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研究生:黃怡凱
研究生(外文):Yi-Kai Huang
論文名稱:垂直及傾斜入射之光學監控系統實作探討
論文名稱(外文):Fabrication of Optical Monitoring System with Vertical and Oblique Incidence
指導教授:徐進成
指導教授(外文):Jin-Cherng Hsu
學位類別:碩士
校院名稱:輔仁大學
系所名稱:物理學系
學門:自然科學學門
學類:物理學類
論文種類:學術論文
論文出版年:2006
畢業學年度:94
語文別:中文
論文頁數:93
中文關鍵詞:光學監控斜向入射光學監控光學系統折射率入射光角度層膜
外文關鍵詞:optical monitoringoblique incidence monitoringsystem
相關次數:
  • 被引用被引用:1
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  • 下載下載:32
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本論文為研究真空鍍膜中以光學監控方法(optical monitoring method)來監控光學薄膜的問題,一般在真空中薄膜厚度的即時量測是以石英晶體振盪方式作間接監控以及光學監控兩種方式。石英振盪監控是以薄膜設計的物理厚度為數值根據,作薄膜蒸鍍時厚度的控制,而光學監控主要取其蒸鍍薄膜之光學厚度,因此,光學膜厚計是常用來直接監控精密的薄膜蒸鍍。
然而,光學薄膜的元件經常是以傾斜角度作光學修正處理,一般光學監控的系統都以垂直入射光來作薄膜光學控制,必須先除以餘弦角度的數值預估薄膜每層的厚度而失去直接監控薄膜的優點,因此,本論文即是研究再以傾斜光線入射作監控補其不足,以達到傾斜光學薄膜元件能以直接監控的方式作精密蒸鍍的控制。在此論文中除了角度需修正之外,也需對色散(dispersion)現象所造成的誤差做修正。最後,再以ZnS及MgF2作多層膜的設計下,改變其各折射率及物理厚度,探討各改變量的影響。
The study is an optical monitoring method for depositing optical thin films. In general, a quartz monitor and an optical monitor are used to control thickness in deposition process. The quartz monitor indicates and controls the physical thickness of the thin film that is designed before the deposition. Moreover, the optical monitor can control the film at its optical thickness directly. So that, the optical monitoring method usually be used to fabricate the precision optical coating element.
But, the oblique optical element usually is used in photo-electronic system. The optical film must be designed at the oblique angle, but the coating system deposited the film, which the optical thickness is predicated by divided by a cosθ, with optical monitoring at straight angel. Therefore, the monitoring method must be improved by the monitoring light at an oblique angle. With the oblique-incidence optical monitoring, the optical film, then, can be controlled directly in precision coating procession. Except that the angle needs to revise in the thesis, that need to revise the error caused of dispersion too. Finally , and then make under the design of the multi-layer with ZnS and MgF2, change its each refractive index and thickness of physics, fabricate into the influence each changing quantity.
中文摘要...................I
英文摘要...................II
謝誌.....................III
目錄.....................IV
圖目錄....................VI
表目錄....................IX
第一章 緒論..................1
1-1 前言..................1
1-2 MgF2之特性...............2
1-3 ZnS之特性...............3
第二章 基本理論..............4
2-1 監控基本理論..............4
2-2 單層膜之反射與透射...........5
2-3 非相干性之反射與干涉..........8
2-4 多層膜之反射與透射........... 9
2-5 光學監控法...............10
2-5-1 極值法................11
2-6 斜向入射................13
第三章 實驗儀器裝置.............15
3-1 系統架構................15
3-1-1 真空系統...............15
3-1-2 熱電阻加熱裝置............16
3-1-3 石英監控器..............17
3-2 量測儀器................18
3-2-1 橢圓偏振儀..............18
3-2-2 Varian Cary 5E光譜儀.........21
3-2-3 包絡法................24
第四章 光學監控系統及架設..........27
4-1 儀器之架設...............28
4-2監控點的選擇與斜向入角度的調整.....32
第五章 實驗結果與討論............35
5-1 斜向與垂直監控系統之修正........35
5-1-1 斜向監控系統角度之確定........36
5-1-2 斜向與垂直系統監控波長之修正.....44
5-1-3 斜向與垂直系統監控波長關係之問題...45
5-1-4 垂直監控系統問題之修正........46
5-1-5 斜向與垂直系統監控波長關係之修正...57
5-2 不同材料造成極值點偏移之問題......67
5-3 色散(Dispersion)問題之修正.......69
5-4 多層膜折射率及厚度對相位之影響.....74
第六章 結論.................81
參考文獻...................83
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