第一章
[1] 葉春敏,21世紀紀錄媒體主角DVD,工業材料 1997 年 11 月,131期,71頁。[2] T. Yagi, H. Nishiguchi, Y. Yoshida, M. Miyashita, M. Sasaki, Y. Sakamoto, K. Ono and Y. Mitsui. “High–Power High–Efficiency 660–nm Laser Diodes for DVD–R/RW,” Semiconductor Laser Conference, IEEE 18th International, pp. 129-130, 2002.
[3] M. F. Huang, H. C. Lee, J. K. Ho, H. C. Lin, W. H. Kuo, C. S. Cheng and Y. K. Kuo, “Laser diode for DVD pick–up head, ” Proceedings of SPIE., Vol. 3419, pp. 110-118, 1998.
[4] 史光國,現代半導體發光及雷射二極體材料技術,全華科技圖書, 3-33頁,2002年。
[5] B.G. Streetman, Solid State Electronic Devices, 4nd ed, Prentice-Hall, USA, 1995.
[6] S. M. Sze, Physics of Semiconductor Devices, 2nd ed, John Wiley, New York, 1981.
[7].P. S. Zory, Jr., Quantum Well Lasers, Academic Press, San Diego, 1993.
[8] A. Onton and R. J. Chicotka, “Conduction bands in In1-xAlxP,” J. Appl. Phys., Vol.41, pp. 4205-4207, 1970.
[9] R. J. Nelson and N. Holonyak, “Effect of crystal composition on the optimization of radiative recombination in N-free and N-doped In1-xGaxP light-emitting diodes,” J. Appl. Phys., Vol.47, pp. 1704-1707, 1976.
[10] D. B. Bour, “AlGaInP quantum well laser” in “Quantum well lasers,” edited by P. Zory, pp. 415-460, Academic Press Inc, 1993.
[11] H. Tanaka, Y. Kawamura, and H. Asahi, “Refractive indices of InGaAlP lattice matched to GaAs,” J. Appl. Phys., vol. 59, pp. 985-986, 1986.
[12] D.P. Bour and G. A. Evans, “Lateral mode discrimination in AlGaInP selectively buried ridge waveguide lasers,” IEEE PROCEEDING–J, Vol. 139, pp. 71-74, 1992.
[13] A. Valster, A. T. Meney, J. R. Downes, D. A. Faux, A. R. Adams, A. A. Brouwer and A. J. Corbijn, “Strain-Overcompensated GaInP-AlGaInP Quantum-Well Laser Structures for Improved Reliability at High-Output Powers,” IEEE J. Select. Topics Quantum Electron., Vol. 3, pp. 180-187, 1997.
[14] T. F. Kuech, D. J. Wolford, E. Veuhoff, V. Deline, P. M. Mooney, R. Potemski and Bradley, “Properties of high-purity AlxGa1-xAs grown by the metal-organic vapor-phase-epitaxy technique using methyl precursors,” J. Appl. Phys., Vol.62, pp. 632-643, 1987.
[15] Kenichi Iga and Susumu Kinoshita, Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses, Springer Verlag, Berlin, Germany, 1996.
第二章
[1] H. Asahi, Y. Kawamura and H. Nagai, “Molecular beam epitaxial growth of InGaAlP visible laser diodes operating at 0.66–0.68 μm at room temperature,” J. Appl. Phys., Vol. 54, pp. 6958-6964, 1983.
[2] I. Hino, A. Gomyo, K. Kobayashi, T. Suzuki and K. Nishida, “Room– temperature pulsed operation of AlGaInP/GaInP/AlGaInP double heterostructure visible light laser diodes grown by metalorganic chemical vapor deposition,” Appl. Phys. Lett., Vol. 43, pp. 987-989. 1983.
[3] K. Kobayashi, S. Kawata, A. Gomyo, I. Hino and T. Suzuki, “Room– temperature CW operation of AlGaInP double–heterostructure visible lasers,” Electronics Lett., Vol. 21, pp. 931-932, 1985.
[4] M. Ikeda, Y. Mori, H. Sato, K. Kaneko and N. Watanabe, “Room– temperature continuous–wave operation of an AlGaInP double heterostructure laser grown by atmospheric pressure metalorganic chemical vapor deposition,” Appl. Phys. Lett., Vol. 47, pp. 1027-1028, 1985.
[5] M. Ishikawa, Y. Ohba, H. Sugawara, M. Yamamoto and T. Nakanisi, “Room temperature CW operation of InGaP/InGaAlP visible light laser diodes on GaAs substrates grown by metalorganic chemical vapor deposition,” Appl. Phys. Lett., Vol. 48, pp. 207-208, 1986.
[6] 張守進,劉醇星,姬梁文,半導體雷射,科學發展2002 年 1 月, 349期,14∼21頁。
[7] D. B. Bour, R. S. Geels, D. W. treat, T. L. Paoli, F. Ponce, R. L. Thomton, B. S. Krusor, R. D. Bringans and D. F. Welch, “Strained GaxIn1-xP/(AlGa)0.5In0.5P heterostructure and quantum well laser diodes,” IEEE J. Quantum Electron., Vol. 30, pp. 593-607, 1994.
[8] H. Hamada, M. Shono, S. Honda, R. Hiroyama, K. Yodoshi and T. Yamaguchi, “AlGaInP visible laser diodes grown on misoriented substrates,” IEEE J. Quantum Electron., Vol. 27, pp. 1483-1490, 1991.
[9] G. Hatakoshi, K.i Nitta, K. Itaya, Y. Nishikawa, Masayuki and M. Okajima, “High Power InGaAlP Laser Diodes for High Density Optical Recording,” Jpn. J. Appl. Phys., Vol. 31, pp. 501-507, 1992.
[10] A. Shima, H. Tada, T. Motoda, M. Tsugami, T. Utakouji and H. Higuchi, “Reliability study on 50~100 mW CW operation of 680 nm visible laser diodes with a window–mirror structure,” IEEE J. Select. Topics Quantum Electron., Vol. 3, pp. 443-449, 1997.
[11] 史光國,現代半導體發光及雷射二極體材料技術,全華科技圖書, 3–33頁,2002。
[12] N. Lichtenstein, R. Winterhoff, F. Scholz, H. Schweizer, S. Weiss, M. Hutter and H. Reichl, “The Impact of LOC Structures on 670 nm (Al)GaInP High-Power Lasers,” IEEE J. Select. Topics Quantum Electron., Vol. 6, pp. 564-570, 2000.
[13] T. Yagi, H. Nishiguchi, Y. Yoshida, M. Miyashita, M. Sasaki, Y. Sakamoto, K. Ono and Y. Mitsui, “High–power high–efficiency 660 nm laser diodes for DVD–R/RW,” IEEE J. Select. Topics Quantum Electron., Vol. 9, pp. 1260-1264, 2003.
[14] Y. Yoshida, M. Sasaki, K. Shibata, Z. Kawazu, K. Ono, H. Nishiguchi, T. Yagi and T. Nishimura, “Kink and Power Saturation of 660 nm AlGaInP Laser Diodes,” IEEE J. Quantum Electron., Vol. 41, pp. 828-832, 2005.
[15] P. M. Smowton, G. M. Lewis, M. Yin, H. D. Summers, G. Berry and C. C. Button, “650-nm Lasers with Narrow Far-Field Divergence
with Integrated Optical Mode Expansion Layers,” IEEE J. Quantum Electron., Vol. 5, pp. 735-739, 1999.
[16] S. Cho, Y. Park and Y. Kim, “660 nm GaInP–AlGaInP Quantum-Well Laser Diode Structures With Reduced Vertical Beam Divergence Angle,” IEEE P. Technology Lett., Vol. 17, pp. 534-536, 2005.
[17] B. Ma, S. Cho, C. Lee, Y. Kim and Y. Park, “High-Power 660-nm GaInP–AlGaInP Laser Diodes With Low Vertical Beam Divergence Angles,” IEEE P. Technology Lett., Vol. 17, pp. 1375-1377, 2005.
[18] B. Ma, S. Cho, C. Lee, S Lee, J. Kang, B.Kim, D. Kang, Y. Shin, Y. Kim and Y. Park, “Realization of High-Power Highly Efficient GaInP/AlGaInP Ridge Laser Diodes for Recordable/Rewritable Digital Versatile Discs,” Jpn. J. Appl. Phys., Vol. 45, pp. 774-777, 2006.
[19] R. Hiroyama, D. Inoue, Y. Nomura, M. Shono and M Sawada, “High-Power 660-nm-Band AlGaInP Laser Diodes with a Small Aspect Ratio for Beam Divergence,” Jpn. J. Appl. Phys., Vol. 41, pp. 1154-1157, 2002.
[20] R. Hiroyama, D. Inoue, S. Kameyama, A. Tajiri, M. Shono, M. Sawada and A. Ibarake “High-Power 200 mW 660 nm AlGaInP Laser Diodes with Low Operating Current,” Jpn. J. Appl. Phys., Vol. 43, pp. 1951-1955, 2004.
[21] H. Fujii, Y. Ueno and K. Endo, “Effect of thermal resistivity on the catastrophic optical damage power density of AlGaInP laser diodes,” Appl. Phys. Lett., Vol. 62, pp. 2114-2115, 1993.
[22] B. Abeles, “Lattice Thermal Conductivity of Disordered Semiconductor Alloys at High Temperatures,” Phys. Rev., Vol. 131, pp. 1906-1911, 1963.
[23] W. Nakwaski, “Thermal conductivity of binary, ternary, and quaternary III–V compounds,” J. Appl. Phys., Vol. 64, pp. 159-166, 1988.
[24] G. Wachutka, “Rigorous thermodynamic treatment of heat generation and conduction in semiconductor device modeling,” IEEE Transactions on Computer–Aided Design, Vol. 9, pp. 1141-1149, 1990.
[25] K. W. Boer, Survey of Semiconductor Physics, Vol. Ⅱ. New York:Van Nostrand Reinhold, 1992.
[26] J. Piprek, Semiconductor Optoelectronic Devices Introduction to Physics and Simulation, Academic Press, San Diego, pp. 141-148, 2003.
第三章
[1] T. Yagi, H. Nishiguchi, Y. Yoshida, M. Miyashita, M. Sasaki, Y. Sakamoto, K. Ono and Y. Mitsui, “High–Power High–Efficiency 660 nm Laser Diodes for DVD–R/RW,” Semiconductor Laser Conference, IEEE 18th International, pp. 129-130, 2002.
[2] 國立彰化師範大學光電科技研究所楊睿明碩士論文,考慮熱效應模式下的高功率磷化鋁鎵銦雷射二極體之研究分析,2005。
[3] G. Hatakoshi, K. Itaya, M. Ishikawa, M. Okajima and Y. Uematsu, “Short-Wavelength InGaAlP Visible Laser Diodes,” IEEE J. Quantum Electron., Vol. 27, pp. 1476-1482, 1991.
[4] M. F. Huang, H. C. Lee, J. K. Ho, H. C. Lin, C. S. Cheng, C. C. Kuo and Y. K. Kuo, “Laser diode for DVD pick–up head,” SPIE, Vol. 3419, pp.110-118, 1998.
[5] 史光國,現代半導體發光及雷射二極體材料技術,全華科技圖書, 3–33頁,2002。
[6] J. Piprek, Semiconductor Optoelectronic Devices Introduction to Physics and Simulation, Academic Press, San Diego, pp.141–148, 2003.
[7] T. Yagi, H. Nishiguchi, Y. Yoshida, M. Miyashita, M. Sasaki, Y. Sakamoto, K. Ono and Y. Mitsui, “High–power high–efficiency 660–nm laser diodes for DVD–R/RW,” IEEE J. Select. Topics Quantum Electron., Vol. 9, pp. 1260-1264, 2003.
第四章
[1] D. B. Bour “AlGaInP quantum well laser” in “Quantum well lasers” edited by P. Zory, pp.415-460, Academic Press Inc,1993.
[2] B. Lu, J.S. Osinski, E. Vail, B. Pezeshki, B. Schmitt and R.J. Lang, “High power 635 nm low-divergence ridge waveguide single mode lasers,” Electron. Lett., Vol.34, pp. 272-273, 1998.
[3] B. Lu, E. Vail, J.S. Osinski, E. Vail and B. Schmitt, “High-speed low-parasitic low-divergence 635 nm single mode lasers,” Electron. Lett., Vol.34, pp. 1750-1751, 1998.
[4] 國立彰化師範大學光電科技研究所邢晉源碩士論文,提升635 nm磷化鋁鎵銦雷射二極體的特徵溫度,2006。
附錄
[1] LASTIP User’s Manual Version, 2003.12, First Edition, Crosslight Software Inc.
[2] Crosslight Device Simulation Software–A General Description, Version 2003.12, First Edition, Crosslight Software Inc
[3] G. P. Agrawal, “Semiconductor Laser,” Van Nostrand Reinhold, N. Y., USA, pp. 58–61, 1993.
[4] J. Piprek, Semiconductor Optoelectronic Devices Introduction to Physics and Simulation, Academic Press, San Diego, pp.79–80, 2003.
[5] K. W. Boer, Survey of Semiconductor Physics, Vol.Ⅰ. New York:Van Nostrand Reinhold, 1990.
[6] http://www.answers.com/topic/peltier–seebeck–effect.
[7] O.Yu. Titov, G. de la Cruz Gonzalez, G.N. Logvinov, Yu.G. Gurevich, “New physical point of view on the Peltier effect,” Thermoelectrics, 1997. Proceedings ICT ' 97. XVI International Conference , pp. 661 – 663, 1997.