臺灣博碩士論文加值系統

微光機電系統中，在最後蝕刻犧牲層來使結構層懸浮的過程，一般來說會利用分部於結構層上的蝕刻孔來增加下方犧牲層的蝕刻率，而減少蝕刻劑對於結構上的過度蝕刻。然而，以一般周期性陣列分部的蝕刻孔在光學應用上會造成強烈的繞射場，高階的繞射光會造成雜訊及不預期的干擾。
本論文以費朗和夫繞射理論為基礎，建立了一套用來分析蝕刻孔陣列繞射之模型，並分析及討論在不同蝕刻孔分布下的繞射效應，期望藉由設計不同之蝕刻孔陣列來改變出光場型而減少不必要的繞射光束，甚至以蝕刻孔陣列達到系統需求的出射光場。最後利用自動組裝的面型微加工技術製作出微反射面鏡來驗證光學特性是否符合計算結果，量測結果與理論預期的相當接近，期望此提出之蝕刻孔排列設計在微光機電面型微加工的設計規則上可提供有用的改進。

Chapter 1 Introduction ………………………………………1
1.1 Surface Micromachining in Optical MEMS……………1
1.2 Etch-Holes in MUMPs Process……………………………3
1.3 Optical Properties of Devices with Etch Holes……4
1.4 Motivation and Objective of this thesis …………5
1.5 Organization of this thesis……………………………5

Chapter 2 Principle……………………………………………6
2.1 Huygens-Fresnel Principle………………………6
2.2 Scalar Diffraction Theory………………………7
2.3 Fresnel and Fraunhofer Diffraction…………10
2.3.1 Fresnel Diffraction………………………………10
2.3.2 Fraunhofer Diffraction…………………………11
2.4 Analysis of Etch-holes Array with Babinet’s Principle……………………13

Chapter 3 Simulation ……………………………………………15
3.1 Introduction……………………………………………15
3.2 Diffraction from Etch-holes Array with Regular Spacing…………………………………………………………………15
3.3 Diffraction from Etch-holes Array with Random Distribution….………………………………………………………20
3.4 Diffraction from etch holes array with concentric layout……………………………………………………23
3.5 Summary……………………………………………………29

Chapter 4 Fabrication Technologies……………………………30
4.1 Introduction………………………………………………………30
4.2 Reflow Hinge of Stick Microdevices……………31
4.3 Fabrication……………………………………………33
4.4 Design & Mask Layouts………………………………34
4.5 Summary…………………………………………………37

Chapter 5 Experimental Results and Discussion……………38
5.1 Introduction…………………………………………38
5.2 Measurement System…………………………………38
5.3 Fabrication Results………………………………39
5.4 Measurement Results………………………………41
5.5 Summary………………………………………………44

Chapter 6 Conclusion…………………………………………45

Reference…………………………………………………………48

[1] Peter F. Van Kessel, Larry J. Hornbeck, Robert E. Meier, and Michael R. Douglass, “A MEMS-Based Projection Display,” Proceedings of the IEEE, vol. 86, no. 8, August 1998.
[2] Paul M. Hagelin, Student, and Olav Solgaard, “Optical Raster-Scanning Displays Based on Surface-Micromachined Polysilicon Mirrors,” IEEE Journal of Selected Topics in Quantum Electronics, vol. 5, no. 1, January/February 1999.
[3] R. Apte, F. Sandejas, W. Banyai and D. Bloom, " Grating Light Valves for High Resolution Displays,"Solid State Sensors and Actuators Workshop, June 1994.
[4] M. C. Wu, L. Y. Lin, S. S. Lee, and K. S. J. Pister, “Micromachined free-space integrated micro-optics,” Sens. Actuators: A (Physical), Vol. 50, pp. 127-134, 1995.
[5] R. T. Howe and R. S. Muller, “Polycrystalline silicon micromechanical beams,” J. Electrochem. Soc., Vol. 130, pp. 1420–1423, 1983.
[6] MEMS Technology Applications Center, Microelectronics Center at North Carolina (MCNC), Research Triangle Park, NC, and Integrated Micro Electro Mechanical Systems, offered at Analog Devices, Cambridge, MA.
[7] D. Koester, A. Cowen, R. Mahadevan, and B. Hardy, PolyMUMPs Design Handbook Revision 10.0.
[8] W. N. Sharpe, Jr., R. Vaidyanathan, B. Yuan, G. Bao and R. L. Edwards, “Effect of etch holes on the mechanical properties of polysilicon,” J. Vac. Sci. Technol. Vol. B 15, pp. 1599-1603, 1997.
[9] X. Fang, N. Myung, K. Nobe, and J. W. Judy, “Modeling the effect of etch holes on Ferromagnetic MEMS,” IEEE Tran. on Magnet. Vol. 37, pp. 2637-2639, 2001.
[10] J. Zou, M. Balberg, C. Byrne, C. Liu, and D. J. Brady, “Optical properties of surface micromachined mirrors with etch holes,” IEEE J. Microelectromech. Syst., Vol. 8, pp. 506-513, 1999.
[11] J. W. Goodman, Introduction to Fourier Optics (McGraw-Hill, Singapore), pp. 35-36.
[12] Eugene Hecht, Optics (Addison Wesley, San Francisco), pp. 508-509.
[13] K. Iizuka, Elements of Photonics (Wiley-Interscience, New York, USA), pp. 32-40.
[14] W. H. Beyer, CRC Standard Mathematical Tables, 28th ed., (CRC Press, FL., 1987).
[15] J. A. Walraven, “Failure mechanisms in MEMS,” IEEE ITC International Test Conference Paper 33.1, pp. 828-833, 2003.