 87
Fig. 4-21在Pt = 2 mtorr，ψ= 0.7，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 87
Fig. 4-22在Pt = 2 mtorr，ψ= 0.2，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 86
Fig. 4-23在Pt = 2 mtorr，ψ= 0.4，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 86
Fig. 4-24在Pt = 2 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 87
Fig. 4-25在Pt = 2 mtorr，ψ= 0.7，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 87
Fig. 4-26濺鍍壓力為2 mtorr下，氧氣流量比(ψ)與粗糙度的關係-------------- 88
Fig. 4-27在Pt = 5 mtorr，ψ= 0.2，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 88

Fig. 4-28在Pt = 5 mtorr，ψ= 0.4，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖---------------------------------------------------------------------

89
Fig. 4-29在Pt = 5 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 89
Fig. 4-30在Pt = 5 mtorr，ψ= 0.7，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 90
Fig. 4-31在Pt = 5 mtorr，ψ= 0.2，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------
88
Fig. 4-32在Pt = 5 mtorr，ψ= 0.4，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖-------------------------------------------------------------------- 89
Fig. 4-33在Pt = 5 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 89
Fig. 4-34在Pt = 5 mtorr，ψ= 0.7，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 90
Fig. 4-35濺鍍壓力為5 mtorr下，氧氣流量比(ψ)與粗糙度的關係--------------- 90
Fig. 4-36在Pt = 8 mtorr，ψ= 0.2，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 91
Fig. 4-37在Pt = 8 mtorr，ψ= 0.4，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 91
Fig. 4-38在Pt = 8 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 92
Fig. 4-39在Pt = 8 mtorr，ψ= 0.7，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 92
Fig. 4-40在Pt = 8 mtorr，ψ= 0.2，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖-------------------------------------------------------------------- 91
Fig. 4-41在Pt = 8 mtorr，ψ= 0.4，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 91
Fig. 4-42在Pt = 8 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 92

Fig. 4-43在Pt = 8 mtorr，ψ= 0.7，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------

92
Fig. 4-44濺鍍壓力為8 mtorr下，氧氣流量比(ψ)與粗糙度的關係--------------- 93
Fig. 4-45在Pt = 12 mtorr，ψ= 0.2，D.T.= 90min的鍍膜條件下，TiO2薄膜之SEM分析圖--------------------------------------------------------------------- 93
Fig. 4-46在Pt =12 mtorr，ψ=0.4，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 94
Fig. 4-47在Pt =12 mtorr，ψ=0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 94
Fig. 4-48在Pt =12 mtorr，ψ=0.7，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 95
Fig. 4-49在Pt = 12 mtorr，ψ= 0.2，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖--------------------------------------------------------------------- 93
Fig. 4-50在Pt = 12 mtorr，ψ= 0.4，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖-------------------------------------------------------------------- 94
Fig. 4-51在Pt = 12 mtorr，ψ= 0.6，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖-------------------------------------------------------------------- 94
Fig. 4-52在Pt = 12 mtorr，ψ= 0.7，D.T.= 90min的鍍膜條件下，TiO2薄膜之AFM分析圖-------------------------------------------------------------------- 95
Fig. 4-53濺鍍壓力為12 mtorr下，氧氣流量比(ψ)與粗糙度的關係------------ 95
Fig. 4-54不同濺鍍壓力下，TiO2薄膜之沉積速率隨氧氣流量比(ψ)之變化，圖中╳代表Pt=2 mtorr，▲代表Pt=5 mtorr，■代表Pt=8 mtorr，
◆代表Pt=12 mtorr------------------------------------------------------------- 96
Fig. 4-55 在濺鍍壓力8 mtorr、沉積時間90分鐘下，TiO2薄膜之橫截面圖，
(a)ψ=0.2、(b)ψ=0.4、(c)ψ=0.6、(d)ψ=0.7---------------------------- 97
Fig. 4-56無SiO2阻絕層的TiO2薄膜之UV-Vis吸收光譜圖------------------------ 99
Fig. 4-57濺鍍壓力為8 mtorr時，不同氧氣流量比下的TiO2薄膜之UV-Vis
吸收光譜圖---------------------------------------------------------------------- 99
Fig. 4-58濺鍍壓力為12 mtorr時，不同氧氣流量比下的TiO2薄膜之UV-Vis
吸收光譜圖---------------------------------------------------------------------- 100
Fig. 4-59在氧氣流量比(ψ)為0.2時，不同濺鍍壓力下TiO2薄膜之UV-Vis
吸收光譜圖---------------------------------------------------------------------- 100
Fig. 4-60在氧氣流量比(ψ)為0.6時，不同濺鍍壓力下TiO2薄膜之UV-Vis
吸收光譜圖---------------------------------------------------------------------- 101
Fig. 4-61在氧氣流量比(ψ)為0.7時，不同濺鍍壓力下TiO2薄膜之UV-Vis
吸收光譜圖---------------------------------------------------------------------- 101
Fig. 4-62在Pt=2mtorr、ψ=0.2~0.7、D.T.= 90min的鍍膜條件下，經
紫外線照射後，TiO2薄膜接觸角之變化，圖中◆代表ψ=0.2，
■代表ψ=0.4，×代表ψ=0.6， ▲代表ψ=0.7-------------------------- 103
Fig. 4-63在Pt=5mtorr、ψ=0.2~0.7、D.T.= 90min的鍍膜條件下，經
紫外線照射後，TiO2薄膜接觸角之變化，圖中◆代表ψ=0.2，
■代表ψ=0.4，×代表ψ=0.6， ▲代表ψ=0.7----------------------------

104
Fig. 4-64在Pt=8mtorr、ψ=0.2~0.7、D.T.= 90min的鍍膜條件下，經
紫外線照射後，TiO2薄膜接觸角之變化，圖中◆代表ψ=0.2，
■代表ψ=0.4，×代表ψ=0.6， ▲代表ψ=0.7---------------------------- 104
Fig. 4-65在Pt=12mtorr、ψ=0.2~0.7、D.T.= 90min的鍍膜條件下，經
紫外線照射後，TiO2薄膜接觸角之變化，圖中◆代表ψ=0.2，
■代表ψ=0.4，×代表ψ=0.6， ▲代表ψ=0.7---------------------------- 105
Fig. 4-66在Pt = 2 mtorr，ψ= 0.4 ,D.T.=90min鍍膜條件下，TiO2薄膜經紫外線照射後，接觸角之變化---------------------------------------------------- 106
Fig. 4-67在Pt = 5 mtorr，ψ= 0.6 ,D.T.=90min鍍膜條件下，TiO2薄膜經紫外線照射後，接觸角之變化---------------------------------------------------- 106
Fig. 4-68在Pt = 8 mtorr，ψ= 0.6 ,D.T.=90min鍍膜條件下，TiO2薄膜經紫外線照射後，接觸角之變化---------------------------------------------------- 107
Fig. 4-69在Pt = 12 mtorr，ψ= 0.6 ,D.T.=90min鍍膜條件下，TiO2薄膜經紫外線照射後，接觸角之變化-------------------------------------------------- 107
Fig. 4-70濺鍍壓力8mtorr，不同氧氣流量比(ψ)下，TiO2薄膜之亞甲基藍
光分解效率圖，圖中◆代表ψ=0.2，■代表ψ=0.4，╳代表ψ=0.6，
▲代表ψ=0.7------------------------------------------------------------------- 109

Fig. 4-71濺鍍壓力12mtorr，不同氧氣流量比(ψ)下，TiO2薄膜之亞甲基藍
光分解效率圖，圖中◆代表ψ=0.2，■代表ψ=0.4，╳代表ψ=0.6，
▲代表ψ=0.7-------------------------------------------------------------------


109
Fig. 4-72濺鍍壓力8mtorr、沉積時間90分鐘、不同氮氣流量比之TiO2-XNX
薄膜XRD分析圖，(a)Γ=0、(b)Γ=0.005、(c)Γ=0.010、(d)Γ=0.015、
(e)Γ=0.020----------------------------------------------------------------------- 113
Fig. 4-73濺鍍壓力12mtorr、沉積時間90分鐘、不同氮氣流量比之TiO2-XNX
薄膜XRD分析圖，(a)Γ=0、(b)Γ=0.005、(c)Γ=0.010、 (d)Γ=0.015、
(e)Γ=0.020----------------------------------------------------------------------- 114
Fig. 4-74不同濺鍍壓力下，TiO2-XNX薄膜中anatase(101)含量百分比隨氮氣
流量比(Γ)之變化圖，圖中■代表Pt=8 mtorr，▲Pt=12 mtorr----------- 114
Fig. 4-75在Pt=8 mtorr、Γ= 0、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之
SEM分析圖---------------------------------------------------------------------
116
Fig. 4-76在Pt=8mtorr、Γ= 0.005、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖------------------------------------------------------------------ 116
Fig. 4-77在Pt=8mtorr、Γ= 0.010、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖------------------------------------------------------------------ 117
Fig. 4-78在Pt=8 mtorr、Γ=0.015、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖----------------------------------------------------------------- 117
Fig. 4-79在Pt=8mtorr、Γ= 0.020、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖------------------------------------------------------------------ 118
Fig. 4-80在Pt = 8 mtorr、Γ= 0、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖--------------------------------------------------------------------- 116
Fig. 4-81在Pt=8 mtorr、Γ=0.005、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖----------------------------------------------------------------- 116
Fig. 4-82在Pt=8mtorr、Γ= 0.010、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖----------------------------------------------------------------- 117
Fig. 4-83在Pt=8mtorr、Γ= 0.015、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖----------------------------------------------------------------- 117

Fig. 4-84在Pt=8mtorr、Γ= 0.020、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖-----------------------------------------------------------------

118
Fig. 4-85濺鍍壓力為8 mtorr下，氮氣流量比(Γ)與TiO2-XNX薄膜粗糙度之
關係------------------------------------------------------------------------------- 118
Fig. 4-86在Pt = 12 mtorr、Γ= 0、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖--------------------------------------------------------------------- 119
Fig. 4-87在Pt=12mtorr、Γ= 0.005、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖------------------------------------------------------------------ 119
Fig. 4-88在Pt=12mtorr、Γ= 0.010、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖------------------------------------------------------------------ 120
Fig. 4-89在Pt=12mtorr、Γ= 0.015、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖------------------------------------------------------------------ 120
Fig. 4-90在Pt=12mtorr、Γ= 0.020、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之SEM分析圖------------------------------------------------------------------ 121
Fig. 4-91在Pt = 12 mtorr、Γ= 0、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖--------------------------------------------------------------------- 119
Fig. 4-92在Pt=12mtorr、Γ= 0.005、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖----------------------------------------------------------------- 119
Fig. 4-93在Pt=12mtorr、Γ= 0.010、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖----------------------------------------------------------------- 120
Fig. 4-94在Pt=12mtorr、Γ= 0.015、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖------------------------------------------------------------------ 120
Fig. 4-95在Pt=12mtorr、Γ= 0.020、D.T.= 90min濺鍍條件下，TiO2-XNX薄膜之AFM分析圖----------------------------------------------------------------- 121
Fig. 4-96濺鍍壓力為12 mtorr下，氮氣流量比(Γ)與TiO2-XNX薄膜粗糙度之關係------------------------------------------------------------------------------- 121
Fig. 4-97不同濺鍍壓力下，TiO2-XNX薄膜之沉積速率隨氮氣流量比(Γ)之變化，圖中■代表Pt=8 mtorr，▲代表Pt=12 mtorr------------------------- 122
Fig. 4-98濺鍍壓力8 mtorr、沉積時間90min下，氮氣流量比(Γ)與TiO2-XNX薄膜之UV-Vis吸收光譜圖--------------------------------------------------- 123
Fig. 4-99濺鍍壓力8 mtorr、沉積時間90min下，氮氣流量與 TiO2-XNX薄膜之UV-Vis吸收光譜圖--------------------------------------------------------- 124
Fig. 4-100在Pt=8 mtorr、Γ=0 ~0.020、D.T.=90min濺鍍條件下，TiO2-xNx薄
膜接觸角之變化，圖中◆代表Γ=0，■代表Γ=0.005，
▲代表Γ=0.010，×代表Γ=0.015， ●代表Γ=0.020-------------------- 126
Fig. 4-101在Pt=12 mtorr、Γ=0~0.020、D.T.=90min實驗條件下，TiO2-xNx
薄膜接觸角之變化，圖中◆代表Γ=0，■代表Γ=0.005，
▲代表Γ=0.010，×代表Γ=0.015， ●代表Γ=0.020-------------------- 126
Fig. 4-102在Pt=8 mtorr、Γ=0.005、D.T.=90min實驗條件下，TiO2-xNx薄膜在可見光燈源照射時接觸角之變化-------------------------------------- 127
Fig. 4-103在Pt=12 mtorr、Γ=0.020、D.T.=90min實驗條件下，TiO2-xNx薄膜在可見光燈源照射時接觸角之變化-------------------------------------- 128
Fig. 4-104濺鍍壓力8 mtorr，不同氮氣流量比(Γ)下TiO2-xNx薄膜之亞甲基藍光分解效率圖，圖中◆代表Γ=0，■代表Γ=0.005，▲代表Γ=0.010，×代表Γ=0.015， ●代表Γ=0.020------------------------------------------ 129
Fig. 4-105濺鍍壓力12mtorr，不同氮氣流量比(Γ)下TiO2-xNx薄膜之亞甲基藍光分解效率圖，圖中◆代表Γ=0，■代表Γ=0.005，▲代表Γ=0.010
，×代表Γ=0.015， ●代表Γ=0.020----------------------------------------

130

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